Spectrophotometers: PERKIN ELMER LAMBDA 800

ID#: 144494

Manufacturer: PERKIN ELMER

Model: LAMBDA 800

Category: Spectrophotometers

Equipment Details: UV/Vis spectrophotometer

Specifications:
Principle:
Double beam
Double monochromator
Microcomputer electronics
Controlled by DELL PC

Optical system:
All reflecting optical system (SiO2 coated)
Holographic grating monochromater: 1440 lines/mm UVNis blazed at 240nm
Littrow mounting
Sample thickness compensated detector optics

Beam splitting system:
Chopper
(46+ Hz. cycle: dark/sampie/dark reference/chopper segment signal correction)

Detector: photomultiplier R6872 for high energy in whole UV/Vis range
Source: pre-aligned tungsten-halogen and deuterium
Wavelength range: 185 to 900nm (N2 purging required for below 185nm)
UV/Vis resolution: < 0.05nm

Stray light:
At 200 nm (12 g/L KCI USP/DAP method): > 2A
At 220 nm (10 g/L Nal ASTM method): < 0.00008 %T
At 340 nm (50 mg/L NaNO2ASTM method): < 0.00008 %T
At 370 nm (50 mg/L NaNO2 ASTM method): < 0.00008 %T

Wavelength accuracy: ± 0.08 nm
Wavelength reproducibility:
UV/Vis (deuterium lamp lines): < 0.020 nm
Standard deviation of 10 measurements: < 0.005 nm
UV/Vis

Photometric accuracy:
Double aperture method 1 A: ± 0.0006 A
Double aperture method 0.5 A: ± 0.0003 A
NIST 1930D filters 2 A: ± 0.003 A
NIST 930D filters 1 A: ± 0.003 A
NIST 930D filters 0.5 A: ± 0.002 A
K2Cr207-Solution USP/DAP method: ± 0.010 A

Photometric linearity:
(Addition of filters UV/Vis at 546.1 -nm, Slit 2 nm, 1-sec. Integration Time)
At 1.0 A: ± 0.001 A
At 2.0 A: ± 0.002 A
At 3.0 A: ± 0.006 A

Photometric reproducibility:
1 A wich NIST 930D Filter at 546.1-nm:
Standard Deviation for 10 measurements: < 0.00016 A
0.5 A wich NIST 930D Filter at 546.1-nm:
Standard Deviation for 10 measurements: < 0.00008 A
0.3 A wich NIST 930D Filter at 546.1-nm:
Standard Deviation for 10 measurements:
(2-nm Slit, 1 -sec. Integration): < 0.00008 A

Photometric range: 7 A (wich SRATT)
Photometric display: unlimited
Photometric stability (after warmup at 500nm, 0Am 2nm skit, 2s after integration time, peak to peak): < 0.0002 A/h

Bandpass:
0.05 nm-5.00 nm in 0.01 nm increments
UV/Vis range
Fix resolution, constant energy or slit programming

Baseline flatness: ± 0.001 A
(Lambda 800: 190 nm-860 nm, 2 nm Slit, 0.20 sec. Integration Time, no smoothing applied)

Photometric noise RMS:
0 A and 190 nm: < 0.00010 A
0 A and 500 nm: < 0.00005 A
2 A and 500 nm: < 0.00020 A
4 A and 500 nm: < 0.00100 A
6 A and 500 nm: < 0.00500 A
(2 nm Slit, 1 sec Integration Time, Gain 1 NIR)

Sample compartment instrument (W x D x H): 200 x 300 x 200mm

Purging:
Optics: yes
Sample compartment: yes

Light beam:
90 mm above the base plate
120 mm beam separation
3 mm to 12 mm beam height

High sensitivity: PMT: gridless PMT design
Standard sample and reference beam attenuators: included
Software: UV WinLab 3.00.02 Rev A
Curvette holder: 10 x 10mm curvettes
Dust protection
Standard RS 232 interface
Power requirements: 230V, 50Hz, 250W.
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