APPLIED MATERIALS ENDURA Products

  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9075420
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2001 
    PVD System, 8" | Copper Deposition | Cleanroom Interface: Endura VHP Front Panel | Transfer robot: VHP | Buffer robot: HP | Controller Type: PVD Endura | Remote Generator Rack Type: PVD Endura | Secondary Generator Rack | (2) 9600 System Cryo Compressors | Transfer and Buffer Lid Hoist | CE Mark | | Chamber A: | Pass-Through | Quartz viewport lid | | Chamber B: | Cooldown with temperature monitor | Quartz viewport lid | O2 manifold | | Chambers E & F: | (2) Orienters with Enhanced Degas | | Chamber 2: | Refractory Widebody PVD SIP Ta(N) Chamber | Power Supply Options: 24 kW Two Box, Power Supply Mini Panel | PVD Wafer Chuck Options: SZBESC style e-chuck | Shield Material: Stainless Steel 2-piece | | Chamber 3: | Widebody PVD SIP Cu Chamber | PVD Power Supply Options: 40kW 2 box with Arc Out, Power Supply Mini Panel (some models are 24KW) | PVD Wafer Chuck Options: SZBESC style e-chuck | Ceramic Cover Ring | | Chambers 2 & 3 Options: | PVD UHV Pump Options CTI Enhanced Fast Regen Low Vibration 3-phase Cryo | Wafer Bias Power Supply: IMP 13.56MHz Bias Power Supply H/W | 3-Position Gate Valves | Standard Cryo Restrictors | Chamber Conditioning Options: Mag-Coupled Shutter | | Currently crated | 2001 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116764
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1998 
    PVD system, 8" | Cleanroom Interface: Endura HP Front Panel | PVD Endura type controller | | (2) WB Ti PVD chambers | (1) SB Al PVD chamber | (1) SB TiN PVD chamber | | Chamber A: | Quartz Viewport lid | | Chamber B: | Cool down with temperature monitor | Quartz viewport lid | 02 Manifold | | Chamber C: | PC II Type | Reactive preclean | Leybold TMP | | Chamber F: | Orienter with standard degas | | HP Transfer and buffer robots | Blade selection: Original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI Fast regen cryo | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD: | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 3/4: | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | | Components: | Main body | RF Power | Misc parts | AC controller | Cryo pumps | Pump 2 | Neslab chiller | RF power | AC box | | 1998 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9075723
    Category:
    Reactors
    Wafer Size:
    8" 
    PVD System, 8" | Copper Deposition | Cleanroom Interface: Endura VHP Front Panel | Transfer robot: VHP | Buffer robot: HP | Controller Type: PVD Endura | Remote Generator Rack Type: PVD Endura | Secondary Generator Rack | Transfer Chamber Pump: Enhance Fast Regen Low Vibration 3-Phase Cryo (Subject to Availability) | Buffer Chamber Pump: Enhance Fast Regen Low Vibration 3-Phase Cryo (Subject to Availability) | System Pump / Interface Combination: System Smart Pump Interface Kit (Subject to Availability) | (2) 9600 System Cryo Compressors | Transfer and Buffer Lid Hoist | CE Mark | | Chamber A: | Pass-Through | Quartz viewport lid | | Chamber B: | Cooldown with temperature monitor | Quartz viewport lid | O2 manifold | | Chambers C & D: | (2) Reactive Preclean Chambers (RPC) | Preclean UHV Pump Options: Leybold TMP | Preclean Smart Pump Interface Kit | | Chambers E & F: | (2) Orienters with Enhanced Degas | | Chamber 2: | Refractory Widebody PVD SIP Ta(N) Chamber | Power Supply Options: 24 kW Two Box, Power Supply Mini Panel | PVD Wafer Chuck Options: SZBESC style e-chuck | Shield Material: Stainless Steel 2-piece | | Chamber 3: | Widebody PVD SIP Cu Chamber | PVD Power Supply Options: 40kW 2 box with Arc Out, Power Supply Mini Panel (some models are 24KW) | PVD Wafer Chuck Options: SZBESC style e-chuck | Ceramic Cover Ring | | Chambers 2 & 3 Options: | PVD UHV Pump Options CTI Enhanced Fast Regen Low Vibration 3-phase Cryo (Subject to Availability) | Wafer Bias Power Supply: IMP 13.56MHz Bias Power Supply H/W | 3-Position Gate Valves | Standard Cryo Restrictors | Chamber Conditioning Options: Mag-Coupled Shutter | | Currently Crated.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9043082
    Category:
    Spare Parts
    Wafer Size:
    12" 
    RF-flow chamber, 12".
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9043083
    Category:
    Spare Parts
    Wafer Size:
    12" 
    RF-flow chamber, 12".
  • APPLIED MATERIALS: Endura 300

    Details
    ID#:
    9070412
    Category:
    Reactors
    Wafer Size:
    12" 
    Vintage:
    2002 
    PVD system, 12" | Aluminum interconnect | | Chamber 1: | For Al-Cu PVD chamber | DCPS;Master,OPTIMA DCG-200,ENI,for PVD | Slave,OPTIMA DCG-200,ENI,for PVD | PUMP/CRYO,SICERA KZ-8L3C,SHI | HT ESC type stage | Ar;200/20sccm | | Chamber 2: | Chamber ONLY For PVD | Not used | | Chamber 3: | For TiN PVD chamber | DCPS;OPTIMA DCG-200,ENI,for PVD | PUMP/CRYO,SICERA KZ-8L3C,SHI | A101 type stage | Ar/N2;150/200sccm | | Chamber D: | For Pre-CLN chamber,PCXT | RFPS;GHW-12A/GMW-25A,ENI,for BIAS/SLA | PUMP/CRYO,SICERA KZ-8L3C,SHI | Ar;200/20sccm | | Chamber E,F: | For Degas,Plate heater | PUMP/CRYO,SICERA KZ-8L3C,SHI | Ar,press. Controlled | | Missing Parts as of Q3 2014: | Air solenoid valve unit (Ch-1), US13676 4060-00238, | Cathode feedthrough (Ch-1), 0190-76276 | Cathode cooling water hose, N/A | CP compressor (bottom), CSW-61C / 0190-2932 | Degas Lifting FOUP Assy (Ch-F) | HT-ESC(Ch-1), 0010-23066 | Robot Blade, 0021-32929 | | Missing Degas Lifting FOUP Assy (Ch-F): | (4) 0020-75627, 300mm Degas Clamp Insert | (2) 0020-25615, Clamp | (7) 3880-01245, Flat Washer | (1) 3220-01051, Floating Joint Coupling | (1) 0021-21267, Left Cover | (1) 0190-76278 / 0190-1342, Linear Guide | (1) 0020-42056, Lower Lift Stop | (1) 0021-21268, Right Cover | (7) 3690-01888, Screw | (1) 0090-20003, Sensor Assembly and Cable Harness | (4) 3690-01642, Socket Head Cap Screw | (3) 3690-01945, Socket Head Cap Screw | (6) 3690-01942, Socket Head Cap Screw | (7) 3880-01103, Split Locking Washer | (4) 3880-01025, Split Locking Washer | (6) 3880-01025, Split Locking Washer | (1) 0020-42055, Upper Lift Stop | (2) 3870-02530, Valve | (1) 0040-21402, Wafer Lift Bellows | (1) 0040-42640, Wafer Lift Block | (1) 3020-01152, Wafer Lift Pneumatic Cylinder | (1) 0040-76520, Wafer Lift Rail Support | | Currently de-installed and stored in fab | 2002 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9069415
    Category:
    Reactors
    PVD system, 8" | Vectra IMP Chamber.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9043081
    Category:
    Spare Parts
    Wafer Size:
    12" 
    RF-etch chambers, 12".
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116761
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2006 
    PVD system, 8" | (2) TxZ HP+ TiN chambers | (1) Vectra IMP Ti chamber | | Sub modules: | Main AC box | System AC/controller | Generator rack | Cryo compressor / controller | Neslab | Heat exchanger | (3) Dry pump | | Chamber A: | Pass through | Veriflo gas valves | Viton Slit valve o-ring | Clear lid chamber lid | | Chamber B: | Cooldown | Veriflo gas valves | Viton Slit valve o-ring | Clear lid chamber lid | PCW heater / cathode cooling | | Chamber C: NA | | Chamber 1: | IMP Vectra | Ti process | B101 susceptor | IMP process kit type | Single manometer | G-12 lid type | PCW wall cooling | Chamber pump: cryo pump (OB8F) | Manometer 1: 100mTorr | Manometer 2: none | Neslab III heater | RF gen: AE MDX-L12M | RF gen 2: AE HFV-8000 | Viton slit valve o-ring | Shutter option: Yes | RF match: 13.56 MHz | Gate valve: 3 position | Magnet: 0010-21676 | Gasses: | Gas 1: N2, 100 sccm, STEC 4400, MFC15, 2xMnfold | Gas 2: N2, 100 sccm, STEC 4400, MFC16, 2xMnfold | Base pressure: vented | Heater moving test: ok | Heater temp 27°C | RF generator / DC supply: | 1. Comdel CX-600S | 2. AE HFV 8000 | 3. AE MDX L-12M | | Chamber 2: | TxZ HP+ | CVD TiN process | HP Plus susceptor | HP+ process kit type | Dual manometer | G-12 lid type | AMAT0 wall cooling | Chamber pump: BOC Edwards IH600 | Manometer 1: 10mTorr | Manometer 2: 100mTorr | Throttle valve | RF gen: AE PDX-9002V | Viton slit valve o-ring | Gate valve: 2 position | Gasses: | Gas 1: N2, 100 sccm, MKS, MFC18, 2xMnfold | Gas 2: N2, 3SLM, STEC 4400, MFC19, 2xMnfold | Gas 3: N2, 2SLM, STEC 4400, MFC20, 2xMnfold | Gas 4: He, 500sccm, STEC 4400, MFC35 | Gas 5: H2, 1SLM, STEC 4400, MFC36 | Gas 6: N2, 1SLM, STEC 4400, MFC37 | Gas 7: He, 1SLM, STEC 4400, MFC38 | Base pressure: vented | Heater moving test: ok | Heater temp 33.3°C | | Chamber 3: | TxZ HP+ | CVD TiN process | HP Plus susceptor | HP+ process kit type | Dual manometer | G-12 lid type | AMAT0 wall cooling | Chamber pump: BOC Edwards IH600 | Manometer 1: 10mTorr | Manometer 2: 100mTorr | Throttle valve | RF gen: AE PDX-9002V | Viton slit valve o-ring | Gate valve: 2 position | Gasses: | Gas 1: N2, 100 sccm, MKS, MFC3, 2xMnfold | Gas 2: N2, 3SLM, STEC 4400, MFC2, 2xMnfold | Gas 3: N2, 2SLM, STEC 4400, MFC1, 2xMnfold | Gas 4: He, 500sccm, STEC 4400, MFC21 | Gas 5: H2, 1SLM, STEC 4400, MFC22 | Gas 6: N2, 1SLM, STEC 4400, MFC23 | Gas 7: He, 1SLM, STEC 4400, MFC24 | Base pressure: vented | Heater moving test: ok | Heater temp 38°C | | Chamber 4: NA | | 2006 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059221
    Category:
    Reactors
    Wafer Size:
    6" 
    Vintage:
    1994 
    PVD system, 6" | | A: Pass through | B: Cooldown | C: Preclean II | D: Preclean II | E: Orienter-Degas | F: Orienter-Degas | 1: Al | 2: Ti/TiN | 3: Ti/TiN | 4: Al | | Missing: | FDD | SBC board | | 1994 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9039884
    Category:
    Reactors
    PVD system | Preclean etch rate: 7,5 A/s | 380 V, 50 Hz, 116 Amps | 1993 vintage.
  • APPLIED MATERIALS: Endura 5500P

    Details
    ID#:
    9056035
    Category:
    Reactors
    Systems.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9043080
    Category:
    Spare Parts
    Wafer Size:
    12" 
    Chamber, 12".
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059222
    Category:
    Reactors
    Wafer Size:
    6" 
    Vintage:
    1995 
    PVD system, 6" | | A: Pass through | B: Cooldown | C: Preclean II | D: Preclean II | E: Orienter-Degas | F: Orienter-Degas | 1: Ti/TiN | 2: Ti/TiN | 3: 101 Ti/TiN | 4: 101 Ti/TiN | | Parts missing: | FDD | SBC Board | VIDEO Board | Xfer Up/Down Robot Monitor Ass'y | | 1995 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    116723
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2006 
    PVD system, 8" | (2) PC2 chambers | (2) WB Ti PVD chambers | 2006 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9038554
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1999 
    Liner / Barrier system, 8" | | Includes: | (2) TxZ | (2) HP+ | (1) OD | (1) PC2 | (1) IMP | NBLL | HP | | Powered down | 1999 vintage.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9049701
    Category:
    Spare Parts
    Wafer Size:
    12" 
    Chamber, 12" | EnCorE TaN.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9049702
    Category:
    Spare Parts
    Wafer Size:
    12" 
    Chamber, 12" | EnCorE TaN.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    194427
    Category:
    Reactors
    Wafer Size:
    6" 
    PVD System, 6" | | HP wafer handler Buffer and Transfer chamber | NB Load locks tilt out | System Controller | Main AC BOX | Remote pump rack including QDP 40/QMB250 Edwards | SST Bezel with white door covers | Cryo compressors 8510 | Paste chamber (orientor wall with hoop) | | Chamber A: Pass through | Chamber B: Pass through, Clear Lid, Cooling | Chamber E: Orientor Degas | | Chamber 1: | Incomplete | Standard body non-water cooled | 2 position Gate valve | | Chamber 2: | Tin Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 3: | Ti Source 0010-20060 | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 4: | AL Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber D: | Preclean II | Rf MATCH 0010-20525 | Mag lev turbo 341 | RFPP LF 10A | Comdel | Chiller | Amat Neslab III | Power supplies | MDX 10K Master 3 each | MDX 10k Slave 1 each | | Can be inspected.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    190620
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    PVD Sputtering system, 8" | Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type | Process: Al, Ti, TiN | | Configuration: | Chamber A: Pass through | Chamber B: Cool down | Chamber D: Preclean I | Chamber F: Orienter degas | Chamber 1: ALCu (clamp) | Chamber 2: TiN (101) | Chamber 3: Ti (101) | Chamber 4: Ti (clamp) | | Installed | 1995 vintage.
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