APPLIED MATERIALS ENDURA Products

  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9015795
    Category:
    Reactors
    PVD System, 8" | | Cleanroom Interface: Endura VHP Front Panel | PVD Endura Type Controller | PVD Endura Type Remote Generator Rack | | Secondary Generator Rack: | (2) 9600 System Cryo Compressors | Transfer & Buffer Lid Hoist | CE Mark | | CHAMBER A | Pass-Through Chamber | Quartz Viewport Lid | | CHAMBER B | Cooldown with Temperature Monitor | Quartz Viewport Lid | O2 Manifold | | CHAMBERS C/D | (2) Reactive Preclean (RPC) Chambers | Preclean UHV Pump Options: Leybold TMP | Preclean Smart Pump Interface Kit | | CHAMBER E/F | (2) Orienters with Enhanced Degas | | TRANSFER ROBOT | VHP Robot | | BUFFER ROBOT | HP Robot | | SYSTEM PUMP OPTION | CTI Enhance Fast Regen Low Vibration 3-Phase Cryo - One Each for Transfer & Buffer Chambers | | SYSTEM PUMP/INTERFACE COMBINATION | System Smart Pump Interface Kit (Subject to Availability) | | CHAMBER 2 | Refractory Widebody PVD SIP Ta(N) Chamber | Power Supply Options: 24 kW Two Box, Power Supply Mini Panel | PVD Wafer Chuck Options: SZBESC style e-chuck | Shield Material: Stainless Steel two-piece | | CHAMBER 3 | Widebody PVD SIP Cu Chamber | PVD Power Supply Options: 40kW 2 box with Arc Out, Power Supply Mini Panel | PVD Wafer Chuck Options: SLT ESC | Ceramic Cover Ring | | Both CHAMBER 2/3 have the following options: | PVD UHV Pump Options CTI Enhanced Fast Regen Low Vibration 3-phase Cryo | Wafer Bias Power Supply: IMP 13.56MHz Bias Power Supply H/W | 3-Position Gate Valves | Standard Cryo Restrictors | Chamber Conditioning Options: Mag-Coupled Shutter | Configuration: Endura Electra Cu.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    128804
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1997 
    AL-2 (ALPS) deposition system, 8" | | Specifications: | Wader size: 8" | Wafer shape: SNNF | Load Lock: Auto tilt narrow body | E/F: Orienter/Degas | C/D: Preclean II | A/B: Pass/Cool down | 1: IMP | 2/3: HP+ TxZ | | Chamber Type / Location: | Transfer Chamber: | Position 1: Titanium | Position 1 Process: Vectra IMP Ti | | Position 2: CVD TiN | Position 2 Process: HP+ TxZ | | Position 3: CVD TiN | Position 3 Process: HP+ TxZ | | Position 4 and 5: N/A | Position 4 and 5 Process: N/A | | Buffer Chamber: | Position A: Pass Thru | Position A Process: Pass Thru | | Position B: Cooldown | Position B Process: STD Cooldown | | Position C: PCII | Position C Process: Pre-Clean | | Position D: PCII | Position D Process: Pre-Clean | | Position E: Orienter | Position E Process: Orient with STD Degas | | Position F: Orienter | Position F Process: Orient with STD Degas | | Electrical requirements: | 50/60Hz, 208V, Facilities power indicator | System UHV: Fast Regen Low Vib cryo pump | | System safety equipment: | "Emergency Off" Label Yes | EMO Button Guard Ring Yes | EMO Under Monolith No | Primary Side Trip Amperage 3P 600VAC 600A Trip Unit | G F I on Primary with EMO Yes | G F I On Secondary No | G F I Component - | Circuit Breaker on No | G F I Trip Amperage No | System Water Leak Detector Yes | System Smoke Detector Yes | Additional Smoke Detector No | Mainframe Water Interlock Yes | Support Ch facility interlock No | Monolith Bakeout Heater No | AC Boxes Indicator Lamp Incandescent | System Lebels Language English Only | RF Gen LOTO Switch Location At Generator Rack | | System UV: | System Cryo Pump Type Fast Regen Low Vib | | PVD Chamber configuration: | Position | Chamber conditioning: 1 | Shutter: Linkage | | Chamber Safety: | Chamber lid clamp level extension: Yes | Target water flow interlock: Yes | Coh Src Adaptor water Fl Intlk: No | | Chamber Safety: | Wafer bias power supply HW: 13.56 | RF match type: 0.16u | | Process Info: | Magnet type: RH-2 | Magnet P/N: 0010-21676 | Magnet shim thickness: 0.75mm | | CVD Chamber configuration: | Position 2 and 3: | Application: CVD TiN | Process Type: HP + TxZ | CVD Ampoule level sensor: TDMAT | CVD Ampoule lifter: No | CVD Ion gauge: No | | Gas delivery option: | Gas delivery type: AMAT spec | Proc Htr Vent gasline valves: AMAT spec | Gasline fittings: AMAT spec | Gas line clamps: Np | Gas box pneumatic value: Single | Process and Htr gasline filter: Pall Ultramet-L Gaskleen | Cooldown filters: Pall Ultramet-L Gaskleen | Loadlock and mainframe: Pall Ultramet-L Gaskleen | CVD MFC type: Stec 4400 | CVD gas panel vale type: Veriflo 10RA | CVD gas panel fitting type: AMAT spec | CVD gas panel filter type: Pall Ultramet-L Gaskleen | Heater gas QTY: 1 | First heater gas: N2 | First heater MFC size: MKS 100 | First MFC Cal gas: N2 Cal | First heater MFC position: Ch#2: 18 ; Ch#3: 3 | | CVD TiN Gas Line: | (1) 500 HE | (2) 1000 H2 | (3) 1000 N2 | (4) 1000 HE | (7) 1000 AR | (19) 3000 N2 | (20) 2000 N2 | | Gas delivery options: | Pressure indicator: Digital | Manual shut off valve: Yes | | Mainframe options: | Transfer and buffer lid hoist: STD lid hoist | Robot characterization fixture: No | | Detailed mainframe info: | Front panel bezel: No painted | Door covers: Painted | System water lines: SST seal Lok | | Remote options: | UPS option: Yes | Controller AC power feed: Bottom | Controller bottom exhaust fan: Yes | Bottom rear door: Swing out | Ion gauge type: Nude | Wide adaptor for ion gauge: No | PC ion gauge without elbow: Yes | CVCF Interface: Yes | | Generator racks: | MCA rack + AC module: No | Generator rack type: PVD Endura type | 2nd generator rack required: Yes | Cable length: 6’ | Gen rack water flow interlock: Yes | | Compressure option: | Cryo comp water flow interlock: No | Special Cryo Helium maniforld: No | Cryo comp water fittings: No | | Heat exchanger option: | Heat exchanger type: NESLAB III | Second heat exchanger type: None | CVD Heat exchanger type: AMAT 0 | | System monitors: | Monitor QTY: 3 | Monitor 1: STD Alone | Monitor 2: Through the wall | Monitor 3: STD alone | Monitor switch location: Controller | | Currently stored in a cleanroom | 1997 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    148093
    Category:
    Reactors
    PVD system, 8" | | Wafer Shape: SNNF | Umbilicals For Remote Item: 25ft | Umbilicals For MF To CTL: 25ft | Position 1: Ti /Standard Body | Position 2: WB | Position 3: AL /Standard Body | Position 4: AL /Standard Body | Position A: Cool Down | Position B: Pass Cool Down | Position C: PCII | Position D: Blank | Position E: Orient/Degas | Position F: Orient/Degas | | Electrical requirements: | Line Voltage: 408V | Line Frequency: 60Hz | Facility Power Indicator: Yes | Transformer Type: 225kVA Step Down | | Chamber 1: | Application: Standard source | Magnet P/N: 0010-20819 | Chamber Body: Standard | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cover Ring Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 2: | Application: Standard source | Magnet P/N: 0010-21818 | Chamber Body: Wide Body | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 3: | Application: AL Source | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber 4: | Application: AL | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SUS | Cryo Gate Valve: starderd | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber A Pass: | Target Water Flow Interlock: None | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: None | | Chamber B Cool down: | Chamber Type: Cooldown | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: ClnCool | | Chamber C: | RF Match: None | Power Supply(kw): Comdel CPS-1001S 13.56MHz | Turbo pump: None | | Chamber D: Blank: Blank | | Chamber E: | Orient Degas Type: Standard | Power Supply(kw): RFPP LF-10 | Temp Feedback: Yes | | Chamber F Orient: | Orient Degas Type: None | Temp Feedback: None | | Gas panel configuration: | Gas Delivery Type: AMAT Spec | Proc Htr Vent Gasline Valves: Veriflo 10Ra | Gasline Fittings: Cajon | Gasbox Pneumatic Valves: Single | Process And Htr Gasline Filter: Pall Ultramet-L Gaskleen | Cooldown Filter: Pall Ultramet-L Gaskleen | Loadlock And Mainframe Filters: Pall Ultramet-L Gaskleen | Gasline Gas Box Exit: Over the Top | MFC Type: STEC 4400 | Digital Option: Yes | | General Mainframe: | Front Panel Options: Painted | Front Panel EMO Cover: Yes | Status Light Tower Required: Yes | Status Light Tower Type: 4 Light | Light Combination: RYGB | Communication Interface: SECS | Slit Valve Doors: STD | Slit Valve Pressure Regulator: Yes | Buffer Cryo Light Screen: Yes | | Loadlock / Cassette: | Loadlock Type: NB LL | Indexer and Handler Type: Universal Manual W/Rotate | Enhanced Wafer Mapping: YES | Loadlock Vent Type: Variable Speed Soft Vent | Wafer Out of Slot Detector: None | Cassette Material: Plastic | Pump Down: Variable Speed Programmable | Customer Provided Automation: None | SMIF Type: None | | Buffer/Transfer chamber: | Transfer Robot Type: HP | Buffer Robot Type: HP | HP Plus Arm Leveling Tool: No | Transfer And Buffer Lid Hoist: None | Robot Characterization Fixture: No | Slit Valve: STD | Slit Valve Pressure Regulator: Yes | | Detailed mainframe info: | Front Panel Bezel: Painted | Door Covers: Painted | System Water Lines: SST Seal Lok | Facility Water in Mainframe: Yes | System Vent Label: Ar & N2 | Preclean Exhaust Size: N/A | | Status light tower: | Lamp Colors: RYGB | Number Of Lamps Per Tower: FOUR | Top Signal: Fault | Upper Middle Light Signal: Auto And Idle | Lower Middle Light Signal: Ready To Load/Unload | Bottom Signal: Warning Occur | UPS Option: No | Number of Poles | Controller AC Power Feed: Top | Bottom Rear Door: Swing Out | Software Revision: C8.51 | Ion Gauge Type: Nude | | RF Generator rack: | Generator Rack Type: PVD Endura Type | 2nd Generator Rack Required: Yes | Cable Length, 1st to 2nd GenRack: 6' | Preclean Power Supply Config: PC in Rack 2 Only | Bottom Rear Door: Swing Out | Gen Rack AC Power Feed: Top | Water Leak Detector: Yes | | Compressor and cryo pump: | Cryo Compressor Type: Water Cooled 8510 | Cryo Compressor Qty: 2 | Cryo Helium Lines: 3/4"x40' | Cryo Flex Line Elbow onCompressor: Yes | Cryo Flex Line Elbow onMainframe: Yes | Cryo Pump Type: Enhanced Fast Regen Low Vibration | Cryo Power Phase: 2 Ph | | Heat exchanger: | Heat Exchanger Type: Neslab system 3 | Resistor Meter: Yes | | System Monitors: | Monitor Qty: 2 | Monitor 1: STAND ALONE | Monitor 1 Cable Length: 35' | Monitor 2: STAND ALONE | Monitor 2 Cable Length: 35' | | DC Power supplies: | DC Power supplies 1: 24V | DC Power supplies 2: 15V | | Pump: | Pump: System: Smart Pump Interface Only | | 1997 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037983
    Category:
    Spare Parts
    Various modules and parts for Endura 5500, 8".
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9023340
    Category:
    Reactors
    Wafer Size:
    8" 
    System, 8" | | Cleanroom interface: Endura HP front panel | PVD Endura type controller | Chamber A | Quartz viewport lid | Chamber B | Cooldown with temperature monitor | Quartz viewport lid | 02 manifold | Chamber C - pre-clean chamber | Reactive pre-clean | Leybold TMP | Chamber E/F - orienter | Orienter with standard degas | HP transfer and buffer robots | Blade selection: original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI fast regen cryo single-phase | PVD wafer chuck option: unclamped | 101 pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option.: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD | Customer special application / CES section | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: unclamped | 101 pedestal type | Lift options: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck options: unclamped | 101 pedestal type | Lift options: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9036511
    Category:
    Reactors
    PVD system, 12" | Idle date: Q4 2012 | Install type: stand-alone | | Factory interface (ver. 5.3): | (3) 300mm FOUP load-ports | 25-slot FOUP support | Status lamp (programmable) | | System configuration overview: | LLKs: (SWLL): cool down | Ch-E/F: DMD Degas | Ch-A/B: cool down (std) | Ch-C: blank | Ch-D: blank | Ch-1: PVD_SIP | Ch-2: PVD_SIP | Ch-3: PVD_eSIP | Ch-4: PVD_eSIP | Ch-5: blank | | Main Frame (M/F): | M/F type: Endura II | Buffer/transfer robot type: XP | User interface stations (roll-around) | | Process chambers: | | Ch-1/2: PVD SIP Ti | | AE DC power supplies: | Master PS PN: 0190-08122 | Slave PS PN: 0190-08122 | | Bias PS: ENI GHW-12Z | | Magnet type: SIP | | Process tit: | Upper shield PN: 0020-23549 | Lower shield PN: 0020-02344 | Inner/mid shield PN: 0020-54777 | Inner/mid shield clamp PN: 0020-08299 | Lower shield clamp PN: 0020-02348 | Dep ring PN: 0200-08301 | Cover ring PN: 0021-17770 | Insulator PN: 0200-01326 | Shutter disc PN: 0021-25014 | | Ch-3/4: PVD eSIP | ƒ | Optima DC power supplies: | Master PS PN: 0190-19810 | Slave PS PN: 0190-19811 | | Bias PS: ENI GHW-12Z | | Magnet type: eSIP, 2-position | | Process kit: | Lower shield PN: 0020-48303 | Inner/mid shield PN: 0020-60810 | Lower shield clamp PN: 0020-48304 | Dep ring PN: 0200-03346 | Cover ring PN: 0020-48305 | Insulator bushing PN: 0200-01326 | Shutter disc PN: 0020-45231 | | Cryo compressor(s): | (2) Helix/CTI IS-1000 | | Heat exchanger: | (1) Daikin | | Pumps: | LLK Pump: (1) Alcatel A100L iPUP
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116764
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1998 
    PVD system, 8" | Cleanroom Interface: Endura HP Front Panel | PVD Endura type controller | | (2) WB Ti PVD chambers | (1) SB Al PVD chamber | (1) SB TiN PVD chamber | | Chamber A: | Quartz Viewport lid | | Chamber B: | Cool down with temperature monitor | Quartz viewport lid | 02 Manifold | | Chamber C: | PC II Type | Reactive preclean | Leybold TMP | | Chamber F: | Orienter with standard degas | | HP Transfer and buffer robots | Blade selection: Original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI Fast regen cryo | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD: | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 3/4: | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | | Components: | Main body | RF Power | Misc parts | AC controller | Cryo pumps | Pump 2 | Neslab chiller | RF power | AC box | | 1998 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037978
    Category:
    Reactors
    System, 8" | Wide body chamber.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9038308
    Category:
    Reactors
    HP PVD System, 8" | | Mainframe: | Wafer shape: SNNF | Transformer: 208 V Direct | Line frequency: 60 Hz | | UPS: None | GFI for UPS installed: No | CVCF Installed: No | | Buffer robot: HP | Front panel type: Painted, No lamp | Transfer robot: VHP | Transfer robot blade: Original metal | Buffer robot blade: Original metal | | EMO Option: Momentary-Allen-Bradley | EMO Button guard rings: Yes | GFI on primary (in main AC): No | GFI on secondary: No | Smoke detector: No | CE Mark: No | E-clean cart: No | | System cryo pumps: Fast regen enhanced | (1) Monitor: Stand alone | (1) CRT Trolley table | | Loadlock type: Narrow body | Indexer/Handler type: Tilt out | Loadlock vents: Fast vent | Wafer mapping installed: No | Wafer out of slot detector: No | | 2nd Generator rack installed: Yes | Short gen rack: No | 2nd GenRack water leak detector: No | 2nd GenRack smoke detector: No | 2nd GenRack water flow intlk: No | GenRack "Plasma On" Light: No | 2nd GenRack RF Water solenoid: No | GenRack prot. plastic covers: No | GenRack door open interlock: No | 3rd Generator rack installed: No | | Anti-flake controller & power supply installed: Yes | (1) Neslab | Neslab water resistivity indicator: Resistivity meter | Water flow interlock (Neslab): No | Neslab protective plastic covers: No | (3) Cryo compressors | Mainframe to system controller: 25' | Mainframe to generator racks: 75' | | PVD Chamber Configuration: | Chamber 1: | Application type: Vectra + Ti | Coherent: No | 101 Application: No | Source type: G12 | Chamber body: WB | Wafer pedestal lift: Motorized | Wafer heater: ESC | EMO on source cover: No | Shutter: None | Cryo gate valve: 3PGV | Magnet type: RH-2 | Magnet part number: 0010-21676 | Sel aligning lid: None | Clamp ring material: None | | Chamber 2: | Application type: Al Hot | Coherent: No | 101 Application: No | Source type: 12.9" | Chamber body: WC | Wafer pedestal lift: Motorized | Wafer heater: MCA+ | EMO on source cover: Yes | Shutter: None | Cryo elbow window: Yes | Cryo gate valve: 2PGV | Magnet type: Dura | Magnet part number: 0010-00225 | Clamp ring material: None | Cryo type: Fast | | Chamber 3: | Application type: Al Hot | Coherent: No | 101 Application: No | Source type: 12.9" | Chamber body: WC | Wafer pedestal lift: Motorized | Wafer heater: MCA | EMO on source cover: Yes | Shutter: None | Cryo elbow window: Yes | Cryo gate valve: 2PGV | Magnet type: Dura | Magnet part number: 0010-00225 | Self aligning lid: None | Clamp ring material: None | Cryo type: Fast | | Chamber 4: | Application type: ALPS | Coherent: No | 101 Application: No | Source type: G12 | Chamber body: WB | Wafer pedestal lift: Motorized | Wafer heater: ESC | EMO on source cover: No | Shutter: None | Cryo gate valve: 2PGV | Magnet type: ALPS | Magnet part number: 0021-04521 | Clamp ring material: None | | Chamber C: | Application type: PC2 | Coherent: No | 101 Application: No | Wafer pedestal lift: Pneumatic | | Chamber D: | Application type: TTN G12 | Coherent: No | 101 Application: Yes | Source type: G12 | Chamber body: WB | Wafer pedestal lift: Motorized | Wafer heater: A101 | EMO on source cover: No | Shutter: Leakage | Shutter disk material: None | Cryo gate valve: 2PGV | Magnet type: G12 | Magnet part number: 0010-20768 | Clamp ring material: None | | Support Chambers A-F, 5 | Chamber A: | Chamber type: CD | RGA Options: Degas | Temp Monitor: No | | Chamber B: | Chamber type: CD | RGA Options: Degas | Temp Monitor: No | | Chamber C: | Chamber type: PCII | RGA Options: Degas | | Chamber D: | RGA Options: Degas | Temp Monitor: No | | Chamber E: | Chamber type: Degas | RGA Options: Degas | Temp Monitor: No | EMO on chamber: No | Orienter hinge lid installed: No | PC Vacuum pump: Turbo pump | | Chamber F: | Chamber type: Degas | RGA Options: Degas | Temp Monitor: No | EMO on chamber: No | Orienter hinge lid installed: No | PC Vacuum pump: Turbo pump | | Chamber 5: | Chamber type: Holding | RGA Options: Degas | RGA Port: 2.75 cnflt | | Generator Rack Configuration: | Primary generator rack: | Relay Ctrl PCBs | Intlk Sel Bd | ISO Amp PCBs | ESC Chuck power supply: Ch 1-3 | AFS Controller | AFS Power supply | Type: MDX-L12 (Ch. 3) | Type: MDX-L12M (Ch. 3) | Type: MDX-L12 (Ch. 2) | Type: MDX-L12M (Ch. 2) | Type: MDX-L12-650 (Ch. D) | Type: MDX-L12M-650 | | Secondary generator rack: | EMO Button | Type: MDX-L12M-650 (Ch. 4) | Type: MDX-L12M-650 (Ch. 4) | Type: RFPP LF10A (Ch. C) | Type: MDX-L12M (Ch. 1) | Type: Comdel-13.56 MHz (Ch. C) | Type: Comdel CX-600S (Ch. 1) | Type: HFV 8000 (Ch. 1) | | Gas Box Configuration: | Gas Box #1: | 1: Ar, MFC: 50 N2, To Pos'n: 4 | 2: Ar, MFC: 20 N2, To Pos'n: 4 | 5: N2, MFC: 300 N2, To Pos'n: D | 6: Ar, MFC: 100 N2, To Pos'n: D | 7: Ar, MFC: 50 Ar, To Pos'n: NA | 8: N2, MFC: 300 N2, To Pos'n: 3 | 9: Ar, MFC: 100 N2, To Pos'n: 3 | 10: Ar, MFC: 10 Ar, To Pos'n: 3 | | Gas Box #2: | 20: Ar, MFC: 10 Ar, To Pos'n: 2 | 19: Ar, MFC: 100 N2, To Pos'n: 2 | 18: N2, MFC: 300 N2, To Pos'n: 2 | 17: Ar, MFC: 10 Ar, To Pos'n: 2 | 16: Ar, MFC: 100 N2, To Pos'n: 1 | 15: N2, MFC: 300 N2, To Pos'n: 1 | 12: Ar, MFC: 300 N2, To Pos'n: C | 11: Ar, MFC: 20 N2, To Pos'n: C | | Voltage: 200 VAC, 3-Ph | Frequency: 50/60 Hz | Full-load current: 502 Amps | Maximum system rating: 150 KW | Ampere rating of largest load: 42 A | Interrupt current: 10,000 Amps I.C. | | 1995 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    180138
    Category:
    Reactors
    Sputter Al System, 8" | | System: | Chamber 1: PVD Wide body, Sputter PVD | Chamber 2: PVD Standard H2O cooled, Sputter PVD | Chamber 3: PVD Standard H2O cooled, Sputter PVD | Chamber 4: PVD Wide body, Ti-Ni | Chamber A: Pass through | Chamber B: Cool down | Chamber C: Preclean II, Metal etch | Chamber D: Preclean II, Metal etch | Chamber E: Orienter / Degas | Chamber F: Orienter / Degas | | Wafer type: 8" notch | Buffer robot type: HP | Buffer robot blade: Metal | Wafer sensors: Cassette Pres. | Software revision: E8.86 | Loadlock type: Narrow body with tilt out | Signal tower: Red-Amber-Green | Fab installation: TTW | System umbilicals: 50 ft standalone | EMO's: Momentary | Loadlock pump type: Alcatel | Heat exchangers: none | No Neslab CHX option | Hard drive: 5 Gb | Chase CRT: Yes | Subfab: No | CR OTF: No | Shield treatment: No | | Chamber A: Pass through | Gas valves: Nupro | Slit valve O-ring: Viton (black) | Chamber O-ring: Viton (black) | | Chamber B: Cooldown | Gas valves: Nupro | Slit valve O-ring: Viton (black) | Chamber O-ring: Viton (black) | Manometer: None | Heater / cathode cooling: Other | Chamber pump: None | | Chamber C: Preclean II | Chamber Process: Metal etch | Susceptor / pedestal: Sputter etch | Process kit type: Other | Manometer config: Single | Lid type: Other | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: None | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: RFPP LF10A | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: Comdel CPS 1001S | RF match: Bias match | Chamber lid clamps: No | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 28 sccm, Argon, STEC 4400 MC Mtl Seal, MFC11, Standard gas stick config | Gas 2: MFC 420 sccm, Argon, STEC 4400 MC Mtl Seal, MFC12, Standard gas stick config | Gas valves: Nupro | | Chamber D: Preclean II | Chamber Process: Metal etch | Susceptor / pedestal: Sputter etch | Process kit type: Other | Manometer config: Single | Lid type: Other | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: None | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: RFPP LF10A | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: Comdel CPS 1001S | Heated valve stack: No | Chamber O-rings: Viton (brown) | RF match: Bias match | Chamber lid clamps: No | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 28 sccm, Argon, STEC 4400 MC Mtl Seal, MFC9, Standard gas stick config | Gas 2: MFC 420 sccm, Argon, Unit 161 Digital, MFC10, Standard gas stick config | Gas valves: Nupro | | Chamber 1: PVD Wide body | Chamber Process: Sputter PVD | Susceptor / pedestal: 101 | Process kit type: Other | Manometer config: Single | Lid type: Enhanced cooled | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: None | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: AE MDX L12M | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: AE MDX-L12 | Heated valve stack: No | Chamber O-ring: Viton (brown) | RF match: None | Chamber lid clamps: Yes | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 300 sccm, Nitrogen, Unit 1661 Digital, MFC15, Standard gas stick config | Gas 2: MFC 140 sccm, Argon, STEC 4400 MC Mtl Seal, MFC16, Standard gas stick config | | Chamber 2: PVD Wide body | Chamber Process: Sputter PVD | Susceptor / pedestal: Clamped pedestal | Process kit type: Al | Manometer config: Single | Lid type: Other | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: Other | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: AE MDX L-12M | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: AE MDX-L12 | Heated valve stack: No | Chamber O-ring: Viton (brown) | RF match: None | Chamber lid clamps: Yes | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 300 sccm, Nitrogen, STEC 4400 MC Mtl Seal, MFC18, Standard gas stick config | Gas 2: MFC 140 sccm, Argon, STEC 4400 MC Mtl Seal, MFC19, Standard gas stick config | Gas 3: MFC 50 sccm, Argon, STEC 4400 MC Mtl Seal, MFC20, Standard gas stick config | | Chamber 3: PVD Wide body | Chamber Process: Sputter PVD | Susceptor / pedestal: Clamped pedestal | Process kit type: Al | Manometer config: Single | Lid type: Other | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: Other | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: AE MDX 4.12M | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: AE MDX-L12 | Heated valve stack: No | Chamber O-ring: Viton (brown) | RF match: None | Chamber lid clamps: Yes | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 70 sccm, Argon, STEC 4400 MC Mtl Seal, MFC1, Standard gas stick config | Gas 2: MFC 140 sccm, Argon, Unit 1661 Digital, MFC2, Standard gas stick config | | Chamber 4: PVD Wide body | Chamber Process: Ti-Ni | Susceptor / pedestal: 101 | Process kit type: Other | Manometer config: Single | Lid type: G12 | Wall cooling: None | Chamber pump: Alcatel | Manometer 1: 100m Torr | Throttle valve: None | Heater / cathode cooling: None | Pump configuration: Cryo | Manometer 2: None | RF Gen/DC supply 1: AE MDX L-12M | Endpoint system: No | Turbo pump: No | Slit valve O-ring: Viton (black) | RF Gen/DC supply 2: AE MDX-L12 | Heated valve stack: No | Chamber O-ring: Viton (brown) | RF match: None | Chamber lid clamps: Yes | Magnet number: NA | | Chamber gasses: | Gas 1: MFC 50 sccm, Argon, STEC 4400 MC Mtl Seal, MFC4 | Gas 2: MFC 140 sccm, Argon, STEC 4400 MC Mtl Seal, MFC5 | Gas 3: MFC 100 sccm, Nitrogen, STEC 4400 MC Mtl Seal, MFC6.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9038549
    Category:
    Reactors
    HP-PVD system, 8" | | Includes: | (2) STD | (2) WB | (2) OD (Heater) | (2) HP | 3P, 9600 | DC Power | NBLL | | Deinstalled | 1999 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    117302
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2002 
    Barrier / seed, 8" wafers (SNNF) | SMIF | | CH A – Pass through | CH B – Cool Down | CH C – Pre-Clean IIe ceramic | CH D – Pre-Clean IIe ceramic | CH E – Orient / Degas | CH F – Orient / Degas | CH 1 – | PVD SIP Ta | Wide Body with shutter | 2x Pinnacle | Comdel 600S | SLT ESC | Backside Ar | CH 4 – | PVD SIP Cu | Wide Body with shutter | 2x Pinnacle | Comdel 600S | SZB ESC | Backside Ar | | Active Thermal Science Chiller | Heat Exchanger - Neslab | Wide Body load locks | Transfer chamber robot – VHP | Buffer chamber robot – HP+ | Synergy V452 SBC | Enhanced CTI Fast regen cryo pumps | CTI 9600 cryo compressors | | 2002 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9038550
    Category:
    Reactors
    HP-PVD system, 8" | | Includes: | (3) WB | (2) STD | (2) HP | (1) OD (Heater) | (1) ORT | 3P, 9600 | DC Power | NBLL | Missing some parts | | Deinstalled | 1999 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037980
    Category:
    Reactors
    System, 8" | Water-cooled standard body chamber.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037981
    Category:
    Reactors
    System, 8" | Standard body chamber.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9020696
    Category:
    Reactors
    Wafer Size:
    12" 
    Vintage:
    2007 
    PVD system, 12" | (2) IMP PVD | (2) TxZ | (2) PCII | 2007 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037982
    Category:
    Reactors
    System, 8" | PreClean II chamber.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9038551
    Category:
    Reactors
    Wafer Size:
    8" 
    HP system, 8" | | Includes: | (2) STD | (2) WB | (2) OD | (2) HP+ | 3P | CTI9600 | NBLL | | Powered down | 1995 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9036959
    Category:
    Etchers / Ashers
    MOCVD System, 8" | Wafer Shape: SNNF | | Chambers: | Position 1- Titanium Vectra IMP TI | Position 2- CVD TxZ | Position 3- CVD TxZ | Position 4- Titanium Vectra IMP TI | Position A- Pass Thru | Position B- CoolDown with Temp Monitor | Position C- Preclean II | Position D- Preclean II | Position E- Orienter Degas with Temp Feedback | Position F- Orienter Degas with Temp Feedback | | Loadlock- Wide Body | Buffer Robot: HP+ | Transfer Robot: VHP.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9000614
    Category:
    Reactors
    Wafer Size:
    6" 
    System, 6", 2005 vintage.
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