APPLIED MATERIALS ENDURA Products

  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116764
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1998 
    PVD system, 8" | Cleanroom Interface: Endura HP Front Panel | PVD Endura type controller | | (2) WB Ti PVD chambers | (1) SB Al PVD chamber | (1) SB TiN PVD chamber | | Chamber A: | Quartz Viewport lid | | Chamber B: | Cool down with temperature monitor | Quartz viewport lid | 02 Manifold | | Chamber C: | PC II Type | Reactive preclean | Leybold TMP | | Chamber F: | Orienter with standard degas | | HP Transfer and buffer robots | Blade selection: Original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI Fast regen cryo | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD: | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 3/4: | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | | Components: | Main body | RF Power | Misc parts | AC controller | Cryo pumps | Pump 2 | Neslab chiller | RF power | AC box | | 1998 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9023340
    Category:
    Reactors
    Wafer Size:
    8" 
    System, 8" | | Cleanroom interface: Endura HP front panel | PVD Endura type controller | Chamber A | Quartz viewport lid | Chamber B | Cooldown with temperature monitor | Quartz viewport lid | 02 manifold | Chamber C - pre-clean chamber | Reactive pre-clean | Leybold TMP | Chamber E/F - orienter | Orienter with standard degas | HP transfer and buffer robots | Blade selection: original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI fast regen cryo single-phase | PVD wafer chuck option: unclamped | 101 pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option.: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD | Customer special application / CES section | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: unclamped | 101 pedestal type | Lift options: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck options: unclamped | 101 pedestal type | Lift options: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    148093
    Category:
    Reactors
    PVD system, 8" | | Wafer Shape: SNNF | Umbilicals For Remote Item: 25ft | Umbilicals For MF To CTL: 25ft | Position 1: Ti /Standard Body | Position 2: WB | Position 3: AL /Standard Body | Position 4: AL /Standard Body | Position A: Cool Down | Position B: Pass Cool Down | Position C: PCII | Position D: Blank | Position E: Orient/Degas | Position F: Orient/Degas | | Electrical requirements: | Line Voltage: 408V | Line Frequency: 60Hz | Facility Power Indicator: Yes | Transformer Type: 225kVA Step Down | | Chamber 1: | Application: Standard source | Magnet P/N: 0010-20819 | Chamber Body: Standard | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cover Ring Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 2: | Application: Standard source | Magnet P/N: 0010-21818 | Chamber Body: Wide Body | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 3: | Application: AL Source | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber 4: | Application: AL | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SUS | Cryo Gate Valve: starderd | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber A Pass: | Target Water Flow Interlock: None | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: None | | Chamber B Cool down: | Chamber Type: Cooldown | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: ClnCool | | Chamber C: | RF Match: None | Power Supply(kw): Comdel CPS-1001S 13.56MHz | Turbo pump: None | | Chamber D: Blank: Blank | | Chamber E: | Orient Degas Type: Standard | Power Supply(kw): RFPP LF-10 | Temp Feedback: Yes | | Chamber F Orient: | Orient Degas Type: None | Temp Feedback: None | | Gas panel configuration: | Gas Delivery Type: AMAT Spec | Proc Htr Vent Gasline Valves: Veriflo 10Ra | Gasline Fittings: Cajon | Gasbox Pneumatic Valves: Single | Process And Htr Gasline Filter: Pall Ultramet-L Gaskleen | Cooldown Filter: Pall Ultramet-L Gaskleen | Loadlock And Mainframe Filters: Pall Ultramet-L Gaskleen | Gasline Gas Box Exit: Over the Top | MFC Type: STEC 4400 | Digital Option: Yes | | General Mainframe: | Front Panel Options: Painted | Front Panel EMO Cover: Yes | Status Light Tower Required: Yes | Status Light Tower Type: 4 Light | Light Combination: RYGB | Communication Interface: SECS | Slit Valve Doors: STD | Slit Valve Pressure Regulator: Yes | Buffer Cryo Light Screen: Yes | | Loadlock / Cassette: | Loadlock Type: NB LL | Indexer and Handler Type: Universal Manual W/Rotate | Enhanced Wafer Mapping: YES | Loadlock Vent Type: Variable Speed Soft Vent | Wafer Out of Slot Detector: None | Cassette Material: Plastic | Pump Down: Variable Speed Programmable | Customer Provided Automation: None | SMIF Type: None | | Buffer/Transfer chamber: | Transfer Robot Type: HP | Buffer Robot Type: HP | HP Plus Arm Leveling Tool: No | Transfer And Buffer Lid Hoist: None | Robot Characterization Fixture: No | Slit Valve: STD | Slit Valve Pressure Regulator: Yes | | Detailed mainframe info: | Front Panel Bezel: Painted | Door Covers: Painted | System Water Lines: SST Seal Lok | Facility Water in Mainframe: Yes | System Vent Label: Ar & N2 | Preclean Exhaust Size: N/A | | Status light tower: | Lamp Colors: RYGB | Number Of Lamps Per Tower: FOUR | Top Signal: Fault | Upper Middle Light Signal: Auto And Idle | Lower Middle Light Signal: Ready To Load/Unload | Bottom Signal: Warning Occur | UPS Option: No | Number of Poles | Controller AC Power Feed: Top | Bottom Rear Door: Swing Out | Software Revision: C8.51 | Ion Gauge Type: Nude | | RF Generator rack: | Generator Rack Type: PVD Endura Type | 2nd Generator Rack Required: Yes | Cable Length, 1st to 2nd GenRack: 6' | Preclean Power Supply Config: PC in Rack 2 Only | Bottom Rear Door: Swing Out | Gen Rack AC Power Feed: Top | Water Leak Detector: Yes | | Compressor and cryo pump: | Cryo Compressor Type: Water Cooled 8510 | Cryo Compressor Qty: 2 | Cryo Helium Lines: 3/4"x40' | Cryo Flex Line Elbow onCompressor: Yes | Cryo Flex Line Elbow onMainframe: Yes | Cryo Pump Type: Enhanced Fast Regen Low Vibration | Cryo Power Phase: 2 Ph | | Heat exchanger: | Heat Exchanger Type: Neslab system 3 | Resistor Meter: Yes | | System Monitors: | Monitor Qty: 2 | Monitor 1: STAND ALONE | Monitor 1 Cable Length: 35' | Monitor 2: STAND ALONE | Monitor 2 Cable Length: 35' | | DC Power supplies: | DC Power supplies 1: 24V | DC Power supplies 2: 15V | | Pump: | Pump: System: Smart Pump Interface Only | | 1997 vintage.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9036511
    Category:
    Reactors
    PVD system, 12" | Idle date: Q4 2012 | Install type: stand-alone | | Factory interface (ver. 5.3): | (3) 300mm FOUP load-ports | 25-slot FOUP support | Status lamp (programmable) | | System configuration overview: | LLKs: (SWLL): cool down | Ch-E/F: DMD Degas | Ch-A/B: cool down (std) | Ch-C: blank | Ch-D: blank | Ch-1: PVD_SIP | Ch-2: PVD_SIP | Ch-3: PVD_eSIP | Ch-4: PVD_eSIP | Ch-5: blank | | Main Frame (M/F): | M/F type: Endura II | Buffer/transfer robot type: XP | User interface stations (roll-around) | | Process chambers: | | Ch-1/2: PVD SIP Ti | | AE DC power supplies: | Master PS PN: 0190-08122 | Slave PS PN: 0190-08122 | | Bias PS: ENI GHW-12Z | | Magnet type: SIP | | Process tit: | Upper shield PN: 0020-23549 | Lower shield PN: 0020-02344 | Inner/mid shield PN: 0020-54777 | Inner/mid shield clamp PN: 0020-08299 | Lower shield clamp PN: 0020-02348 | Dep ring PN: 0200-08301 | Cover ring PN: 0021-17770 | Insulator PN: 0200-01326 | Shutter disc PN: 0021-25014 | | Ch-3/4: PVD eSIP | ƒ | Optima DC power supplies: | Master PS PN: 0190-19810 | Slave PS PN: 0190-19811 | | Bias PS: ENI GHW-12Z | | Magnet type: eSIP, 2-position | | Process kit: | Lower shield PN: 0020-48303 | Inner/mid shield PN: 0020-60810 | Lower shield clamp PN: 0020-48304 | Dep ring PN: 0200-03346 | Cover ring PN: 0020-48305 | Insulator bushing PN: 0200-01326 | Shutter disc PN: 0020-45231 | | Cryo compressor(s): | (2) Helix/CTI IS-1000 | | Heat exchanger: | (1) Daikin | | Pumps: | LLK Pump: (1) Alcatel A100L iPUP
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9037983
    Category:
    Spare Parts
    Various modules and parts for Endura 5500, 8".
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9015795
    Category:
    Reactors
    PVD System, 8" | | Cleanroom Interface: Endura VHP Front Panel | PVD Endura Type Controller | PVD Endura Type Remote Generator Rack | | Secondary Generator Rack: | (2) 9600 System Cryo Compressors | Transfer & Buffer Lid Hoist | CE Mark | | CHAMBER A | Pass-Through Chamber | Quartz Viewport Lid | | CHAMBER B | Cooldown with Temperature Monitor | Quartz Viewport Lid | O2 Manifold | | CHAMBERS C/D | (2) Reactive Preclean (RPC) Chambers | Preclean UHV Pump Options: Leybold TMP | Preclean Smart Pump Interface Kit | | CHAMBER E/F | (2) Orienters with Enhanced Degas | | TRANSFER ROBOT | VHP Robot | | BUFFER ROBOT | HP Robot | | SYSTEM PUMP OPTION | CTI Enhance Fast Regen Low Vibration 3-Phase Cryo - One Each for Transfer & Buffer Chambers | | SYSTEM PUMP/INTERFACE COMBINATION | System Smart Pump Interface Kit (Subject to Availability) | | CHAMBER 2 | Refractory Widebody PVD SIP Ta(N) Chamber | Power Supply Options: 24 kW Two Box, Power Supply Mini Panel | PVD Wafer Chuck Options: SZBESC style e-chuck | Shield Material: Stainless Steel two-piece | | CHAMBER 3 | Widebody PVD SIP Cu Chamber | PVD Power Supply Options: 40kW 2 box with Arc Out, Power Supply Mini Panel | PVD Wafer Chuck Options: SLT ESC | Ceramic Cover Ring | | Both CHAMBER 2/3 have the following options: | PVD UHV Pump Options CTI Enhanced Fast Regen Low Vibration 3-phase Cryo | Wafer Bias Power Supply: IMP 13.56MHz Bias Power Supply H/W | 3-Position Gate Valves | Standard Cryo Restrictors | Chamber Conditioning Options: Mag-Coupled Shutter | Configuration: Endura Electra Cu.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    128804
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1997 
    AL-2 (ALPS) deposition system, 8" | | Specifications: | Wader size: 8" | Wafer shape: SNNF | Load Lock: Auto tilt narrow body | E/F: Orienter/Degas | C/D: Preclean II | A/B: Pass/Cool down | 1: IMP | 2/3: HP+ TxZ | | Chamber Type / Location: | Transfer Chamber: | Position 1: Titanium | Position 1 Process: Vectra IMP Ti | | Position 2: CVD TiN | Position 2 Process: HP+ TxZ | | Position 3: CVD TiN | Position 3 Process: HP+ TxZ | | Position 4 and 5: N/A | Position 4 and 5 Process: N/A | | Buffer Chamber: | Position A: Pass Thru | Position A Process: Pass Thru | | Position B: Cooldown | Position B Process: STD Cooldown | | Position C: PCII | Position C Process: Pre-Clean | | Position D: PCII | Position D Process: Pre-Clean | | Position E: Orienter | Position E Process: Orient with STD Degas | | Position F: Orienter | Position F Process: Orient with STD Degas | | Electrical requirements: | 50/60Hz, 208V, Facilities power indicator | System UHV: Fast Regen Low Vib cryo pump | | System safety equipment: | "Emergency Off" Label Yes | EMO Button Guard Ring Yes | EMO Under Monolith No | Primary Side Trip Amperage 3P 600VAC 600A Trip Unit | G F I on Primary with EMO Yes | G F I On Secondary No | G F I Component - | Circuit Breaker on No | G F I Trip Amperage No | System Water Leak Detector Yes | System Smoke Detector Yes | Additional Smoke Detector No | Mainframe Water Interlock Yes | Support Ch facility interlock No | Monolith Bakeout Heater No | AC Boxes Indicator Lamp Incandescent | System Lebels Language English Only | RF Gen LOTO Switch Location At Generator Rack | | System UV: | System Cryo Pump Type Fast Regen Low Vib | | PVD Chamber configuration: | Position | Chamber conditioning: 1 | Shutter: Linkage | | Chamber Safety: | Chamber lid clamp level extension: Yes | Target water flow interlock: Yes | Coh Src Adaptor water Fl Intlk: No | | Chamber Safety: | Wafer bias power supply HW: 13.56 | RF match type: 0.16u | | Process Info: | Magnet type: RH-2 | Magnet P/N: 0010-21676 | Magnet shim thickness: 0.75mm | | CVD Chamber configuration: | Position 2 and 3: | Application: CVD TiN | Process Type: HP + TxZ | CVD Ampoule level sensor: TDMAT | CVD Ampoule lifter: No | CVD Ion gauge: No | | Gas delivery option: | Gas delivery type: AMAT spec | Proc Htr Vent gasline valves: AMAT spec | Gasline fittings: AMAT spec | Gas line clamps: Np | Gas box pneumatic value: Single | Process and Htr gasline filter: Pall Ultramet-L Gaskleen | Cooldown filters: Pall Ultramet-L Gaskleen | Loadlock and mainframe: Pall Ultramet-L Gaskleen | CVD MFC type: Stec 4400 | CVD gas panel vale type: Veriflo 10RA | CVD gas panel fitting type: AMAT spec | CVD gas panel filter type: Pall Ultramet-L Gaskleen | Heater gas QTY: 1 | First heater gas: N2 | First heater MFC size: MKS 100 | First MFC Cal gas: N2 Cal | First heater MFC position: Ch#2: 18 ; Ch#3: 3 | | CVD TiN Gas Line: | (1) 500 HE | (2) 1000 H2 | (3) 1000 N2 | (4) 1000 HE | (7) 1000 AR | (19) 3000 N2 | (20) 2000 N2 | | Gas delivery options: | Pressure indicator: Digital | Manual shut off valve: Yes | | Mainframe options: | Transfer and buffer lid hoist: STD lid hoist | Robot characterization fixture: No | | Detailed mainframe info: | Front panel bezel: No painted | Door covers: Painted | System water lines: SST seal Lok | | Remote options: | UPS option: Yes | Controller AC power feed: Bottom | Controller bottom exhaust fan: Yes | Bottom rear door: Swing out | Ion gauge type: Nude | Wide adaptor for ion gauge: No | PC ion gauge without elbow: Yes | CVCF Interface: Yes | | Generator racks: | MCA rack + AC module: No | Generator rack type: PVD Endura type | 2nd generator rack required: Yes | Cable length: 6’ | Gen rack water flow interlock: Yes | | Compressure option: | Cryo comp water flow interlock: No | Special Cryo Helium maniforld: No | Cryo comp water fittings: No | | Heat exchanger option: | Heat exchanger type: NESLAB III | Second heat exchanger type: None | CVD Heat exchanger type: AMAT 0 | | System monitors: | Monitor QTY: 3 | Monitor 1: STD Alone | Monitor 2: Through the wall | Monitor 3: STD alone | Monitor switch location: Controller | | Currently stored in a cleanroom | 1997 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9031008
    Category:
    Reactors
    PVD system, 6" | | System configuration | 1. ALCu(Clamp) | 2. Wide-Ti(A101) | 3. Wide-Ti(A101) | 4. STD-AL-Si-Cu(Clamp) | 5.- | A.Pass | B.Cool | C.PC2 | D.PC2 | E.ORIENTER-DEGAS | F.ORIENTER-DEGAS | BUFFER: HP | XFER: HP | LL: NARROW | Magnet: Dura&G12 | Pumps: EBARA AA40WN, AA40W, AA70W | | Missing parts: | SBC | FDD | 24V Power supply | | 1994 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    117302
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2002 
    Barrier / seed, 8" wafers (SNNF) | SMIF | | CH A – Pass through | CH B – Cool Down | CH C – Pre-Clean IIe ceramic | CH D – Pre-Clean IIe ceramic | CH E – Orient / Degas | CH F – Orient / Degas | CH 1 – | PVD SIP Ta | Wide Body with shutter | 2x Pinnacle | Comdel 600S | SLT ESC | Backside Ar | CH 4 – | PVD SIP Cu | Wide Body with shutter | 2x Pinnacle | Comdel 600S | SZB ESC | Backside Ar | | Active Thermal Science Chiller | Heat Exchanger - Neslab | Wide Body load locks | Transfer chamber robot – VHP | Buffer chamber robot – HP+ | Synergy V452 SBC | Enhanced CTI Fast regen cryo pumps | CTI 9600 cryo compressors | | 2002 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9033015
    Category:
    Reactors
    System.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9036092
    Category:
    Reactors
    PVD System, 8" | Wafer handling: SMIF | Front panel type: wide body | Software version: B88810 | Single board computer in controller: Yes | Ion gauges: Yes | | Robots (standard, HP, HP+, VHP, etc): | Buffer robot: HP+ | Transfer robot:HP+ | Blade material: Metal | Blade material: Metal | Load Lock: Wide Body | Narrow Body: tilt-out | Index handler type: | Loadlock vents: N2 vent | | Basic Chamber setup: (PC II, Cooldown, O/D, pass through, CVD, other - w/o details) | A: Cool down | B: Cool down | C: Pre clean II | D: Pre clean II | E: Orient / Enhanced degas | F: Orient / Enhanced degas | | Process: VECTRA IMP Ti | Platform: Endura | RF coil power supply: Advance Energy HFV 8000 | Chamber temperature: Heater 100°C - Bake 30% | Pump Type: CTI 8F Enhanced Fast Regen Low Vib | MFC #1: Argon Heater | MFC #1 type / size: Stec SEC-4400M 50 Sccm | MFC #2: Argon Final | MFC #2 type / size: Stec SEC-4400M 100 Sccm | Source type: Vectra IMP | Target type / vendor: D-Bond 0.25" - Honeywell | Target part # 7VX00236 | Coil part # 7VX20266 | Magnet type / part number: Type RH-2 P/N 0010-21676 | Ar Psi: 20 PSI | Power supply: MDX 12KW | Shutter: Linkage | Heater: Original 4F | Process Kit (type/desc): IMP Process Kit Version 4.5 | Upper Shield Part No: 0020-22498 | Lower Shield Part No: 0020-22499 | Shield Clamp Kit Part No: 0240-25440 | DC Bias Hardware Kit PN: 0240-20021 | | Process: CVD TiN | Platform: ENDURA | Chamber temperature: 400°C | Chamber type: TxZ HP+ | Heater: AMAT P/N 0010-03244 | Pump Type: ALCATEL 602 P | HX: AMAT 1 | HX temperature: 60°C | MFC #1: Argon Edge Purge | MFC #1 type / size: Stec SEC-4400M 3000 Sccm | MFC #2: Argon BTPur | MFC #2 type / size: Stec SEC-4400M 2000 Sccm | MFC #3: He Carrier | MFC #3 type / size: Stec SEC-4400M 500 Sccm | MFC #4: N2 Dil | MFC #4 type / size: Stec SEC-4400M 1000 Sccm | MFC #5: He Dil | MFC #5 type / size: Stec SEC-4400M 1000 Sccm | MFC #6: N2 | MFC #6 type / size: Stec SEC-4400M 1000 Sccm | RF Power supply: ADVANCE ENERGY PDX 900-2V | HE carrier pressure: 18 PSI | HE DIL pressure: 30 PSI | Ampole temperature: 50°C | Gas line temperature: 60°C | Hot Box: 70°C | CVD Ion gauge: Absent | Process Kit (type/desc) | INSERT LINER EXHAUST TXZ 200MM: 0021-02469 | RING, LOWER, ISOLATOR: 0021-02155 | RING, MIDDLE, ISOLATOR: 0021-02156 | EDGE RING, PURGE HEATER, 200MM TXZ: 0021-03094 | SCREW, CENTERING PURGE HEATER 200MM TXZ: 0021-07418 | OUTER SHIELD W/O WINDOW, TXZ CHAMBER: 0021-03980 | INNER SHIELD HP TXZ IMP. UNIF.: 0040-06127 | PIN, LIFT, TXZ HEATER: 0200-01798 | PLATE,BLOCKER,TXZ 200MM: 0021-35744 | FACE PLATE, BKM3 TXZ 200MM: 0040-01878 | CHAMBER INSERT 200MM TXZ CIP: 0200-00261 | ISOLATOR, SIN, ENH, PUMPING LID, DXZ GECO: 0200-10163 | TUBE GAS FEED: 0020-31425 | LID LINER, HPTXZ: 0200-00689 | | Process: PVD TiN | Platform: ENDURA | Ch temp control: Without temp control | Chamber type: WB | Pump Type: CTI 8F Enhanced Fast Regen Low Vib | MFC #1: Argon | MFC #1 type / size: Stec SEC-4400M 100 Sccm | MFC #2: N2 | MFC #2 type / size: Stec SEC-4400M 200 Sccm | Source type: G-12 | Target type / vendor: D-Bond 0.35" - Praxair | Target part #: 7VX00135 | Magnet type / part number: Type G-12 P/N 0010-20768 | N2 Psi: 20 PSI | Ar Psi: 20 PSI | Power supply: MDX - L12M - 650 | Shutter: Linkage | Heater: SST Pedestal Unclamped 101 | Process Kit (type/desc): Shield Mounting G12 btn hd | Upper Shield Part No: 0020-25730 | Lower Shield Part No: 0020-25077 | Pedestal Part No: 0021-22028 | Cover Ring Part No: 0020-24914 | | Process: Pre-clean | Pedestal type: Preclean II Pik1 | Power supply 1: 400 KHz | Power supply 2: 13.56 MHz | | Gasline fittings: VCR | Loadlock fittings: VCR | MFC type: Millipore / STEC | | Paste chamber: NA | Chamber cryo pump type: CTI 8F Enhanced Fast Regen Low Vib | | Umbilicals: | Mainframe to controller: ~25 ft | Mainframe to generator racks: ~25 ft | Mainframe to cryo compressor: ~25 ft | Main AC to system controller/sys. AC: ~25 ft | Syst cont/sys AC to primary Gen rack: ~25 ft | Main AC to primary generator rack: ~25 ft | Main AC to pump frame: ~25 ft | Main AC to Neslab heat exchanger: ~25 ft | Monitor cable: ~25 ft | Monitor2 cable: ~25 ft | Monitor3 cable: ~15 ft | | EMO button guard ring: Yes | Water leak detector: yes | Buffer and transfer lid hoist: Yes | | Support Equipment: | AMAT 0 Heat exchanger 0010-76467 | | Cryo compressors: | (2) CTI Cryo pump 1 8135900G001 | | Neslab with resistivity meter | Soft copy pdf manuals | | Currently in a fab | 2003 vintage.
  • APPLIED MATERIALS: Endura PVD

    Details
    ID#:
    154922
    Category:
    Reactors
    Wafer Size:
    12" 
    IMP chambers, 12" | Vectra IMP source | Can be inspected.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9030867
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2002 
    PVD system, 8" | | LLKs NB w/Auto Tilt | A Pass-thru | B Cool Down | E O/D (Std) | F O/D (Std) | C Blank | D Blank | 1 PVD TiN A101 | 2 PVD TiN A101 | 3 PVD Vectra IMP Ti | 4 PVD Vectra IMP Ti | 5 blank | Bfr HP+ | Txfr HP+ | | Main frame: | User Interface (Front): Monitor & light pen (wall mount) | User Interface (System): Monitor w/Base & light pen (stand-alone) | Endura HP PVD Front Skin | LLK Door Safety Covers (sitting inside M/F) | Status Lamp (R/Y/G) | Front Bezel with LD/ULD control, piezo, & EMO) | SECS interface (RS232 Serial) | Integrated Monolith Bake-Out lamps | M/F Water Leak Detect | System Lift Hoist (non-AMAT): Type: Gantry (full system coverage), Loadmate 250lb motor | Ch-A: Pass-Thru: Metal Lid with Quartz viewport & clear cover | Ch-B: Cool-Down: Metal Lid with Quartz viewport & clear cover | Ch-E&F: O/D: Std Lamp array w/Temp Control | Missing: | Buffer Cryo Pump (3-Phase, fast regen) | (1) CTI 9600 Cryo Compressors | (1) Neslab III Heat exchanger | | Load locks: | Narrow Body | Auto Rotate & Tilt-out cassette indexers | 25-slot wafer cassettes | 2-Stage Vent | 2-Stage Pump (programmable) | Standard wafer mapping | | Buffer: | Lid type: Std (Al) | Robot Type: HP+ | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-on blade (std) | Gauge: Dual Filament Ion | Cryo Pump Type: 3-Phase, fast regen, Enhanced (low vibration) | | Transfer: | Lid Type: Std (Al) | Robot Type: HP+ | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-On-Blade | Gauge: Dual Filament Ion | Cryo Pump Type: 3-Phase, fast regen | | Chamber 1: PVD TiN | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: TiN | (2) PVD Source Lid Clamps (extended) | Self-Aligning Source Dowel Pins | Source assembly EMO Button: Twist-to-turn w/guard | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Lift Type: A101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Manual Iso-valve (for RGA / leak check) | | Chamber 2: PVD TiN | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: TiN | (2) PVD Source Lid Clamps (extended) | Self-Aligning Source Dowel Pins | Source assembly EMO Button: Twist-to-turn w/guard | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Lift Type: A101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Cryo Pump Type: 3-Phase, fast regen, Enhanced (low vibration) | Manual Iso-valve (for RGA / leak check) | | Chamber 3: PVD Vectra IMP Ti | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | EMO (Turn-to-Twist w/guard) | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Cryo Pump Type: 3-Phase, fast regen, Enhanced (low vibration) | Manual Iso-valve (for RGA / leak check) | | Chamber 4: Vectra IMP Ti | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | EMO (Turn-to-Twist w/guard) | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Manual Iso-valve (for RGA / leak check) | | System/AC: | S452 SBC | Side-Door CB Panel Clear Safety Cover | Rear, Lower Door Assembly w/Slide-out door | Missing: SEI PCB from Upper card cage and 3.5” (1.44MB) Floppy Drive | | | Equipment Rack #1: | Remote +/-15V Power Supply (std) | Turn-to-Release EMO w/guard | Ch-3 RF PS: Comdel CX-600S (13.56MHz) | Ch-4 RF PS: Comdel CX-600S (13.56MHz) | Ch-1 DC PS: AE MDX-L12M (Master) | Ch-2 DC PS: AE MDX-L12M (Master) | Ch-3 DC PS: AE MDX-L12M (Master) | Ch-4 DC PS: AE MDX-L12M (Master) | Ch-3 RF PS (Bias): AE HFV-8000 (2 MHz) | Ch-4 RF PS (Bias): AE HFV-8000 (2 MHz) | Rear, Lower Door Assembly w/Slide-out door | | Main AC: 208VAC Input Option | AC Disconnect Box | | System Cabling / Umbilical: | CNTRL to M/F: 25ft | Remotes to M/F: 50ft | PS cables: 50ft | Cryo Pump He lines (SS braided): 100ft | | Cryo Compressor: | (1) CTI 9600 with 3-Phase Motor control box | | Backing Pumps: Backing pumps are not included with this system | | Facility Requirements: | CDA | Gas: Ar, N2 | Vacuum (need backing pumps) | Power: 208480VAC, 296.3A (225KVA), 3-Phase, Freq 60Hz | | Missing parts: | Ch-E: lid cover dowel pins (should be 2 std), lower chamber cover | Ch-F: (1) lid cover dowel pin (should be 2 std), lower chamber cover | Ch-1: Pillow Blocks, Source Lift Shocks, Pedestal AC Box Assembly, Pedestal Water Box Assembly | Cryo Pump (3-Phase, fast regen) | | 2002 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9030866
    Category:
    Reactors
    PVD system, 8" | System software ver: C8.622 | System Platform: Endura | Wafer Shape: SNNF | EMO Type: Turn to Release | CE Safety Mark: English | CIM Configuration: SECS | SBC Version: V452 | | | Mainframe Configuration: | Buffer Robot Type: HP | Buffer Robot Blade: Thin Metal | XFER Robot Type: VHP | XFER Robot Blade: Original Metal | Lid Hoist: Yes | Status Light Tower: RYG | Remote Monitor: Table Mount | | Sub-System Configuration: | (1) Chiller: Model: None | Cryo Pump Type: CTI Cryo- on board 8F | Cryo Pump Power: 3 Phase | (2) CompressorS | Compressor Type: 9600 | | Loadlock Configuration: | Loadlock Type: Narrow body | Auto Rotation: Yes | Cassette Type: 8" | Mapping Function: WFM | Vent Type: Variable Speed | Fast Vent Option: Yes | | LLKs NB w/Auto Tilt | A Pass-thru | B Cool Down | E O/D (Std) | F O/D (Std) | C PCII w/Cryo Std | D PVD TiN 101 | 1 PVD Tungsten (W) HT-ESC - Chamber has UV Flash for ESC E-Clean | 2 PVD Hot-Al HT-ESC - Source Assy missing, Process kit still intact. | 3 PVD Hot-Al HT-ESC - Source Assy missing, Process kit still intact | 4 PVD Al/Cu SLT-ESC Complete | 5 Iso-Valve (Manual) - | Bfr HP | Txfr VHP (Style Lid) | | PVD Hot-Al Chambers: These are Water-Cooled Chamber bodies (can't use for other processes which use Wide-Body Chambers | | Gas Information: | Gas Box Pneumatic Valve: Single | Pneumatic Valve Type: Veriflo | Manual Valve Type: Veriflo | MFC Type: FC-780C | Gas Line Out: Out The Back | | | Modules: | M/F Yes | Sys/AC Yes | EQ1 Yes | EQ2 Yes | Main/AC Yes | AC Dist Box Yes | Cryo Comp 3 - 9600 | Heat Ex Yes, Neslab III | Pumps No Pumps included with any tools | Lift Hoist non-AMAT, Gantry & 250lb hoist | | Umbilical Configuration: | Controller to Main AC: 50 Feet | Controller to Mainframe: 50 Feet | Mainframe to Generator: 50 Feet | Remote Monitor: 50 Feet | Mainframe to Compressor: 50 Feet | Main AC to pump: 50 Feet | AC Box to Heat Exchanger: 50 Feet | Controller to Gen Rack: 50 Feet | Gen Rack to Gen Rack#2: 50 Feet | | Electrical Configuration: | Line Voltage: 200V | Full Load Current: 487A | Remote Transformer: No | Frequency: 60Hz | | Missing Parts: | Chamber E: Orientor PCB | Chamber F: Orientor PCB | Chamber 2: Missing upper chamber lid | Chamber 3: Missing upper chamber lid | Chamber C: Missing upper chamber lid | | | 1995 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9029635
    Category:
    Reactors
    Wafer Size:
    8" 
    System, 8" | HP wafer handler buffer and transfer chamber | NB load locks with SMIF transfer assembly | System controller | Main AC box | Remote pump rack including iQDP 40/QMB250 Edwards | Bezel with white door covers | Cryo compressors 9600 | Paste chamber (orienter wall with hoop) | | Chamber A: pass through | Chamber B: pass through | Chamber F: orienter degas | | Chamber 1: | Standard body non-water cooled | ALCU source 0020-23042 | 8F cryo fast regen | 2-position gate valve | | Chamber 2: | Wide body | TiN source | 8F cryo fast regen, 3 phase | 3-position gate valve | | Chamber 3: | Ti source | Wide body | 8F cryo fast regen, 3 phase | 3-position gate valve | | Chamber 4: | Ti source | Wide body | 8F cryo fast regen, 3 phase | 3-position gate valve | | Chamber D: | Pre-clean | Chiller | AMAT Neslab III | | Power supplies | | Can be inspected.
  • APPLIED MATERIALS: Endura 2

    Details
    ID#:
    9029839
    Category:
    Reactors
    PVD system, 12" | Currently installed.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9030039
    Category:
    Reactors
    PVD System, 6" | | LLKs NB w/Auto Tilt | A Pass-thru | B Cool Down | E O/D (Std) | F O/D (Std) | C PCII w/Cryo Std | D PVD TiN 101 | 1 PVD TiN 101 | 2 PVD AL 101 | 3 PVD AL HT-ESC | 4 PVD AL 101 | 5 Iso-Valve (Manual) - | Bfr HP+ | Txfr HP+ | | Modules: | M/F Yes | Sys/AC Yes | EQ1 Yes | EQ2 Yes | Main/AC No | AC Dist Box Yes | Cryo Comp 3 - 9600 | Heat Ex No | Pumps No Pumps included with any tools | Lift Hoist non-AMAT, Gantry & 250lb hoist | | Chambers: Original config had Water-cooled chambers since was originally AL Planarixed Hot Process, Whole chambers have been swapped for a Wide-Body Chamber now | | 1998 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9030865
    Category:
    Reactors
    PVD system, 8" | | LLKs NB w/Auto Tilt | A Pass-thru | B Cool Down | C Blank | D Blank | E O/D (Std) | F O/D (Std) | 1 PVD Vectra IMP Ti | 2 PVD Vectra IMP Ti | 3 PVD Tungsten (W) | 4 PVD Tungsten (W) | 5 Blank | LLKs: NB w/Auto Tilt | Bfr Robot Type: HP+ | Txfr Robot Type: HP | System lift hoist | | Main frame: | User Interface (Front): Monitor & light pen (wall mount) | User Interface (System): Monitor w/Base & light pen (stand-alone) | Endura HP PVD Front Skin | LLK Door Safety Covers | Status Lamp (R/Y/G) | Front Bezel with LD/ULD control, piezo, & EMO) | SECS interface (RS232 Serial) | Integrated Monolith Bake-Out lamps | M/F Water Leak Detect | System Lift Hoist (non-AMAT): Loadmate 250lb motor, ype: Gantry (full system coverage) | Ch-A: Pass-Thru: Metal Lid with Quartz viewport & clear cover | Ch-B: Cool-Down: Metal Lid with Quartz viewport & clear cover | Ch-E&F: O/D: Std Lamp array w/Temp Control, Pneumatic Iso-valve (for automated RGA / leak check) | Missing: | Buffer Cryo Pump (3-Phase, fast regen) | (2) CTI 9600 Cryo Compressors | (1) Neslab III Heat exchanger | | Load Locks: | Narrow Body | Auto Rotate & Tilt-out cassette indexers | 25-slot wafer cassettes | 2-Stage Vent | 2-Stage Pump (programmable) | Standard wafer mapping | | Buffer: | Lid type: Std (Al) | Robot Type: HP+ | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-on blade (std) | Gauge: Dual Filament Ion | | Transfer: | Lid Type: Std (Al) | Robot Type: HP | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-On-Blade | Gauge: Dual Filament Ion | Cryo Pump Type: 3-Phase, fast regen | | Chamber 1: PVD Vectra IMP Ti | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Lift Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Pneumatic (for automated PM source blow-out) | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Manual Iso-valve (for RGA / leak check) | | Chamber 2: | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | EMO (Turn-to-Twist w/guard) | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Pneumatic (for automated PM source blow-out) | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Pneumatic & Manual Iso-valves (for automated RGA / leak check) | | Chamber 3: | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: W | (2) PVD Source Lid Clamps (extended) | EMO (Turn-to-Twist w/guard) | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Type: A101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Pneumatic (for automated PM source blow-out) | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Pneumatic & Manual Iso-valves (for automated RGA / leak check) | | Chamber 4: | Chamber Type: Wide Body (WB) | Source Type: G-12 | Source Adaptor Type: W | (2) PVD Source Lid Clamps (extended) | Self-Aligning Source Dowel Pins | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Type: A101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Pneumatic (for automated PM source blow-out) | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Pneumatic & Manual Iso-valves (for automated RGA / leak check | | Chamber 5: blank, manual Iso-valve (for RGA/leak check) | | System/AC: | S452 SBC | Side-Door CB Panel Clear Safety Cover | Rear, Lower Door Assembly w/Slide-out door | Missing: 3.5” (1.44MB) Floppy Drive, OMS PCB from Upper card cage | | Equipment Rack 1: | Remote +/-15V Power Supply (std) | Turn-to-Release EMO w/guard | Ch-1 RF PS: Comdel CX-600S | Ch-2 RF PS: Comdel CX-600S | Ch-4 DC PS: AE MDX-L6 (Slave) | Ch-1 DC PS: AE MDX-L12M (Master) | Ch-2 DC PS: AE MDX-L12M (Master) | Ch-1 RF PS: AE HFV-8000 (2MHz) | Ch-2 RF PS: AE HFV-8000 (2MHz) | Rear, Lower Door Assembly w/Slide-out door | | System cabling / umbilical: | CNTRL to M/F: 25ft | Remotes to M/F: 50ft | PS cables: 50ft | Cryo Pump He lines (SS braided): 100ft | | Back pumps: not included | | Facility requirements: | CDA | Gas: Ar, N2 | Vacuum (need backing pumps) | Power: 208/480VAC, 231.8A, 3-Phase, Freq 60Hz | | Missing: | Ch-B: Cool Plate has been un-mounted from the chamber (still intact sitting on M/F) | Ch-E: lower chamber cover | Ch-F: lower chamber cover | Ch-1: IMP Source RF (Top Coil) Assembly Cryo Pump (3-Phase, fast regen) | Ch-2: IMP Source RF (Top Coil) Assembly, Cryo Pump (3-Phase, fast regen) | Ch-3: Missing Cryo Pump (3-Phase, fast regen) | Ch-4: Pillow Blocks, Source Lift Shocks, Missing Cryo Pump (3-Phase, fast regen) | | 2003 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9030763
    Category:
    Reactors
    PVD system, 8" | | LLKs NB w/Auto Tilt | A Pass-thru | B Cool Down | E O/D (Std) | F O/D (Std) | C Blank | D Blank | 1 PVD Tungsten (W) | 2 PVD TiN | 3 PVD Vectra IMP Ti | 4 PVD Vectra IMP Ti | 5 Iso-Valve (Manual) | Bfr HP+ | Txfr HP+ | | Main frame: | User Interface (Front): Monitor & light pen (wall mount) | User Interface (System): Monitor w/Base & light pen (stand-alone) | Endura HP PVD Front Skin | LLK Door Safety Covers | Status Lamp (R/Y/G) | Front Bezel with LD/ULD control, piezo, & EMO) | SECS interface (RS232 Serial) | Integrated Monolith Bake-Out lamps | M/F Water Leak Detect | System Lift Hoist (non-AMAT): Type: Gantry (full system coverage), Loadmate 250lb motor | Ch-A: Pass-Thru: Metal Lid with Quartz viewport & clear cover | Ch-B: Cool-Down: Metal Lid with Quartz viewport & clear cover | Ch-E&F: O/D: Std Lamp array w/Temp Control | Missing: | Ch-D Blank-off Plate | (2) CTI 9600 Cryo Compressors w/3-Phase Motor Control Boxes | (1) Neslab III Heat exchanger | | Load locks: | Narrow Body | Auto Rotate & Tilt-out cassette indexers | 25-slot wafer cassettes | 2-Stage Vent | 2-Stage Pump (programmable) | Standard wafer mapping | | Buffer: | Lid type: Std (Al) | Robot Type: HP+ | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-on blade (std) | Gauge: Dual Filament Ion | Cryo Pump Type: 3-Phase, fast regen | | Transfer: | Lid Type: Std (Al) | Robot Type: HP+ | Robot Blade Type: Ni plated Metal (std) | Sensors: Wafer-On-Blade | Gauge: Dual Filament Ion | Cryo Pump Type: 3-Phase, fast regen | | Chamber 1: PVD Tungsten (W) | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: W | (2) PVD Source Lid Clamps (extended) | EMO (momentary w/metal guard) | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Type: 101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Manual Iso-valve (for RGA / leak check) | | Chamber 2: PVD TiN | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: TiN | (2) PVD Source Lid Clamps (extended) | EMO (Twist-to-turn w/guard) | Process Kit | Wafer Lift Type: Pneumatic (std) | Pedestal Type: 101 | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron (Metal Housing option) | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 2-position gate valve | Cryo Baffle Plate Type: Fixed | Cryo Pump Type: 3-Phase, fast regen | Manual Iso-valve (for RGA / leak check) | | Chamber 3: PVD Vectra IMP Ti | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | EMO: Turn-to-Release w/guard | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Cryo Pump Type: 3-Phase, fast regen | Manual Iso-valve (for RGA / leak check) | | Chamber 4: PVD Vectra IMP Ti | Chamber Type: Wide-Body (WB) | Source Type: G-12 | Source Adaptor Type: IMP Ti (water-cooled) | (2) PVD Source Lid Clamps (extended) | EMO: Turn-to-Release w/guard | Self-Aligning Source Dowel Pins | Process Kit | Shutter Assembly (std for IMP) | Wafer Lift Type: Pneumatic (std) | Pedestal Type: B101 | Bias RF Match | Gauge: Convectron (Source) | Gauge: Convectron (Fore-line) | Gauge: Manometer, MKS Baratron | Gauge : Dual Filament Ion | Over-Temp Switch | Blow-Out Valve Type: Manual | Gate Valve Type: VAT, 3-position gate valve | Cryo Baffle Plate Type: Fixed | Cryo Pump Type: 3-Phase, fast regen | Manual Iso-valve (for RGA / leak check) | | Chamber 5: blank, manual Iso-valve (for RGA/leak check) | | System/AC: | S452 SBC | Side-Door CB Panel Clear Safety Cover | Rear, Lower Door Assembly w/Slide-out door | Missing: 3.5” (1.44MB) Floppy Drive | | Equipment Rack #1: | Remote +/-15V Power Supply (std) | EMO: Turn-to-Release w/guard | Ch-3 RF PS: Comdel CX-600S (13.56MHz) | Ch-4 RF PS: Comdel CX-600S (13.56MHz) | Ch-1 DC PS: AE MDX-L12M (Master) | Ch-2 DC PS: AE MDX-L12M (Master) | Ch-3 DC PS: AE MDX-L12M (Master) | Ch-4 DC PS: AE MDX-L12M (Master) | Ch-3 RF PS (Bias): AE HFV-8000 (2Mhz) | Ch-4 RF PS (Bias): AE HFV-8000 (2MHz) | Rear, Lower Door Assembly w/Slide-out door | | Main AC: 208VAC Input Option | | System Cabling / Umbilical: | CNTRL to M/F: 25ft | Remotes to M/F: 50ft | PS cables: 50ft | Cryo Pump He lines (SS braided): 100ft | | Backing Pumps: Backing pumps are not included with this system | | Facility Requirements: | CDA | Gas: Ar, N2 | Vacuum (need backing pumps) | Power: 208VAC, 296.3A (225KVA), 3-Phase, Freq 60Hz | | Missing: | Ch-E: Missing lower chamber cover | Ch-F: Missing (1) lid cover dowel pin (should be 2 std), Missing lower chamber cover | Ch-1: Missing Pillow Blocks, Missing Source lift shocks, Missing Cryo Pump (3-Phase, fast regen) | Ch-4: IMP Source RF (Top Coil) Assembly un-installed & sitting under Buffer Cryo | Pillow Blocks un-installed & sitting under Buffer Cryo | Source lift shocks | Cryo Pump (3-Phase, fast regen) | | 2003 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9055343
    Category:
    Sputtering Systems
    Wafer Size:
    6" 
    Vintage:
    1995 
    PVD System, 6" | Load lock | SMFL | 6-Chambers: | 1. PVD-Ti | 2. PVD-TTN | 3. PVD-AL | 4. PVD-TTN | 5. Degas | 6. PC-I | | 1. AL Cu (Clamp) | 2. Wide-Ti (A101) | 3. Wide-Ti (A101) | 4. STD-AL-Si-Cu (Clamp) | 5. N/A | | A. Pass | B. Cool | C. PC2 | D. PC2 | E. Orienter - Degas | F. Orienter - Degas | | Buffer: HP | XFER: HP | LL: Narrow | Magnet: Dura & G12 | Pumps: Ebara A30W, A10S, A10S | | Missing parts: | FDD | OPT PCB | (4) DIO PCB | | 1995 vintage.
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