APPLIED MATERIALS ENDURA Products

  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116764
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1998 
    PVD system, 8" | Cleanroom Interface: Endura HP Front Panel | PVD Endura type controller | | (2) WB Ti PVD chambers | (1) SB Al PVD chamber | (1) SB TiN PVD chamber | | Chamber A: | Quartz Viewport lid | | Chamber B: | Cool down with temperature monitor | Quartz viewport lid | 02 Manifold | | Chamber C: | PC II Type | Reactive preclean | Leybold TMP | | Chamber F: | Orienter with standard degas | | HP Transfer and buffer robots | Blade selection: Original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI Fast regen cryo | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD: | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 3/4: | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | | Components: | Main body | RF Power | Misc parts | AC controller | Cryo pumps | Pump 2 | Neslab chiller | RF power | AC box | | 1998 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116701
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2006 
    PVD system, 8" | | Chamber A: | Pass through | Nupro Gas valve | Viton (black) slit valve o-ring | Chamber lid clear | | Chamber B: | Cool down | Nupro Gas valve | Viton (black) slit valve o-ring | PCW heater / cathode cooling | Chamber lid clear | | Chamber 1: | IMP Vectra | Ti process | B101 susceptor / pedestal | IMP process kit type | Single manometer: 100mTorr | Vitron (black) slit valve o-ring | Shutter option yes | 12.9" lid | AE MDX-L12M RF gen DC supply 1 | AE HFV-8000 RF gen DC supply 2 | RF match 13.56MHz | Neslab III heater / cathode | 3 pos gate valve position | Cryo chamber pump | Gas 1: 100 sccm, N2, STEC 4400, MFC 15, 2xMnfold | Gas 2: 100 sccm, N2, STEC 4400, MFC16, 2xMnfold | Base pressure: 659m Torr | Leak rate: 0nT/min | Heater temp: 33.6 | | Chamber 2: | TxZ HP+ | CVD TiN process | HP Plus susceptor / pedestal | HP+ process kit type | Single manometer | Manometer 1: 10mTorr | Manometer 2: 100mTorr | Vitron (black) slit valve o-ring | AE PDX-900-2V RF gen DC supply 1 | Wall cooling: AMAT1 | Heater / cathode cooling: AMAT1 | Endpoint system: no | Alcatel chamber pump | Leybold turbo pump | Gas 1: 2slm, N2, STEC 7440, MFC 20, 2xMnfold | Gas 2: 3slm, N2, STEC 4400, MFC19, 2xMnfold | Gas 3: 1sccm, N2, MKS, MFC18, 2xMnfold | Gas 4: 1slm, N2, STEC 4400 | Gas 5: 1slm, N2, STEC 4400 | Gas 6: 1slm, He, STEC 4400 | Gas 7: 1slm, Ar, STEC 4400 | Heater temp: 30.2 | | Chamber 3: | TxZ HP+ | CVD TiN process | HP Plus susceptor / pedestal | HP+ process kit type | Single manometer | Manometer 1: 10mTorr | Manometer 2: 100mTorr | Vitron (black) slit valve o-ring | AE PDX-900-2V RF gen DC supply 1 | Wall cooling: AMAT1 | Heater / cathode cooling: AMAT1 | Alcatel chamber pump | Leybold turbo pump | Gas 1: 2slm, N2, STEC 4400, MFC1, 2xMnfold | Gas 2: 3slm, N2, STEC 4400, MFC2, 2xMnfold | Gas 3: 1 sccm, N2, MKS, MFC3, 2xMnfold | Gas 4: 500 sccm, He, STEC 4400 | Gas 5: 1slm, H2, STEC 4400 | Gas 6: 1slm, N2, STEC 4400 | Gas 7: 1slm, H2, STEC 4400 | Heater temp: 23.5 | | 2006 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9055225
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    Sputtering system, 8".
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9053977
    Category:
    Etchers / Ashers
    Wafer Size:
    8" 
    PVD System, 8" | | Chamber A: | Pass through | Nupro Gas valve | Chamber lid clear | | Chamber B: | Cool down | Nupro Gas valve | PCW heater / cathode cooling | Chamber lid clear | | Chamber C: | PCII | Oxide etch process | Tungsten susceptor / pedestal | PK-I process kit type | Single manometer: 100mTorr | Vitron (black) slit valve o-ring | Shutter option no | Comdel CPS 1000SD RF gen DC supply 1 | RFPP LF10A RF gen DC supply 2 | RF match 13.56MHz | Wall cooling none | Heater / cathode none | Endpoint system no | Gate valve position none | Alcaltel chamber pump | Leybold turbo pump | Heated valve stack no | Gas 1: 100 sccm, Argon, STEC 4400, MFC 12, 2xMnfold | Gas 2: 20 sccm, Argon, STEC 4400, MFC13, 2xMnfold | Base pressure: 48mT | | Chamber D: | PCII | Oxide etch process | Tungsten susceptor / pedestal | PK-I process kit type | Single manometer: 100mTorr | Shutter option no | Comdel CPS 1000SD RF gen DC supply 1 | RFPP LF10A RF gen DC supply 2 | RF match 13.56MHz | Wall cooling none | Heater / cathode none | Endpoint system no | Gate valve position none | Alcaltel chamber pump | Leybold turbo pump | Heated valve stack no | Gas 9: 20 sccm, Argon, STEC 4400, MFC9, 2xMnfold | Gas 10: 100 sccm, Argon, STEC 4400, MFC10, 2xMnfold | Base pressure: 112mT | | Chamber 1: None | | Chamber 2: | Wide body | TTN process | A101 susceptor / pedestal | TTN process kit type | Single manometer | Manometer 1: 100mTorr | Lid type: 12.9" | AE MDX-650HIZ RF gen DC supply 1 | Wall cooling: PCW | Heater / cathode cooling: Neslab III | Gate valve: 3 pos | Cryo chamber pump | Gas 8: 200sccm, N2, STEC 4400, MFC18, 2xMnfold | Gas 9: 100sccm, Argon, STEC 4400, MFC19, 2xMnfold | Base pressure: 1217mT | | Chamber 3: | Wide body | TTN process | A101 susceptor / pedestal | TTN process kit type | Single manometer | Manometer 1: 100mTorr | Lid type: 12.9" | AE MDX-650HIZ RF gen DC supply 1 | Wall cooling: PCW | Heater / cathode cooling: Neslab III | Gate valve: 3 pos | Cryo chamber pump | Gas 2: 100sccm, Argon, STEC 4400, MFC2, 2xMnfold | Gas 3: 200sccm, Argon, STEC 4400, MFC3, 2xMnfold | Base pressure: 935mT | | 2004 vintage.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9049701
    Category:
    Spare Parts
    Wafer Size:
    12" 
    Chamber, 12" | EnCorE TaN.
  • APPLIED MATERIALS: Endura II

    Details
    ID#:
    9049702
    Category:
    Spare Parts
    Wafer Size:
    12" 
    Chamber, 12" | EnCorE TaN.
  • APPLIED MATERIALS: Endura 5500P

    Details
    ID#:
    9056035
    Category:
    Reactors
    Systems.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059218
    Category:
    Reactors
    Wafer Size:
    6" 
    Vintage:
    1994 
    PVD system, 6" | | A: Pass through | B: Cooldown | C: Preclean II | D: Preclean II | E: Orienter-Degas | F: Orienter-Degas | 1: Al | 2: Ti/TiN | 3: Ti/TiN | 4: Al | | EBARA A30W Pump (1995) | (2) EBARA A10S Pumps (1995 & 1996) | | 1994 vintage.
  • APPLIED MATERIALS: Endura Vectra

    Details
    ID#:
    9069415
    Category:
    Spare Parts
    Wafer Size:
    8" 
    IMP PVD Chamber, 8" | Chamber body type: wide | Pedestal or heater lift: motorized | Wafer chuck options: B101 | Gate valve type: 3-position gate valve | Cryo restrictor type: standard | Cryo plate stand-offs: none | Shutter: magnetically coupled | Short detect impedance network: no | Chamber lip clamp lever extension: no | Magnet type: RH2 | Coil type: EB3.
  • APPLIED MATERIALS: Endura 300

    Details
    ID#:
    9070412
    Category:
    Reactors
    Wafer Size:
    12" 
    Vintage:
    2002 
    PVD system, 12" | Aluminum interconnect | | Chamber 1: | For Al-Cu PVD chamber | DCPS;Master,OPTIMA DCG-200,ENI,for PVD | Slave,OPTIMA DCG-200,ENI,for PVD | PUMP/CRYO,SICERA KZ-8L3C,SHI | HT ESC type stage | Ar;200/20sccm | | Chamber 2: | Chamber ONLY For PVD | Not used | | Chamber 3: | For TiN PVD chamber | DCPS;OPTIMA DCG-200,ENI,for PVD | PUMP/CRYO,SICERA KZ-8L3C,SHI | A101 type stage | Ar/N2;150/200sccm | | Chamber D: | For Pre-CLN chamber,PCXT | RFPS;GHW-12A/GMW-25A,ENI,for BIAS/SLA | PUMP/CRYO,SICERA KZ-8L3C,SHI | Ar;200/20sccm | | Chamber E,F: | For Degas,Plate heater | PUMP/CRYO,SICERA KZ-8L3C,SHI | Ar,press. Controlled | | Missing Parts as of Q3 2014: | Air solenoid valve unit (Ch-1), US13676 4060-00238, | Cathode feedthrough (Ch-1), 0190-76276 | Cathode cooling water hose, N/A | CP compressor (bottom), CSW-61C / 0190-2932 | Degas Lifting FOUP Assy (Ch-F) | HT-ESC(Ch-1), 0010-23066 | Robot Blade, 0021-32929 | | Missing Degas Lifting FOUP Assy (Ch-F): | (4) 0020-75627, 300mm Degas Clamp Insert | (2) 0020-25615, Clamp | (7) 3880-01245, Flat Washer | (1) 3220-01051, Floating Joint Coupling | (1) 0021-21267, Left Cover | (1) 0190-76278 / 0190-1342, Linear Guide | (1) 0020-42056, Lower Lift Stop | (1) 0021-21268, Right Cover | (7) 3690-01888, Screw | (1) 0090-20003, Sensor Assembly and Cable Harness | (4) 3690-01642, Socket Head Cap Screw | (3) 3690-01945, Socket Head Cap Screw | (6) 3690-01942, Socket Head Cap Screw | (7) 3880-01103, Split Locking Washer | (4) 3880-01025, Split Locking Washer | (6) 3880-01025, Split Locking Washer | (1) 0020-42055, Upper Lift Stop | (2) 3870-02530, Valve | (1) 0040-21402, Wafer Lift Bellows | (1) 0040-42640, Wafer Lift Block | (1) 3020-01152, Wafer Lift Pneumatic Cylinder | (1) 0040-76520, Wafer Lift Rail Support | | Currently de-installed and stored in fab | 2002 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9066899
    Category:
    Spare Parts
    Lot of spare parts for 6" sputtering system: | | 5 0910-01073 PORTE FUSIBLE | 6 0910-01074 CAPOT PORTE FUSIBLE | 2 3550-01117 PIN DOWEL 3/16 x 3/8L | 4 3300-02884 FTG PLUG HOLLOW HEX 7/16 | 2 0015-20035 SCREWS INSULATOR | 10 3690-01944 SCREW 1/4-20 X 7/8 | 116 3690-02126 SCREW 6-32 X 7/8 | 5 3690-01847 SCREW 8-32 X 3/4 | 18 3690-02564 SCREW 6-32 X 7/16 TITA. SLOT.F | 8 3690-02568 SCREW 4-40 X 1/4 CAP | 20 3690-02569 SCREW 6-32 X 1 TITAN | 17 3880-01022 WASHER SPLIT | 11 3880-01004 WASHER FLAT | 4 0020-24236 CLIP SPRING PC II | 5 3320-02242 WASHER CUIVRE | 4 0190-70075 BEARING BALL 1.0BORE 1.388 | 1 3630-01092 RETAINING RING INT | 6 3630-01091 RETAINING RING EXT | 1 0020-20117 CONDUCTOR FLEX DC BIAS | 2 0020-29409 CONDUCTOR FLEX DC BIAS | 3 0020-20114 INSULATOR DC BIAS | 2 0020-20113 HUB DC BIAS ASSY | 3 0020-20119 PAD DC BIAS | 2 0020-22839 PIN PRECLEAN LIFT | 2 0020-22805 PLATE ADAPTER | 17 3880-01006 WASHER FLAT #6.3750D X .149 | 2 3880-01304 WASHER FLAT 1/4" .045 THK S | 1 3690-01125 SCREW 6-32 X 3/8 PHILIPS PAN | 6 3690-02674 SCREW 1/4-20 X 1/2 PHILIPS PAN | 9 3500-01175 NUT KEPS 1/4-20 X 15/64TH | 26 3690-02085 SCREW 1/4-20 X 3/8 CAP | 5 3410-01008 INSR 1/2 OD X 3/8 ID SST | 3 0020-16091 BUTTON REST PEDESTAL TIN COATE | 10 3690-01882 SCREW MACH SKT HK 6-32X1.75L | 7 0020-23587 SPACER MODIF SHIELD 8" G-12 | 108 3880-01023 WASHER | 1 0020-25730 SHIELD UPPER G12 DBL | 2 3320-01026 GASKET COPPER | 1 0150-20617 CABLE ASSY CH 5 HEATER CONVECT | 1 0140-20542 HARNESS ASSY CHAMBER 5 OVERTEM | 1 0150-20618 CABLE ASSY CH 5 HEATER TC AMP | 1 0150-20197 HARNESS ASSY TC INTERFACE | 1 0150-20633 CABLE ASSY CHMB 5 SLIT VALVE | 1 0010-76059 BOARD J 20S VME CONT W/5.2 | 1 0100-20173 BOARD STEPPER CONTROL | 1 0100-20012 BOARD ISOLATION AMPLI | 1 0100-20038 BOARD RELAY CONTROL | 1 0100-20040 BOARD REMOTE SUPPLY DI | 2 0020-22956 CLAMP RING | 1 0020-27093 SHIELD LOW KNEE 6" | 1 0020-24386 COVER RING 6" | 1 0020-27124 PEDESTAL PCII 6" JMF/SMF | 1 0010-20129 6" BUFFER BLADE ASSY W/CNTNR | 1 0010-20248 VALVE ASSY SLIT WITH 'F | 2 0020-21462 INSULATOR SOURCE 11.3" CERAMIC | 1 0020-21468 CLAMP SHIELD 5" & 6" | 1 0020-26439 SHIELD LOWER 6" | 1 0020-22909 PEDESTAL SHIELD | 1 0020-22547 ADAPTER 11.3" SOURCE WIDE | 2 0040-21178 BELL JAR | 1 0020-26589 SHIELD PRECLEAN 6" | 1 0020-26111 CLAMPING RING | 2 706-0634 ARTICULATION A ROTULE | 1 3320-01033 GASKET SHIELD RF .094DIA 30LB/LIN-IN STD-FO | 1 3320-01032 GASKET SHIELD RF .172DIA 30LB/LIN-IN STD-FO | 2 0020-20673 PIN CHAMBER MONOLITH INTERFACE | 1 3300-02376 FTG TUBE O.D 3/8 PLUG | 1 3700-02749 O-RING 228 VITON 75 DURO | 6 3870-01281 VALVE BLANK PLATE ASSY FOR SMC | 1 3870-01284 VALVE BLANK PLATE ASSY FOR SMC | 2 3880-01243 WASHER #8 SST .031THK .375 OD BLK OXID | 3 3880-01378 WASHER LKG SPLIT #1/4 .365ODX.254IDX.062T | 4 3880-01042 WASHER FLAT #10 .444ODX.203IDX.050THK SST | 11 3880-01027 WASHER LKG SPLIT #5/16 .125W X .078THK SST | 2 3880-01306 WASHER FLAT #4 .125ID X .375OD X .040THK STL ZINC | 6 3880-01221 WASHER FLAT #4 .250OD X .116ID X .0625THK SST303 | 4 3690-01659 SCREW CAP FLT HD 4-40 X 3/8L PHIL 82DEG SST | 8 3690-01627 SCREW CAP SKT HD 10-24 X 1L HEX SKT SST | 6 3690-01538 SCREW CAP SKT HD 10-24 X 1/2L HEX SKT SST | 2 3690-01073 SCREW CAP SKT HD 1/4-20 X 3/4L HEX SKT SST | 2 3690-01307 SCREW MACHINED HEX HEAD 1/4-20X1-14 SST | 2 3690-02349 SCREW CAP SKT HD 4-40 X 1/4L HEX SKT SST SLVR-PLT | 18 3690-01850 SCREW VENT PAN HD 4-40 X 3/8L PHH SST SLVR-PLT | 51 3690-01922 SCREW CAP SKT HD 6-32 X 1/2L HEX SKT SST SLVR-PLT | 3 3690-02515 SCREW VENT CAP SKT HD 6-32 X 1/2L HEX SKT SLVR-PLT | 1 3690-03074 SCREW MACH PAN HD 8-32 X 3/8L PHIL SST SLVR-PLT | 4 3690-01955 SCREW CAP SKT HD 8-32 X 5/8 HEX SKT SST SLVR-PLT | 2 3690-01885 SCREW CAP SKT HD 10-32X5/8L HEX SKT SST SLVR-PLT | 12 3690-02123 SCREW CAP SKT HD5/16-18X1.25L HEX SKT SST SLVR-PLT | 4 3690-02702 SCREW CAP SKT HD 1/4-20 X 6.0L HEX SKT SST | 5 3060-01474 BEARING 4.71 X 9.51 X 3.16 mm | 1 0150-20669 CABLE ASSY 75' RF COAXIAL 400KHZ W/CLAM | 1 6LVV-DPFR4-O VANNE INOX A MEMBRANE, 1/4 VCR FEMELLE-FEMELLE | 2 0020-26967 PC II, GAS TRENCH COVER | 1 0150-20660 CABLE RF MATCH TO CHAMBER | 1 0010-20753 WAFER LIFT ASSY | 1 0010-20754 PEDESTAL LIFT ASSY.
  • APPLIED MATERIALS: Endura 5500 SIP EnCoRe

    Details
    ID#:
    158915
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    2007 
    System, 8" | Number of Chambers: 5 | Process capabilities: | Hot Al, SIP TTN, SiP Encore Cu, SIP Encore Ta(N) and CleanW | Application: Copper Barrier Seed | Wafer size range: 6" to 8" | Wafer set size: 8" | Chamber 1: | Enhanced Hot Aluminum | Standard Body Chamber | Mech Clamped chuck, Ti clamp ring | CTI Onboard Cryo, fast regen, low vibe | Magnet type: 12.9" Al A,P/N: 0020-26822 | Chamber 2: | Ti Nitride | Wide Body Chamber | Elec. Chuck: Bias MCS ESC, SST cover ring | Wafer bias power supply, 13.56MHz 600 W, | CTI Onboard Cryo, fast regen, low vibe | Magnet type: SIP REV2, P/N: 0010-04065 | Chamber 3: | SIP Encore Cu | Wide Body Chamber | Elec. Chuck: SLT FDR E-Chuck, Ti cover ring, cryo chilled | Wafer bias power supply, 13.56MHz 1250 W, | CTI Onboard Cryo, fast regen, low vibe | Magnet type: LP 8.8, P/N: 0010-12864 | Chamber 4: | SIP Encore Ta(N) | Wide Body Chamber | Elec.Chuck: SLT FDR E-Chuck, Ti -Arc-Sp | Wafer bias power supply, 13.56MHz 600W, ICE RF Match | CTI Onboard Cryo, fast regen, low vibe | Magnet Type: Encore Rev 2, P/N:0010-14875 | Chamber 5: | CleanW PVD | Wide Body Chamber | Elec. Chuck: MCS+ ESC, SST-Arc-Sp cover ring | CTI Onboard Cryo, fast regen, low vibe | Magnet type: PVD WII, P/N: 0010-11925 | Interface Type: SECS RS-232 | Elevator Type: Universal Manual with Rotate | External Cooling: Water Cooled | Accessories: | (3) CTI 9600 Compressor, p/n: 3620-01389, water cooled | (3) CTI Onboard Terminal, p/n: 3620-01553 | (2) Neslab System III Heat Exchanger | (1) CTL Inc subzero chiller, Model: BCU-L310F1-AMAT | (1) Toyota T100L Dry Pump | (2) Toyata T600 Dry Pump | Other Information: | Buffer Chamber Position "A": Pass thru with clear plastic lid | Position "B": Cooldown with temp monitor | Position "D": Reactive Preclean, Leybold TMP | Position "E" Orienter degas with temp feedback | Position "F" Orienter degas with temp feedback | Wide Body Loadlocks with variable speed soft vent | VHP Transfer Robot with HTHU compatible blade | HP+ Buffer Robot with with original metal blade | 50' Cable harness | SMIF Integrated Tool Control | #NB: Asyst SMIF Loader sold as option. | Power Requirements: 480 V, 500.0 A, 60 Hz, 3 Phase | CE Marked: yes | 2007 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059221
    Category:
    Reactors
    Wafer Size:
    6" 
    Vintage:
    1994 
    PVD system, 6" | | A: Pass through | B: Cooldown | C: Preclean II | D: Preclean II | E: Orienter-Degas | F: Orienter-Degas | 1: Al | 2: Ti/TiN | 3: Ti/TiN | 4: Al | | Missing: | FDD | SBC board | | 1994 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059222
    Category:
    Reactors
    Wafer Size:
    6" 
    Vintage:
    1995 
    PVD system, 6" | | A: Pass through | B: Cooldown | C: Preclean II | D: Preclean II | E: Orienter-Degas | F: Orienter-Degas | 1: Ti/TiN | 2: Ti/TiN | 3: 101 Ti/TiN | 4: 101 Ti/TiN | | Parts missing: | FDD | SBC Board | VIDEO Board | Xfer Up/Down Robot Monitor Ass'y | | 1995 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9048796
    Category:
    Reactors
    CuBs SIP Encore system, 6" - 8" | Currently configured for 8" | (5) Chambers | Capabilities: Hot Al, SIP TTN, SiP Encore Cu, SIP Encore Ta(N), CleanW | Application: copper barrier seed | Interface Type: SECS RS-232 | Elevator Type: Universal Manual w/Rotate | External Cooling: Water Cooled | Wide Body Load Locks: variable speed soft vent VHP transfer robot with HTHU compatible blade | HP+ buffer robot with metal blade | SMIF integrated tool control | | Chamber 1: Enhanced Hot Aluminum | Standard Body Chamber | Mech. Clamped chuck, Ti clamp ring | CTI Onboard Cryo, fast regen, low vibe | Magnet type: 12.9" Al A, P/N: 0020-26822 | | Chamber 2: Ti Nitride | Wide Body Chamber | Elec. Chuck: Bias MCS ESC, SST cover ring | Wafer bias power supply, 13.56MHz 600 W | CTI Onboard Cryo, fast regen, low vibe | Magnet type: SIP REV2, P/N: 0010-04065 | | Chamber 3: SIP Encore Cu | Wide Body Chamber | Elec. Chuck: SLT FDR E-Chuck, Ti cover ring, cryo chilled | Wafer bias power supply, 13.56MHz 1250 W | CTI Onboard Cryo, fast regen, low vibe | Magnet type: LP 8.8, P/N: 0010-12864 | | Chamber 4: SIP Encore Ta(N) | Wide Body Chamber | Elec.Chuck: SLT FDR E-Chuck, Ti -Arc-Sp | Wafer bias power supply, 13.56MHz 600W, ICE RF Match | CTI Onboard Cryo, fast regen, low vibe | Magnet Type: Encore Rev 2, P/N:0010-14875 | | Chamber 5: CleanW PVD | Wide Body Chamber | Elec. Chuck: MCS+ ESC, SST-Arc-Sp cover ring | CTI Onboard Cryo, fast regen, low vibe | Magnet type: PVD WII, P/N: 0010-11925 | | Accessories: | (3) CTI 9600 Compressor, p/n: 3620-01389, water cooled | (3) CTI Onboard Terminal, p/n: 3620-01553 | (2) Neslab System III Heat Exchanger | (1) CTL Inc subzero chiller, Model: BCU-L310F1-AMAT | (1) Toyota T100L Dry Pump | (2) Toyata T600 Dry Pump | | Buffer Chamber: | Position "A": Pass thru with clear plastic lid | Position "B": Cooldown with temp monitor | Position "D": Reactive Preclean, Leybold TMP | Position "E" Orienter degas with temp feedback | Position "F" Orienter degas with temp feedback | | 50' cable harness | 480V, 500.0A, 60Hz, 3 phase | CE marked | 2007 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9045453
    Category:
    Reactors
    PVD system, 8".
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9038549
    Category:
    Reactors
    HP-PVD system, 8" | | Includes: | (2) STD | (2) WB | (2) OD (Heater) | (2) HP | 3P, 9600 | DC Power | NBLL | | Deinstalled | 1999 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    166249
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    Sputtering system, 8" | | Wafer size: 8" flat (not notch) | | Configuration: | Chamber 1: AlCu | Chamber 2: TiN | Chamber 3: Ti | Chamber 4: Ti | Preheat | Etch | Clean bench | Clamp (not electrostatic chuck) | | Robot: | Buffer: AMAT HP, ceramic blade | Transfer: AMAT HP, metal blade | | System monitor: | 1: stand alone | 2: through the wall | 3: stand alone | (1) each monitor rack | | Load lock: | Narrow body with tits in and out | No sliding sensor kit | | Chamber A | - Chamber type: Pass through | - Chamber Lid: Metal Lid | - Cooling method: NA | | Chamber B | - Chamber type: Cool down | - Chamber Lid: Metal lid | - Cooling method: By PCW | | Chamber D | - Chamber type: Preclean I | - Chamber process: | - RF Gen/DC power supply1: | - RF Gen/DC power supply2: | - Turbo pump | | Chamber F: | - Chamber type: Orient/Degas | | Chamber 1 | - Chamber type: Standard body | - Chamber process: AlCu, Preheat | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K SLAVE | - RF Gen/DC power supply2: A, MDX-20K MASTER | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: P/N 0010-70086 | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 2 | - Chamber type: Wide Body | - Chamber process: TiN | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: : CTI CRYO 8F 2phase | - Source(Lid) type : UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 3 | - Chamber type: Wide Body | - Chamber process: Ti | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 4 | - Chamber type: Wide body | - Chamber process: Ti, Preheat | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Includes: | - Heat exchanger type: Neslab III 1ea | - Compressor type: CTI 8500 2ea | - EMO on source cover : No | - Shutter : No | - SBC : V440 | - KSI Shild Treatment DC Power Supply 1ea | - AE, MDX-052, SHILD TREATMENT CONTROLLER | - COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz | - 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY | - 2Board MISC. on MASS STROAGE BOARD | | Includes pumps | | Installed | 1994 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9035937
    Category:
    Reactors
    Vintage:
    1997 
    HP PVD System, 8" | (1) STD Chamber | (3) Wide body chambers | (2) Preclean II | (1) Orienter: Degas | (1) HP robot | (1) HP+ robot | SL Frame | | Missing: 15V P/S ASSY | | Currently installed in cleanroom, powered down | 1997 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    194427
    Category:
    Reactors
    Wafer Size:
    6" 
    PVD System, 6" | | HP wafer handler Buffer and Transfer chamber | NB Load locks tilt out | System Controller | Main AC BOX | Remote pump rack including QDP 40/QMB250 Edwards | SST Bezel with white door covers | Cryo compressors 8510 | Paste chamber (orientor wall with hoop) | | Chamber A: Pass through | Chamber B: Pass through, Clear Lid, Cooling | Chamber E: Orientor Degas | | Chamber 1: | Incomplete | Standard body non-water cooled | 2 position Gate valve | | Chamber 2: | Tin Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 3: | Ti Source 0010-20060 | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 4: | AL Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber D: | Preclean II | Rf MATCH 0010-20525 | Mag lev turbo 341 | RFPP LF 10A | Comdel | Chiller | Amat Neslab III | Power supplies | MDX 10K Master 3 each | MDX 10k Slave 1 each | | Can be inspected.
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