APPLIED MATERIALS ENDURA Products

  • APPLIED MATERIALS: Endura

    Details
    ID#:
    116764
    Category:
    Reactors
    Wafer Size:
    8" 
    Vintage:
    1998 
    PVD system, 8" | Cleanroom Interface: Endura HP Front Panel | PVD Endura type controller | | (2) WB Ti PVD chambers | (1) SB Al PVD chamber | (1) SB TiN PVD chamber | | Chamber A: | Quartz Viewport lid | | Chamber B: | Cool down with temperature monitor | Quartz viewport lid | 02 Manifold | | Chamber C: | PC II Type | Reactive preclean | Leybold TMP | | Chamber F: | Orienter with standard degas | | HP Transfer and buffer robots | Blade selection: Original metal blade | | Position 1: Titanium PVD | PVD chamber body: standard PVD chamber | PVD UHV pump option: CTI Fast regen cryo | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift option: HP motorized lift | PVD pressure control option: 2 position gate valve | Cryo restrictor | PVD chamber safety option: EMO on source cover | Zener diode | | Position 2: Ti-Nitride PVD: | Wide body PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | Zener diode | | Position 3/4: | Standard PVD chamber | CTI fast regen cryo single-phase | PVD wafer chuck option: Unclamped | 101 Pedestal type | Lift options: HP motorized lift | PVD pressure control option. 2 position gate valve | Cryo restrictors | PVD chamber safety option: EMO on source cover | | Components: | Main body | RF Power | Misc parts | AC controller | Cryo pumps | Pump 2 | Neslab chiller | RF power | AC box | | 1998 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    128804
    Category:
    Reactors
    Wafer Size:
    8" 
    AL-2 (ALPS) deposition system, 8" | | Specifications: | Wader size: 8" | Wafer shape: SNNF | Load Lock: Auto tilt narrow body | E/F: Orienter/Degas | C/D: Preclean II | A/B: Pass/Cool down | 1: IMP | 2/3: HP+ TxZ | | Chamber Type / Location: | Transfer Chamber: | Position 1: Titanium | Position 1 Process: Vectra IMP Ti | | Position 2: CVD TiN | Position 2 Process: HP+ TxZ | | Position 3: CVD TiN | Position 3 Process: HP+ TxZ | | Position 4 and 5: N/A | Position 4 and 5 Process: N/A | | Buffer Chamber: | Position A: Pass Thru | Position A Process: Pass Thru | | Position B: Cooldown | Position B Process: STD Cooldown | | Position C: PCII | Position C Process: Pre-Clean | | Position D: PCII | Position D Process: Pre-Clean | | Position E: Orienter | Position E Process: Orient with STD Degas | | Position F: Orienter | Position F Process: Orient with STD Degas | | Electrical requirements: | 50/60Hz, 208V, Facilities power indicator | System UHV: Fast Regen Low Vib cryo pump | | System safety equipment: | "Emergency Off" Label Yes | EMO Button Guard Ring Yes | EMO Under Monolith No | Primary Side Trip Amperage 3P 600VAC 600A Trip Unit | G F I on Primary with EMO Yes | G F I On Secondary No | G F I Component - | Circuit Breaker on No | G F I Trip Amperage No | System Water Leak Detector Yes | System Smoke Detector Yes | Additional Smoke Detector No | Mainframe Water Interlock Yes | Support Ch facility interlock No | Monolith Bakeout Heater No | AC Boxes Indicator Lamp Incandescent | System Lebels Language English Only | RF Gen LOTO Switch Location At Generator Rack | | System UV: | System Cryo Pump Type Fast Regen Low Vib | | PVD Chamber configuration: | Position | Chamber conditioning: 1 | Shutter: Linkage | | Chamber Safety: | Chamber lid clamp level extension: Yes | Target water flow interlock: Yes | Coh Src Adaptor water Fl Intlk: No | | Chamber Safety: | Wafer bias power supply HW: 13.56 | RF match type: 0.16u | | Process Info: | Magnet type: RH-2 | Magnet P/N: 0010-21676 | Magnet shim thickness: 0.75mm | | CVD Chamber configuration: | Position 2 and 3: | Application: CVD TiN | Process Type: HP + TxZ | CVD Ampoule level sensor: TDMAT | CVD Ampoule lifter: No | CVD Ion gauge: No | | Gas delivery option: | Gas delivery type: AMAT spec | Proc Htr Vent gasline valves: AMAT spec | Gasline fittings: AMAT spec | Gas line clamps: Np | Gas box pneumatic value: Single | Process and Htr gasline filter: Pall Ultramet-L Gaskleen | Cooldown filters: Pall Ultramet-L Gaskleen | Loadlock and mainframe: Pall Ultramet-L Gaskleen | CVD MFC type: Stec 4400 | CVD gas panel vale type: Veriflo 10RA | CVD gas panel fitting type: AMAT spec | CVD gas panel filter type: Pall Ultramet-L Gaskleen | Heater gas QTY: 1 | First heater gas: N2 | First heater MFC size: MKS 100 | First MFC Cal gas: N2 Cal | First heater MFC position: Ch#2: 18 ; Ch#3: 3 | | CVD TiN Gas Line: | (1) 500 HE | (2) 1000 H2 | (3) 1000 N2 | (4) 1000 HE | (7) 1000 AR | (19) 3000 N2 | (20) 2000 N2 | | Gas delivery options: | Pressure indicator: Digital | Manual shut off valve: Yes | | Mainframe options: | Transfer and buffer lid hoist: STD lid hoist | Robot characterization fixture: No | | Detailed mainframe info: | Front panel bezel: No painted | Door covers: Painted | System water lines: SST seal Lok | | Remote options: | UPS option: Yes | Controller AC power feed: Bottom | Controller bottom exhaust fan: Yes | Bottom rear door: Swing out | Ion gauge type: Nude | Wide adaptor for ion gauge: No | PC ion gauge without elbow: Yes | CVCF Interface: Yes | | Generator racks: | MCA rack + AC module: No | Generator rack type: PVD Endura type | 2nd generator rack required: Yes | Cable length: 6’ | Gen rack water flow interlock: Yes | | Compressure option: | Cryo comp water flow interlock: No | Special Cryo Helium maniforld: No | Cryo comp water fittings: No | | Heat exchanger option: | Heat exchanger type: NESLAB III | Second heat exchanger type: None | CVD Heat exchanger type: AMAT 0 | | System monitors: | Monitor QTY: 3 | Monitor 1: STD Alone | Monitor 2: Through the wall | Monitor 3: STD alone | Monitor switch location: Controller | | Currently stored in a cleanroom | 1997 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    148093
    Category:
    Reactors
    PVD system, 8" | | Wafer Shape: SNNF | Umbilicals For Remote Item: 25ft | Umbilicals For MF To CTL: 25ft | Position 1: Ti /Standard Body | Position 2: WB | Position 3: AL /Standard Body | Position 4: AL /Standard Body | Position A: Cool Down | Position B: Pass Cool Down | Position C: PCII | Position D: Blank | Position E: Orient/Degas | Position F: Orient/Degas | | Electrical requirements: | Line Voltage: 408V | Line Frequency: 60Hz | Facility Power Indicator: Yes | Transformer Type: 225kVA Step Down | | Chamber 1: | Application: Standard source | Magnet P/N: 0010-20819 | Chamber Body: Standard | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cover Ring Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 2: | Application: Standard source | Magnet P/N: 0010-21818 | Chamber Body: Wide Body | Power Supply(kw): MDX 10K Master | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: Standard | Cryo Plate Standoffs: None | Target Water Flow Interlock: None | | Chamber 3: | Application: AL Source | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SST | Cryo Gate Valve: Standard | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber 4: | Application: AL | Magnet P/N: 0010-20818 | Chamber Body: starderd | Power Supply(kw): MDX 20K Master / MDX - 10K silver | Pedestal Option: 101 Pedestal | Pedestal Material: SUS | Cryo Gate Valve: starderd | Cryo Restrictor: None | Cryo Plate Standoffs: None | | Chamber A Pass: | Target Water Flow Interlock: None | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: None | | Chamber B Cool down: | Chamber Type: Cooldown | Temperature Monitor: None | Lid Type: Clear Plastic | Pedestal Type: ClnCool | | Chamber C: | RF Match: None | Power Supply(kw): Comdel CPS-1001S 13.56MHz | Turbo pump: None | | Chamber D: Blank: Blank | | Chamber E: | Orient Degas Type: Standard | Power Supply(kw): RFPP LF-10 | Temp Feedback: Yes | | Chamber F Orient: | Orient Degas Type: None | Temp Feedback: None | | Gas panel configuration: | Gas Delivery Type: AMAT Spec | Proc Htr Vent Gasline Valves: Veriflo 10Ra | Gasline Fittings: Cajon | Gasbox Pneumatic Valves: Single | Process And Htr Gasline Filter: Pall Ultramet-L Gaskleen | Cooldown Filter: Pall Ultramet-L Gaskleen | Loadlock And Mainframe Filters: Pall Ultramet-L Gaskleen | Gasline Gas Box Exit: Over the Top | MFC Type: STEC 4400 | Digital Option: Yes | | General Mainframe: | Front Panel Options: Painted | Front Panel EMO Cover: Yes | Status Light Tower Required: Yes | Status Light Tower Type: 4 Light | Light Combination: RYGB | Communication Interface: SECS | Slit Valve Doors: STD | Slit Valve Pressure Regulator: Yes | Buffer Cryo Light Screen: Yes | | Loadlock / Cassette: | Loadlock Type: NB LL | Indexer and Handler Type: Universal Manual W/Rotate | Enhanced Wafer Mapping: YES | Loadlock Vent Type: Variable Speed Soft Vent | Wafer Out of Slot Detector: None | Cassette Material: Plastic | Pump Down: Variable Speed Programmable | Customer Provided Automation: None | SMIF Type: None | | Buffer/Transfer chamber: | Transfer Robot Type: HP | Buffer Robot Type: HP | HP Plus Arm Leveling Tool: No | Transfer And Buffer Lid Hoist: None | Robot Characterization Fixture: No | Slit Valve: STD | Slit Valve Pressure Regulator: Yes | | Detailed mainframe info: | Front Panel Bezel: Painted | Door Covers: Painted | System Water Lines: SST Seal Lok | Facility Water in Mainframe: Yes | System Vent Label: Ar & N2 | Preclean Exhaust Size: N/A | | Status light tower: | Lamp Colors: RYGB | Number Of Lamps Per Tower: FOUR | Top Signal: Fault | Upper Middle Light Signal: Auto And Idle | Lower Middle Light Signal: Ready To Load/Unload | Bottom Signal: Warning Occur | UPS Option: No | Number of Poles | Controller AC Power Feed: Top | Bottom Rear Door: Swing Out | Software Revision: C8.51 | Ion Gauge Type: Nude | | RF Generator rack: | Generator Rack Type: PVD Endura Type | 2nd Generator Rack Required: Yes | Cable Length, 1st to 2nd GenRack: 6' | Preclean Power Supply Config: PC in Rack 2 Only | Bottom Rear Door: Swing Out | Gen Rack AC Power Feed: Top | Water Leak Detector: Yes | | Compressor and cryo pump: | Cryo Compressor Type: Water Cooled 8510 | Cryo Compressor Qty: 2 | Cryo Helium Lines: 3/4"x40' | Cryo Flex Line Elbow onCompressor: Yes | Cryo Flex Line Elbow onMainframe: Yes | Cryo Pump Type: Enhanced Fast Regen Low Vibration | Cryo Power Phase: 2 Ph | | Heat exchanger: | Heat Exchanger Type: Neslab system 3 | Resistor Meter: Yes | | System Monitors: | Monitor Qty: 2 | Monitor 1: STAND ALONE | Monitor 1 Cable Length: 35' | Monitor 2: STAND ALONE | Monitor 2 Cable Length: 35' | | DC Power supplies: | DC Power supplies 1: 24V | DC Power supplies 2: 15V | | Pump: | Pump: System: Smart Pump Interface Only | | 1997 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9035937
    Category:
    Reactors
    Vintage:
    1997 
    System, 8" | (1) Orienter | (2) Pre-clean chambers | (4) Endura PVD chambers (3 wide body, 1 standard) | (1) HP robot | (1) HP+ robot | Currently installed, powered down | 1997 vintage.
  • APPLIED MATERIALS: Endura HTHU

    Details
    ID#:
    9072518
    Category:
    Spare Parts
    Wafer Size:
    6" 
    Chamber only, 6".
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    194427
    Category:
    Reactors
    Wafer Size:
    6" 
    PVD System, 6" | | HP wafer handler Buffer and Transfer chamber | NB Load locks tilt out | System Controller | Main AC BOX | Remote pump rack including QDP 40/QMB250 Edwards | SST Bezel with white door covers | Cryo compressors 8510 | Paste chamber (orientor wall with hoop) | | Chamber A: Pass through | Chamber B: Pass through, Clear Lid, Cooling | Chamber E: Orientor Degas | | Chamber 1: | Incomplete | Standard body non-water cooled | 2 position Gate valve | | Chamber 2: | Tin Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 3: | Ti Source 0010-20060 | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber 4: | AL Source | Standard Body non-water cooled | 8f Cryo old style | 2 position Gate valve | Transpec 2 | | Chamber D: | Preclean II | Rf MATCH 0010-20525 | Mag lev turbo 341 | RFPP LF 10A | Comdel | Chiller | Amat Neslab III | Power supplies | MDX 10K Master 3 each | MDX 10k Slave 1 each | | Can be inspected.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9056983
    Category:
    Reactors
    Wafer Size:
    5" 
    PVD System, 5".
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9057863
    Category:
    Reactors
    Wafer Size:
    8" 
    PVD system, 8" | (2) TiN + (2) IMP + (1) PCII | HP + VHP.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9053977
    Category:
    Etchers / Ashers
    Wafer Size:
    8" 
    PVD System, 8" | | Chamber A: | Pass through | Nupro Gas valve | Chamber lid clear | | Chamber B: | Cool down | Nupro Gas valve | PCW heater / cathode cooling | Chamber lid clear | | Chamber C: | PCII | Oxide etch process | Tungsten susceptor / pedestal | PK-I process kit type | Single manometer: 100mTorr | Vitron (black) slit valve o-ring | Shutter option no | Comdel CPS 1000SD RF gen DC supply 1 | RFPP LF10A RF gen DC supply 2 | RF match 13.56MHz | Wall cooling none | Heater / cathode none | Endpoint system no | Gate valve position none | Alcaltel chamber pump | Leybold turbo pump | Heated valve stack no | Gas 1: 100 sccm, Argon, STEC 4400, MFC 12, 2xMnfold | Gas 2: 20 sccm, Argon, STEC 4400, MFC13, 2xMnfold | Base pressure: 48mT | | Chamber D: | PCII | Oxide etch process | Tungsten susceptor / pedestal | PK-I process kit type | Single manometer: 100mTorr | Shutter option no | Comdel CPS 1000SD RF gen DC supply 1 | RFPP LF10A RF gen DC supply 2 | RF match 13.56MHz | Wall cooling none | Heater / cathode none | Endpoint system no | Gate valve position none | Alcaltel chamber pump | Leybold turbo pump | Heated valve stack no | Gas 9: 20 sccm, Argon, STEC 4400, MFC9, 2xMnfold | Gas 10: 100 sccm, Argon, STEC 4400, MFC10, 2xMnfold | Base pressure: 112mT | | Chamber 1: None | | Chamber 2: | Wide body | TTN process | A101 susceptor / pedestal | TTN process kit type | Single manometer | Manometer 1: 100mTorr | Lid type: 12.9" | AE MDX-650HIZ RF gen DC supply 1 | Wall cooling: PCW | Heater / cathode cooling: Neslab III | Gate valve: 3 pos | Cryo chamber pump | Gas 8: 200sccm, N2, STEC 4400, MFC18, 2xMnfold | Gas 9: 100sccm, Argon, STEC 4400, MFC19, 2xMnfold | Base pressure: 1217mT | | Chamber 3: | Wide body | TTN process | A101 susceptor / pedestal | TTN process kit type | Single manometer | Manometer 1: 100mTorr | Lid type: 12.9" | AE MDX-650HIZ RF gen DC supply 1 | Wall cooling: PCW | Heater / cathode cooling: Neslab III | Gate valve: 3 pos | Cryo chamber pump | Gas 2: 100sccm, Argon, STEC 4400, MFC2, 2xMnfold | Gas 3: 200sccm, Argon, STEC 4400, MFC3, 2xMnfold | Base pressure: 935mT | | 2004 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9055225
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    Sputtering system, 8".
  • APPLIED MATERIALS: Endura 5500P

    Details
    ID#:
    9056035
    Category:
    Reactors
    Systems.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    194430
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    System, 8" | (1) wide body chamber | (3) narrow body chambers | (2) orient degas | (1) pre-clean II | Crated, can be inspected.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9057871
    Category:
    Reactors
    PVD systems, parts systems.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    194704
    Category:
    Reactors
    Wafer Size:
    8" 
    Sputtering system, 8" | | Wafer size: 8" flat (not notch) | Process: AlCu/ TiN/Ti | | Configuration: | Chamber 1: AlCu | Chamber 2: TiN | Chamber 3: Ti | Chamber 4: Ti | Chamber 5: cooling chamber | Preheat | Etch | Clamp (not electrostatic chuck) | | Robot: | Buffer: AMAT HP, ceramic blade | Transfer: AMAT HP, metal blade | | System monitor: | 1: stand alone | 2: through the wall | 3: stand alone | Includes (1) each monitor rack | | Load lock: | Narrow body with tilts in/out | No sliding sensor kit | | Chamber A: | - Chamber type: Pass through | - Chamber Lid: Metal Lid | - Cooling method: NA | | Chamber B: | - Chamber type: Cool down | - Chamber Lid: Metal lid | - Cooling method: By PCW | | Chamber D: | - Chamber type: Preclean I | | Chamber F: | - Chamber type: Orient/Degas | | Chamber 1: | - Chamber type: Standard body | - Chamber process: AlCu, Preheat | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K SLAVE | - RF Gen/DC power supply2: A, MDX-20K MASTER | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: P/N 0010-70086 | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 2: | - Chamber type: Wide Body | - Chamber process: TiN | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: : CTI CRYO 8F 2phase | - Source(Lid) type : UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 3: | - Chamber type: Wide Body | - Chamber process: Ti | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE, MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Chamber 4: | - Chamber type: Wide body | - Chamber process: Ti, Preheat | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas: Ar, N2 | | Includes: | - Chamber type: Wide body | - Chamber process: Ti, Preheat | - Process kit type/items/material: UNKNOWN | - RF Gen/DC power supply1: AE MDX-10K MASTER | - RF Gen/DC power supply2: N/A | - Chamber pump: CTI CRYO 8F 2phase | - Source (Lid) type: UNIDENTIFIED | - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 | - Process gas | | Installed | 1993 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9059685
    Category:
    Spare Parts
    IMP Ti/TiN chamber.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9060632
    Category:
    Spare Parts
    Chambers.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9060633
    Category:
    Spare Parts
    Chamber expansions units.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    9064236
    Category:
    Etchers / Ashers
    Vintage:
    2000 
    System, 8" | Process CH. 3: AL, CH. D: PC2(Oxide Etch ) | Software version Unknown | Wafer Shape SNNF | Wafer Cassette 8”PEEK Miraial | SMIF Interface None | Heat exchanger: none | | Chamber A COOL(STANDARD COOLDOWN CHAMBER) | Chamber B COOL(STANDARD COOLDOWN CHAMBER) | Chamber D PC2(Cryo Type) | Chamber E Orienter(ORIENTER WITH STANDARD DEGAS) | Chamber F Orienter(ORIENTER WITH STANDARD DEGAS) | Chamber 3 AL(Wide Body) | | Transfer: | Load LockA/B Type Narrow automated tilt out | Transfer Robot Type HP+ | Transfer Robot Blade Metal | Buffer Robot Type HP+ | Buffer Robot Blade Metal | Buffer Cryo Type BROOKS 8116071G001 | Transfer Cryo Type BROOKS 8116071G001 | | Chamber D: | Process Type Oxide Etch | Chamber Body Cryo Type(AMJ:0020-23249) | Pedestal Parts No. AMJ :0010-20754 | Lift Assy Parts No. AMJ :0010-20753 | Power Supply (kw) AMJ :0190-70099 | | Gas Pallet Configuration: | N2 MFC size 20sccm(SEC-4400MC) | N2 MFC size 300sccm(SEC-4400MC) | | Chamber 3: | Process Type AL | Chamber Body Wide Body(AMJ:0040-20195) | Source Type Standard | Target Type Unknown | Magnet Type AMJ :0010-20225(Mechanical Fail) | Magnet Shim Size 0.5MM | Lift Assy Parts No. 0010-70271 | Heater Parts No. 0010-12516 | Power Supply (kw) MDX-L12M-650(AMJ :0190-21110) | Power Supply (kw) MDX-L12M-650(AMJ :0190-21110) | Cryo Gate Valve Type 3Positon | Cryo Pump Type Enhanced(8116071G001) | | Gas Pallet Configuration: | N2 MFC size 20sccm(SEC-4400MC) | N2 MFC size 100sccm(SEC-4400MC) | | Cryo compressors: | (1) BROOOKS 8510, gas: He (99.999%pure) | (1) BROOOKS 8500, P/N: 8031348G001, gas: He (99.999%pure) | | 2000 vintage.
  • APPLIED MATERIALS: Endura 5500

    Details
    ID#:
    190620
    Category:
    Sputtering Systems
    Wafer Size:
    8" 
    PVD Sputtering system, 8" | Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type | Process: Al, Ti, TiN | | Configuration: | Chamber A: Pass through | Chamber B: Cool down | Chamber D: Preclean I | Chamber F: Orienter degas | Chamber 1: ALCu (clamp) | Chamber 2: TiN (101) | Chamber 3: Ti (101) | Chamber 4: Ti (clamp) | | Installed | 1995 vintage.
  • APPLIED MATERIALS: Endura

    Details
    ID#:
    9059278
    Category:
    Reactors
    System.
Copyright © 2011 Capital Asset Exchange & Trading LLC. All rights reserved.