APPLIED MATERIALS MIRRA MESA Products

  • APPLIED MATERIALS: Mirra Mesa

    Details
    ID#:
    9071746
    Category:
    Wafer Grinding, Lap...
    CMP System, 8" | Polisher: Mirra 3400 | Controller: 5200 | Cleaner: Mesa | Indexer: Rorze FABS | FOUP's Installed: 3 | Metrology: None | Slurry(P1+P2+P3): ABCD each | Endpoint Laser P1: IScan | Endpoint Laser P2: FullScan | Endpoint Laser P3: None | Polisher Middle Skins: Opaque | UPA: Standard | Chiller: No | Com Port Server: Digi EL160 | Cleaner Brush LDM: User-Modified direct feed LDM with entegris flow sensors | Walking Beam: PEEK Fingers with PP Grippers | Slurry in CLC: Yes | Slurry Arm: 4-line | Polishing Head: Titan I | Rotary Union: 4-port | Cross type: Cattrack | Platen Teflon Coated: Yes | Pad Conditioner Type: Universal | Retainer Ring Type: AEP III | Membrane Type: Center Bump | PC Diaphragm: Silicon | Brush with Core Type: PP Core | | Software: | Polisher: MB60a1 | Cleaner: CB22p2 | Endpoint: IB11h7 | CPU: Pentium III 400MHz | Dual RAID HardDisk: Yes | HardDisk Size: 68GB | RAM: 128MB | | Upgrade / CIP Retrofit Details: | LLA guide pin: Self Align | Slider motor: 200W | PM reduction kit: Yes | Queue Tub: Yes | Membrane UPA filter: Yes | blackout covers: Yes | Splash guard: Yes | Wind Tunnel: Yes | Exhaust blower: Yes | Magnehelic Pressure Low Level  detection kit: Yes | SRD Exhaust Interlock: Yes | Cassette slot run order (from slot 25 down to 1): Yes | | 2001 vintage.
  • APPLIED MATERIALS: Mirra Mesa

    Details
    ID#:
    9071745
    Category:
    Wafer Grinding, Lap...
    Wafer Size:
    8" 
    Vintage:
    2003 
    CMP System, 8" | Polisher: Mirra 3400 | Controller: 5200 | Cleaner: Mesa | Indexer: Rorze FABS | FOUP's Installed: 3 | Metrology: None | Slurry(P1+P2+P3): ABCD each | Endpoint Laser P1: IScan | Endpoint Laser P2: FullScan | Endpoint Laser P3: None | Polisher Middle Skins: Opaque | UPA: Standard | Chiller: No | Com Port Server: Digi EL160 | Cleaner Brush LDM: User-Modified direct feed LDM with entegris flow sensors | Walking Beam: PEEK Fingers with PP Grippers | Slurry in CLC: Yes | Slurry Arm: 4-line | Polishing Head: Titan I | Rotary Union: 4-port | Cross type: Cattrack | Platen Teflon Coated: Yes | Pad Conditioner Type: Universal | Retainer Ring Type: AEP III | Membrane Type: Center Bump | PC Diaphragm: Silicon | Brush with Core Type: PP Core | | Software: | Polisher: MB60a1 | Cleaner: CB22p2 | Endpoint: IB11h7 | CPU: Pentium III 400MHz | Dual RAID HardDisk: Yes | HardDisk Size: 68GB | RAM: 128MB | | Upgrade / CIP Retrofit Details: | LLA guide pin: Self Align | Slider motor: 200W | PM reduction kit: Yes | Queue Tub: Yes | Membrane UPA filter: Yes | blackout covers: Yes | Splash guard: Yes | Wind Tunnel: Yes | Exhaust blower: Yes | Magnehelic Pressure Low Level  detection kit: Yes | SRD Exhaust Interlock: Yes | Cassette slot run order (from slot 25 down to 1): Yes | | 2003 vintage.
  • APPLIED MATERIALS: Mirra Mesa

    Details
    ID#:
    9063651
    Category:
    Wafer Grinding, Lap...
    CMP system.
  • APPLIED MATERIALS: Mirra Titan II

    Details
    ID#:
    9049233
    Category:
    Spare Parts
    Wafer Size:
    8" 
    Polishing head, 8" | For Mirra profiler, 4-zone.
  • APPLIED MATERIALS: Mirra Trak

    Details
    ID#:
    144245
    Category:
    Wafer Grinding, Lap...
    Wafer Size:
    8" 
    Vintage:
    2001 
    Oxide CMP system, 8", non-SMIF | Model number: CMP 5201 | Application Oxide | Consumed Process Materials: | Buff Slurry Not used | Pad Conditioner DDF 2 | Pad Conditioner Holder Magnet Type | Factory Interface Options: | Cleaner Type Ontrack | Megasonics None | Robot Type Rorze | In Situ Removal Rate Monitor ISRM (digital) | In Line Metrology Not used | SECS GEM Interface YES | Cassette Tank Not used | Cassette Type 8", Cassette Type | Installation Type FABS 212 | Calibration Tool: | Special Kit for Maintenance None | Dow n force cal. None | Head rebuild kit None | RPM 3 Cal Kits None | Fabs Lap Top Computer None | Platen and Head Options: | Polishing Head Titan 1 head | Retaining Ring 3rd vendor | Pad Wafer Loss Sensor YES | Platen Temperature Control Not used | Long Robot System: | Long Robot Used | Slurry Delivery Options: | Slurry Delivery YES | Slurry Flow Rate YES | Slurry Flow Monitor YES | Slurry Containment Bulkhead YES | Slurry Facilities YES | Slurry Loop Line YES | Slurry Dispense Arm YES | Slurry Leak Detector YES | DI Water YES | High Pressure Rinse YES | System S/W Status: | Mirra Type 3400 | Cleaner Type Ontrack | Fabs type FABS 212 | System Safety Equipment: | Red Turn To Release EMO Button YES | EMO Guard Ring YES | System Labels YES | Earthquake Brackets Not used | Smoke Detector YES | Electrical Requirements: | Line Frequency 50/60Hz | Line Voltage 208VAC | Uninterruptible Pow er Supply Not used | Pow er Lamp Yes | Pow er Connected Lamp Yes | Circuit Breaker Yes | AC Outlet Box Yes | Conf igurable IO Yes | GFI Yes | Factory Hookup: | Upper Exhaust Yes | Low er Exhaust Yes | Upper Exhaust Connection Yes | Drain Manifold Yes | Drain Adapter Yes | Castors for Mirra System Only Fabs | Weight Distribution Plate(Skid pad) NONE | User Interface: | Gray Area keyboard/mouse | Cleanroom Monitor/keyboard/m | Class 1 Cart for 1 Monitor monitor only None/Need to new one if it need | Class 1 Cart for 2 Monitors | Class 100 Cart for 2 Monitors | Stainless Cart Gray area None/ Need to new one if it need | Mouse or Trackball Mouse | Printer Not used | Hard Disk Backup Not used | Polisher/Fabs Light Tower: | Polisher Tower Mounting Type Yes Fabs-Wall mount type | Polisher Tower No of Colors 3 | Polisher Tower Colors Sequence Red/Green/Orange | Cleaner Options: | OnTrak Cleaner Yes HF :1%, Ammonium :29% | Maintenance Options: | Spray Gun Yes | Side Panel Window Yes | Pad Conditioner Cover Yes | Cross cover Yes | Slurry Flow Calibration Kit | Lapping Stone Not used | Robot Door Lock Yes | Special Options: | Nylon Brush Not used | EChain Tef lon Sheet Not used | UPA Upgrade Roof / Stainless | Independent membrane Vac Yes | Low Pressure Release Water | Voltage: 200/208 VAC, 3.0 | Frequency: 50/60 Hz | Full load current: 170A 3 Wire (Delta) | Ampere rating of largest load: 30A | Short circuit interrupt capacity: 10,000A | Ground fault: 25mA | 2001 vintage.
  • APPLIED MATERIALS: Mirra Trak

    Details
    ID#:
    148727
    Category:
    Wafer Grinding, Lap...
    Oxide CMP system, 8" | | Specifications: | Technology: Oxide CMP | Platform type: Mirra / Ontrack | Wafer size: 8"", notch type | Application: Oxide | Process type: CMP | Device type: Oxide | Non-SMIF | | Consumed process materials: | Buff slurry: not used | Pad conditioner: DDF 2 | Pad conditioner head: head upgraded | Pad conditioner holder: magnet type | | Factory interface options: | Cleaner type: Ontrack, five finger spin station | Megasonics: none | Robot type: RORZE | In situ removal rate monitor: ISRM (digital), cables are in the machine but not recognized ISRM module | In situ metrology: not used | SECS GEM interface: yes | Cassette tank: yes, 4 cassette platform is missing in the tub | Cassette type: 8", cassette type | Installation type: FABS 212 | Integrated system basic FABS: yes with HEPA filter | | Calibration tool: | Special kit for maintenance: none | Down force cal.: none | Head rebuild kit: none | RPM 3 cal kits: none | Fabs laptop computer: none | | Platen and head options: | Polishing head: Titan 1 head | Retaining ring: 3rd vendor | Pad wafer loss sensor: yes, sensor cover missing | Platen temperature control: not used | | Long robot system: used, standard | | Slurry delivery options: | Slurry delivery: yes: NT flowmeter (Entigris-6ea) | Slurry flow rate : yes: Oxide slurry SS-25 and SAP 3000 and Ceria HS8500A | Slurry flow monitor: yes | Slurry containment bulkhead: yes | Slurry facilities: yes | Slurry loop line: yes | Slurry dispense arm: yes | Slurry leak detector: yes | DI water: yes | High pressure rinse: yes | | System software status: | Mirra type: 3400 | Cleaner type: Ontrack | Fabs type: FABS 212 | | System safety equipment: | Red turn-to-release EMO button: yes | EMO guard ring: yes | System labels: yes | Earthquake brackets: not used | Smoke detector: yes | | Electrical requirements: | Line frequency: 50/60Hz, back panel cover broken | Line voltage: 208VAC | Uninterruptible power supply: not used | Power lamp: yes | Power connected lamp: yes | Circuit breaker: yes | AC outlet box: yes | Configurable IO: yes | GFI: yes | | Umbilicals: | Polisher to controller cable | Controller to monitor cable | Slurry system interface cable | | Factory hookup | Upper exhaust: yes | Lower exhaust: yes | Upper exhaust connection: yes | Drain manifold: yes | Drain adapter: yes | Castors for Mirra system: only fabs | Weight distribution plate (skid pad): none, need plates | | User interface: | Gray area: keyboard/mouse | Cleanroom: monitor/keyboard/mouse | Class 1 cart for 1 monitor: monitor only, none/need to new one if it need | Stainless cart: gray area, none/need to new one if it need | Mouse or trackball: mouse | Printer: not used | Hard disk backup: not used | | Polisher / Fabs light tower: | Polisher tower mounting type: yes | Polisher tower number of colors: 3, Ontrack tower missing | Polisher tower colors sequence: red/green/orange | | Cleaner options: | Ontrack cleaner: yes: HF: 1%, Ammonium: 29%, transfer O-ring and toggle roller and bushing need replacing | Contamination parts need to be replaced | Rotation motor hard to rotate | | Manuals: | CD ROM: missing | Standard paper manuals: missing | Standard paper manuals quantity: missing | Cleanroom paper manuals: missing | Cleanroom paper manuals quantity: missing | | Additional items: Titan head spare | | Calibration kit: | RPM3: none | Down force meter: none | Sonic tension meter: none | Robot calibration PC: none | CD-ROM driver: none | Calibration tool: none | | Maintenance options: | Spray gun: yes | Side panel window: yes, Mirra side door broken, platen #2 low skin door-missing, long robot and cassette tub black panel missing, transfer module cover missing | Pad conditioner cover: yes | Cross cover: yes, bad and contaminated | Lapping stone: not used | Robot door lock: yes: water prevent block missing, below long robot | | Special options: | Nylon brush: not used | EChain Teflon sheet: not used | UPA upgrade: roof / stainless, need Swagelock type of fitting | Independent membrane vac: yes | | Spares: | Additional heads: 4 | | Currently crated | 2006 vintage.
  • APPLIED MATERIALS: Mirra Titan II

    Details
    ID#:
    9049236
    Category:
    Spare Parts
    Polishing head, 8" | For Mirra profiler, 4-zone.
  • APPLIED MATERIALS: Mirra Trak

    Details
    ID#:
    9027503
    Category:
    Wafer Grinding, Lap...
    Oxide CMP system, 8" | | Specifications: | Technology: Oxide CMP | Platform type: Mirra / Ontrack | Wafer size: 8"", notch type | Application: Oxide | Process type: CMP | Device type: Oxide | | Consumed process materials: | Buff slurry: not used | Pad conditioner: DDF 3 | Pad conditioner holder: magnet type | | Factory interface options: | Cleaner type: Ontrack | Megasonics: none | Robot type: RORZE | In situ removal rate monitor: ISRM (digital), cables are in the machine but not recognized ISRM module | In situ metrology: not used | SECS GEM interface: yes | Cassette tank: yes, 4 cassette platform is missing in the tub | Cassette type: 8", cassette type | Installation type: FABS 212 | | Calibration tool: | Special kit for maintenance: none | Down force cal.: none | Head rebuild kit: none | RPM 3 cal kits: none | Fabs laptop computer: none | | Platen and head options: | Polishing head: Titan 1 head | Retaining ring: 3rd vendor | Pad wafer loss sensor: yes, sensor cover missing | Platen temperature control: not used | | Long robot system: used, KORO robot | | Slurry delivery options: | Slurry delivery: yes: NT flowmeter (Entigris-6ea) | Slurry flow rate : yes: Oxide slurry SS-25 and SAP 3000 and Ceria HS8500A | Slurry flow monitor: yes | Slurry containment bulkhead: yes | Slurry facilities: yes | Slurry loop line: yes | Slurry dispense arm: yes | Slurry leak detector: yes | DI water: yes | High pressure rinse: yes | | System software status: | Mirra type: 3400 | Cleaner type: Ontrack | Fabs type: FABS 212 | | System safety equipment: | Red turn-to-release EMO button: yes | EMO guard ring: yes | System labels: yes | Earthquake brackets: not used | Smoke detector: yes | | Electrical requirements: | Line frequency: 50/60Hz, back panel cover broken | Line voltage: 208VAC | Uninterruptible power supply: not used | Power lamp: yes | Power connected lamp: yes | Circuit breaker: yes | AC outlet box: yes | Configurable IO: yes | GFI: yes | | Umbilicals: | Polisher to controller cable | Controller to monitor cable | Slurry system interface cable | | Factory hookup | Upper exhaust: yes | Lower exhaust: yes | Upper exhaust connection: yes | Drain manifold: yes | Drain adapter: yes | Castors for Mirra system: only fabs | Weight distribution plate (skid pad): none, need plates | | User interface: | Gray area: keyboard/mouse | Cleanroom: monitor/keyboard/mouse | Class 1 cart for 1 monitor: monitor only, none/need to new one if it need | Stainless cart: gray area, none/need to new one if it need | Mouse or trackball: mouse | Printer: not used | Hard disk backup: not used | | Polisher / Fabs light tower: | Polisher tower mounting type: yes | Polisher tower number of colors: 3, Ontrack tower missing | Polisher tower colors sequence: red/green/orange | | Cleaner options: | Ontrack cleaner: yes: HF: 1%, Ammonium: 29%, transfer O-ring and toggle roller and bushing need replacing | DNS cleaner: Contamination parts need to be replaced | Mesa cleaner | | Manuals: | CD ROM: missing | Standard paper manuals: missing | Standard paper manuals quantity: missing | Cleanroom paper manuals: missing | Cleanroom paper manuals quantity: missing | | Additional items: Titan head spare | | Calibration kit: | RPM3: none | Down force meter: none | Sonic tension meter: none | Robot calibration PC: none | CD-ROM driver: none | Calibration tool: none | | Maintenance options: | Spray gun: yes | Side panel window: yes, Mirra side door broken, platen #2 low skin door-missing, long robot and cassette tub black panel missing, transfer module cover missing | Pad conditioner cover: yes | Cross cover: yes | Lapping stone: not used | Robot door lock: yes: water prevent block missing, below long robot | | Special options: | Nylon brush: not used | EChain Teflon sheet: not used | UPA upgrade: roof / stainless, need Swagelock type of fitting | Independent membrane vac: yes | | Spares: | Additional heads: 4 | | 2006 vintage.
  • APPLIED MATERIALS: Mirra Trak

    Details
    ID#:
    148728
    Category:
    Wafer Grinding, Lap...
    Oxide CMP system, 8" | | Specifications: | Technology: Oxide CMP | Platform type: Mirra / Ontrack | Wafer size: 8", notch type | Application: Oxide | Process type: CMP | Device type: Oxide | Non-SMIF | | Consumed process materials: | Buff slurry: not used | Pad conditioner: DDF 2 | Pad conditioner head: head upgraded | Pad conditioner holder: magnet type | | Factory interface options: | Cleaner type: Ontrack, five finger spin station | Megasonics: none | Robot type: RORZE | In situ removal rate monitor: ISRM (digital), cables are in the machine but not recognized ISRM module | In situ metrology: not used | SECS GEM interface: yes | Cassette tank: yes, 4 cassette platform is missing in the tub | Cassette type: 8", cassette type | Installation type: FABS 212 | Integrated system basic FABS: yes with HEPA filter | | Calibration tool: | Special kit for maintenance: none | Down force cal.: none | Head rebuild kit: none | RPM 3 cal kits: none | Fabs laptop computer: none | | Platen and head options: | Polishing head: Titan 1 head | Retaining ring: 3rd vendor | Pad wafer loss sensor: yes, sensor cover missing | Platen temperature control: not used | | Long robot system: used: KORO robot (3rd vendor) | | Slurry delivery options: | Slurry delivery: yes: NT flowmeter (Entigris-6ea) | Slurry flow rate : yes: Oxide slurry and HSS additive | Slurry flow monitor: yes | Slurry containment bulkhead: yes | Slurry facilities: yes | Slurry loop line: yes | Slurry dispense arm: yes | Slurry leak detector: yes | DI water: yes | High pressure rinse: yes | | System software status: | Mirra type: 3400 | Cleaner type: Ontrack | Fabs type: FABS 212 | | System safety equipment: | Red turn-to-release EMO button: yes | EMO guard ring: yes | System labels: yes | Earthquake brackets: not used | Smoke detector: yes | | Electrical requirements: | Line frequency: 50/60Hz, back panel cover broken | Line voltage: 208VAC | Uninterruptible power supply: not used | Power lamp: yes | Power connected lamp: yes | Circuit breaker: yes | AC outlet box: yes | Configurable IO: yes | GFI: yes | | Umbilicals: | Polisher to controller cable | Controller to monitor cable | Slurry system interface cable | | Factory hookup | Upper exhaust: yes | Lower exhaust: yes | Upper exhaust connection: yes | Drain manifold: yes | Drain adapter: yes | Castors for Mirra system: only fabs | Weight distribution plate (skid pad): none, need plates | | User interface: | Gray area: keyboard/mouse | Cleanroom: monitor/keyboard/mouse | Class 1 cart for 1 monitor: monitor only, none/need to new one if it need | Stainless cart: none, none/need to new one if it need | Mouse or trackball: mouse | Printer: not used | Hard disk backup: not used | | Polisher / Fabs light tower: | Polisher tower mounting type: yes | Polisher tower number of colors: 3, Ontrack tower missing | Polisher tower colors sequence: red/green/orange | | Cleaner options: | Ontrack cleaner: yes: HF: 1%, Ammonium: 29%, transfer O-ring and toggle roller and bushing need replacing | Contamination parts need to be replaced | Rotation motor hard to rotate | | Manuals: | CD ROM: missing | Standard paper manuals: missing | Standard paper manuals quantity: missing | Cleanroom paper manuals: missing | Cleanroom paper manuals quantity: missing | | Additional items: Titan head spare | | Calibration kit: | RPM3: none | Down force meter: none | Sonic tension meter: none | Robot calibration PC: none | CD-ROM driver: none | Calibration tool: none | | Maintenance options: | Spray gun: yes | Side panel window: yes, platen #2 low skin door-missing, long robot and cassette tub black panel missing, transfer module cover missing | Pad conditioner cover: yes | Cross cover: yes | Lapping stone: not used | Robot door lock: yes: water prevent block missing, below long robot | | Special options: | Nylon brush: not used | EChain Teflon sheet: not used | UPA upgrade: roof / stainless, need Swagelock type of fitting | Independent membrane vac: yes | | Spares: | Additional heads: 4 | | 2006 vintage.
  • APPLIED MATERIALS: Mirra 3400 / AS2000

    Details
    ID#:
    9074119
    Category:
    Wafer Grinding, Lap...
    Wafer Polisher, 8" | Integration: Mirra and AS2000 | Software: PS58p0 | OS: English | Syscon | I-Pressure pump | Pharmaceutical fluid supply Cabinet | FABS | Manual | 2003 vintage.
  • APPLIED MATERIALS: Mirra Titan II

    Details
    ID#:
    9049234
    Category:
    Spare Parts
    Wafer Size:
    8" 
    Polishing head, 8" | For Mirra profiler, 4-zone.
  • APPLIED MATERIALS: Mirra Titan II

    Details
    ID#:
    9049235
    Category:
    Spare Parts
    Wafer Size:
    8" 
    Polishing head, 8" | For Mirra profiler, 4-zone.
  • APPLIED MATERIALS: Mirra 3400 / AS02000

    Details
    ID#:
    9074118
    Category:
    Wafer Grinding, Lap...
    Wafer polishers, 8" | Integration: Mirra and AS2000 | Software: PS58p0 | OS: English | Syscon | I-Pressure pump | Pharmaceutical fluid supply Cabinet | FABS | Manual | 2003 vintage.
  • APPLIED MATERIALS: Mirra 3400 / AS2000

    Details
    ID#:
    9074117
    Category:
    Wafer Grinding, Lap...
    Wafer Polisher, 8" | Integration: Mirra and AS2000 | Software: PS58p0 | OS: English | Syscon | I-Pressure pump | Pharmaceutical fluid supply Cabinet | FABS | Manual | 2003 vintage.
  • APPLIED MATERIALS: Mirra

    Details
    ID#:
    9065266
    Category:
    Wafer Grinding, Lap...
    CMP system, 8" | Includes LAM DSS 200 inline system | 2000 vintage.
  • APPLIED MATERIALS: Mirra 3400 OnTrak

    Details
    ID#:
    9024391
    Category:
    Wafer Grinding, Lap...
    Wafer Size:
    8" 
    Vintage:
    2005 
    CMP system, 8" | 2005 vintage.
  • APPLIED MATERIALS: Mirra 3400

    Details
    ID#:
    9025486
    Category:
    Wafer Grinding, Lap...
    Wafer Size:
    8" 
    Vintage:
    1999 
    Dielectric CMP system, 8" | | (4) Head | (3) Platen system. | (4) 8” Titan-2 Oxide Head/AEP retaining ring with wafer sensor installed on the tool | (3) latest revision of pad conditioners | InSitu removal monitor (ISRM) on all platens | ISRM computer, monitor | PC workstation with single 17" monitor | Separate controller with 30ft. umbilicals, top AC feed. | (4) each wafer cassettes | Robot Non-integrated | Wafer handling specs, 8” | Cassette type, 200mm, 25-Slot, PFA Cassettes | Cable (30 ft) for polisher | CE/S2-93/OSHA compliant EMO button, Blank Label | Smoke detector for controllers | Controller light tower | 3-color status signal lamp with alarm mounted horizontally on controller face. | Low flow slurry | Must meet OUI & GEM/SECSII software compliance. | Cable (25 ft.) for monitor | (1) Stainless steel cart, with.... one (1) system monitor, one (1) bezel | 8” upper exhaust flange | NovaReady with lower exhaust | 75" system only | 3-Color status vertical signal lamp on robot front face | Auto-Lift cassette tank with manual lift | Digital ISRM | Special coated platen | E-Chain Teflon sheet | | Year 2000: DDF3 conditioner upgrade | Year 2001: Cassette mapper software | | CE-Marked | 200/208 V, 50/60 Hz, 3-Ph | 1999 vintage.
  • APPLIED MATERIALS: Mirra 3400

    Details
    ID#:
    9067393
    Category:
    Wafer Grinding, Lap...
    Systems, 8" | Non-SMIF.
  • APPLIED MATERIALS: Mirra OnTrak

    Details
    ID#:
    9064388
    Category:
    Wafer Grinding, Lap...
    Wafer Size:
    8" 
    Vintage:
    1999 
    Oxide CMP System, 8" | 1999 vintage.
  • APPLIED MATERIALS: Mirra 3400

    Details
    ID#:
    9056034
    Category:
    Wafer Grinding, Lap...
    CMP system.
Copyright © 2011 Capital Asset Exchange & Trading LLC. All rights reserved.