FEI MICRION 875 AUTOFIB Products

  • FEI: DualBeam 865

    Details
    ID#:
    9076200
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2002 
    Dual ion beam FIB / SEM | Schottky FEG SEM | Magnum ion column | Low KV capable for Hi-Res TEM sample preparation | SE and BSE imaging | Secondary ion imaging | Resolution of SEM: 3 nm at 5 KV and 30 KV | Software: Window XP, FEI XP UI | Stage: 200 mm full travel, -5° to 60° tilt | (3) GISes | Wafer robot | | De-installed in Q4 2012 | 2002 vintage.
  • FEI: 200xP

    Details
    ID#:
    9046854
    Category:
    Ion Milling
    Focused ion beam system | Magnum ion column | 50 mm Stage | (2) GIC | Turbo vacuum | 1999 vintage.
  • FEI: Tecnai G2 F20

    Details
    ID#:
    141774
    Category:
    Scanning Electron M...
    TEM | S-Twin lens | EDAX EDS included | 2004 vintage.
  • FEI: Nova 200

    Details
    ID#:
    9046379
    Category:
    Scanning Electron M...
    Dual beam system, parts machine.
  • FEI: Tecnai G2 20

    Details
    ID#:
    9030551
    Category:
    Scanning Electron M...
    TEM | 200 kV LaB6 | BF, DF modes | FEI TIA UI | Compustage | Single tilt holder | | Optional: Camera and EDS.
  • FEI: 800

    Details
    ID#:
    9046863
    Category:
    Ion Milling
    Focused ion beam system | 8" XY Stage travel | Prelens | (2) GIS | 1999 vintage.
  • FEI: DualBeam 820

    Details
    ID#:
    9026430
    Category:
    Ion Milling
    Dual ion beam FIB / SEM.
  • FEI: Tecnai G2 F30 S-Twin

    Details
    ID#:
    9028804
    Category:
    Scanning Electron M...
    Vintage:
    2006 
    S/TEM | | Gun: | Schottky FEG | 20 – 300 kV | Automatic aperture system | | Resolution: 0.34 nm point-to-point | | Imaging: | STEM, HAADF, BF/DF | 2k x 2k CCD | | Spectroscopy: | Edax EDS | Gatan 863 Tridiem | | Special applications: | Holography (Bi-Prism, and Gatan Holoworks) | Lorentz | Tomography (FEI SW and tomography holder) | EFTEM EELS | Tecnai free lens control | | Sample holder: | Single tilt compustage | High visibility double tilt low background holder | Tomography holder | | Camera: Gatan Tridiem 863 CCD 2k x 2k | Vacuum: diffusion pump with mechanical RP | | 2006 vintage.
  • FEI: XL 30 FEG

    Details
    ID#:
    9028893
    Category:
    Scanning Electron M...
    TEM, 1996 vintage.
  • FEI: DualBeam 235

    Details
    ID#:
    9047177
    Category:
    Ion Milling
    Vintage:
    2003 
    Dual ion beam FIB / SEM | Magnum ion column | 2 GIS | Small chamber dual beam | | Omniprobe, evactron, and more GIS available | 2003 vintage.
  • FEI: 5322-695-16115

    Details
    ID#:
    9024620
    Category:
    Spare Parts
    Poletip 60° Snorlens.
  • PHILIPS / FEI: XL 40

    Details
    ID#:
    9049866
    Category:
    Scanning Electron M...
    SEM | LaB6 emitter, 6-position bias control | OS: Windows 3.11 | Fully integrated image storage | ET type Secondary Electron Detector | FEI (Philips) Solid State BSE detector | CCD Chamberscope | Resolution: 3nm at 30kV; 15nm at 1kV | Magnification range: 10x – 400,000x | Accelerating Voltage: 0.2 to 30kV | Drawer type door | 5 axis stage (XYZRT) – XYR motorized with 150mm travel in X and Y | Manual Tilt and Z adjustment | External Z adjustment of 37mm | Interior chamber size 379mm x 325mm x 315mm | (8) accessory ports, including BNC electrical feedthrough | Currently installed.
  • FEI: Tecnai 10

    Details
    ID#:
    151424
    Category:
    Scanning Electron M...
    TEM, 100kV | Biological Set up | Optional AMT Sidemount CCD.
  • FEI: DA300

    Details
    ID#:
    9052303
    Category:
    Wafer Testing And M...
    Wafer Size:
    12" 
    Defect analyzer, 12" | | Includes: | Dual beam system | Electron imaging | Focused ion beam milling | FOUP wafer handling | Omniprobe nanomanipulator | Scanning transmission electron microscopy (STEM) | Energy dispersive x-ray spectroscopy (EDX) | Gas injection systems (GIS) with tool automation: | Deposition: Platinum, Tungsten | Reactive: Insulator enhanced etching (XEF2) | TEM Sample preparation | Cross section and plan view lamellae | Low kV cleaning capability | SEM Imaging | Electron or ion beam milling/deposition | | Sample stage: 12" | Stage motion: 305 x 305 mm travel | Stage motion: 1.5 μm accuracy | Schottyky electron gun: 200 V - 30 kV | Image resolution: 7 nm FIB, 2 nm SEM | Liquid metal gallium ion source: 5 - 30 kV | Milling current range: pA - nA | STEM imaging: DF, BF, HAADF 1.1 nm at 30 kV.
  • FEI: Nova NanoSEM 430

    Details
    ID#:
    9047188
    Category:
    Scanning Electron M...
    Vintage:
    2011 
    SEM | High and low vacuum | High resolution | FEG SEM | 4" mm x 4" mm stage | Loaded: TLD SE, BSE, SED, LV SED (LVD), UHR LV SED (Helix), Low KV BSED, GAD | 2011 vintage.
  • FEI: DualBeam 835

    Details
    ID#:
    9047185
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" | Magnum ion | 2 GIS | 8" Load lock | 2000 vintage.
  • FEI: DualBeam 835

    Details
    ID#:
    9047178
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam SEM / FIB, 8" | Magnum ion | 2 GIS | Wafer loading robot | 2000 vintage.
  • FEI: DualBeam Expida 1285

    Details
    ID#:
    9047183
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" - 12" | 2000 vintage.
  • FEI: DualBeam 830

    Details
    ID#:
    9047184
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    1999 
    Dual ion beam FIB / SEM, 8" | Pre lens ion | 2 GIS | Turbo vacuum | 1999 vintage.
  • FEI: 4035-272-16981

    Details
    ID#:
    9024619
    Category:
    Spare Parts
    F/G, S-ion column.
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