FEI MICRION 875 AUTOFIB Products

  • FEI: DualBeam 865

    Details
    ID#:
    9076200
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2002 
    Dual ion beam FIB / SEM | Schottky FEG SEM | Magnum ion column | Low KV capable for Hi-Res TEM sample preparation | SE and BSE imaging | Secondary ion imaging | Resolution of SEM: 3 nm at 5 KV and 30 KV | Software: Window XP, FEI XP UI | Stage: 200 mm full travel, -5° to 60° tilt | (3) GISes | Wafer robot | | De-installed in Q4 2012 | 2002 vintage.
  • FEI: FIB 200

    Details
    ID#:
    9082663
    Category:
    Ion Milling
    Focused Ion Beam System | | Single beam | Pre-lens ion column: | Provides image resolution of 7nm and milling current up to 11nA | Enables deflection (for scanning) before the final lens, bringing the lens closer to the sample for best spot size | 50x50mm XY stage, with rotation, tilt and z-motions | Loadlock with separate pump for fast sample exchange | Turbo pump for main chamber | Real time monitor to observe milling, aka Leader oscilloscope | Keithley Pico-ammeter to measure beam current | (2) GIS types to be selected from: EE, IEE, Metal dep (Pt) or TEOS | Chamber camera and monitor | Operating system: Windows NT | Computer control with FEI software and Seiko screen printer | Manual user interface (MUI), joystick and mouse controls | Manuals | (2) gas injectors with controller: choose from iodine, XeF2, Platinum, or TEOS gases | Line transformer (main), AC distribution box and Maintenance tool kit.
  • FEI: 820

    Details
    ID#:
    9052452
    Category:
    Ion Milling
    Focused ion beam dual beam system | 220 V, 50/60 Hz, 3,500 VA | 1996 vintage.
  • PHILIPS / FEI: XL 40

    Details
    ID#:
    9049866
    Category:
    Scanning Electron M...
    SEM | LaB6 emitter, 6-position bias control | EDX | OS: Windows 3.11 | Fully integrated image storage | ET type Secondary Electron Detector | FEI (Philips) Solid State BSE detector | CCD Chamberscope | Resolution: 3nm at 30kV; 15nm at 1kV | Magnification range: 10x – 400,000x | Accelerating Voltage: 0.2 to 30kV | Drawer type door | 5 axis stage (XYZRT) – XYR motorized with 150mm travel in X and Y | Manual Tilt and Z adjustment | External Z adjustment of 37mm | Interior chamber size 379mm x 325mm x 315mm | (8) accessory ports, including BNC electrical feedthrough | Currently installed.
  • FEI: Morgagni

    Details
    ID#:
    9047343
    Category:
    Scanning Electron M...
    Vintage:
    2008 
    Scanning electron microscope (SEM) | Tungsten filament | 1 K x 1 K side mount camera | Single tilt holder | 100 kV | 2008 vintage.
  • FEI: DA300

    Details
    ID#:
    9052303
    Category:
    Wafer Testing And M...
    Wafer Size:
    12" 
    Defect analyzer, 12" | | Includes: | Dual beam system | Electron imaging | Focused ion beam milling | FOUP wafer handling | Omniprobe nanomanipulator | Scanning transmission electron microscopy (STEM) | Energy dispersive x-ray spectroscopy (EDX) | Gas injection systems (GIS) with tool automation: | Deposition: Platinum, Tungsten | Reactive: Insulator enhanced etching (XEF2) | TEM Sample preparation | Cross section and plan view lamellae | Low kV cleaning capability | SEM Imaging | Electron or ion beam milling/deposition | | Sample stage: 12" | Stage motion: 305 x 305 mm travel | Stage motion: 1.5 μm accuracy | Schottyky electron gun: 200 V - 30 kV | Image resolution: 7 nm FIB, 2 nm SEM | Liquid metal gallium ion source: 5 - 30 kV | Milling current range: pA - nA | STEM imaging: DF, BF, HAADF 1.1 nm at 30 kV.
  • FEI: Nova NanoSEM 430

    Details
    ID#:
    9047188
    Category:
    Scanning Electron M...
    Vintage:
    2011 
    SEM | High and low vacuum | High resolution | FEG SEM | 4" mm x 4" mm stage | Loaded: TLD SE, BSE, SED, LV SED (LVD), UHR LV SED (Helix), Low KV BSED, GAD | 2011 vintage.
  • FEI: DualBeam 835

    Details
    ID#:
    9047185
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" | Magnum ion | 2 GIS | 8" Load lock | 2000 vintage.
  • FEI: 800

    Details
    ID#:
    9046863
    Category:
    Ion Milling
    Focused ion beam system | 8" XY Stage travel | Prelens | (2) GIS | 1999 vintage.
  • FEI: DualBeam 835

    Details
    ID#:
    9047178
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam SEM / FIB, 8" | Magnum ion | 2 GIS | Wafer loading robot | 2000 vintage.
  • FEI: DualBeam Expida 1285

    Details
    ID#:
    9047183
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" - 12" | 2000 vintage.
  • FEI: DualBeam 830

    Details
    ID#:
    9047184
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    1999 
    Dual ion beam FIB / SEM, 8" | Pre lens ion | 2 GIS | Turbo vacuum | 1999 vintage.
  • FEI: SNP XT Rapid CD

    Details
    ID#:
    9058073
    Category:
    Wafer Testing And M...
    Photomask metrology system | P/N: SNP100 | Delivers 3-D critical dimension capability for the 65nm node | Next Generation Precision Scanning System | Upgraded high magnification microscope | SNP XT field upgradable with Rapid CD capability | | ScanHead | Z stage Gear box | Cognex board | XT Z stage linear encoder | Laser head, 5517C | Monitor, 5,6“ | Motion controller | Robot System | | CD repeatability: 3.4nm | CD reproducibility: 4.5nm | Calibration CD standards: no | Sidewall angle precision: <3° | Automated defect review: no | Depth repeatability: 0.6nm | Depth reproducibility: 0.2nm | Calibrated depth standards: yes | Tip size: 120nm x 240nm | | Operating hours: ~18,000.
  • FEI: 800

    Details
    ID#:
    9080063
    Category:
    Ion Milling
    Focused Ion Beam (FIB) system, 8".
  • FEI: Nova NanoSEM 450

    Details
    ID#:
    9070198
    Category:
    Scanning Electron M...
    FE-SEM | Manual user interface | Support computer | Helix detector | Retractable STEM detector (STEMIII) | DBS detector retractable | GAD low-kV SSBSED | 6-Channel detector amplifier | Quick loader | STEM III quickloader adaption; pre-tilted holder | Plasma cleaner | CryCleaner EC | Nav-Cam | SIS Scandium imagine software | (4) SIS Scandium desktop license | SIS Scandium solution height | Network dongle licences 50 | Correlative navigation | 4" Wafer holder | 6" Wafer holder BON | UMB Specimen holder kit | Acoustic enclosure for prevacuum pump | 50-pin electrical feedthrough | 7-pin Coax electrical feedthrough | TEAM integration kit | (4) Thermoflex Chiller, 50Hz.
  • FEI: Vectra 986 FC

    Details
    ID#:
    9072298
    Category:
    Ion Milling
    Vintage:
    2002 
    IET / WDR System | Configuration: standard | Ion Mill Column / 5nm next gen Column | IR camera: no | Navigation software: no | | | Gases Used: | Chlorine or Bromine | Xenon Diflouride | Siloxane (TMCTS) or (Tetramethylcyclotetrasiloxane) | Oxygen | Tungsten | | Currently de-installed | 2002 vintage.
  • FEI: Tecnai G2 F20

    Details
    ID#:
    141774
    Category:
    Scanning Electron M...
    TEM | S-Twin lens | EDAX EDS included | 2004 vintage.
  • PHILIPS / FEI: XL 40

    Details
    ID#:
    9065023
    Category:
    Scanning Electron M...
    FEG SystemWindows NT | EDAX (DX-4) system | Magnification range: 10x to 400,000x | ET type Secondary Electron Detector | FEI (Philips) Solid State BSD detector | MCtrl version 6.0 | Fully integrated image storage | CCD Chamber scope | 35 degree X-Ray takeoff angle | 3nm at 30kV; 15nm at 1kV | Accelerating Voltage: 0.2 to 30kV | | Stage & Specimen Handling: | Drawer type door | 5 axis stage (XYZRT) ­ XYR motorized | 150mm motorized travel in X and Y | Manual Tilt and Z | External Z adjust of 37mm | Maximum free space of 55mm for thick specimens | Interior chamber size 379mm x 325mmx 315mm | | Neslab chiller and pump included | 1996 vintage.
  • FEI: Tecnai F30

    Details
    ID#:
    9063939
    Category:
    Scanning Electron M...
    FE-TEM | | Includes: | TEM Body: Main unit | FEG Gun: Electron gun | H/T Tank | Chiller with PCW supply | Power cabinet: Main unit with power supply | STEM Cabinet: STEM Cabinet, (2) PC and HDD Remote | TEM Cabinet | Water rack | Cover | Desk | ETC: Monitor, turbo controller | | Non-SMIF | Automatic online component: No | Wafer OF Type: Notch at 6 o'clock | Software OS: Windows | No PPD | Option for lens cloudiness: PL Purge | 2007 vintage.
  • FEI: 835

    Details
    ID#:
    9058950
    Category:
    Ion Milling
    Ion beam FIB / SEM.
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