FEI MICRION 875 AUTOFIB Products

  • FEI: Nova NanoSEM 430

    Details
    ID#:
    9047188
    Category:
    Scanning Electron M...
    Vintage:
    2011 
    SEM | High and low vacuum | High resolution | FEG SEM | 4" mm x 4" mm stage | Loaded: TLD SE, BSE, SED, LV SED (LVD), UHR LV SED (Helix), Low KV BSED, GAD | 2011 vintage.
  • FEI: 200xP

    Details
    ID#:
    9046854
    Category:
    Ion Milling
    Focused ion beam system | Magnum ion column | 50 mm Stage | (2) GIC | Turbo vacuum | 1999 vintage.
  • FEI: Tecnai F30

    Details
    ID#:
    9030550
    Category:
    Scanning Electron M...
    S/TEM | 300 kV Schottky FEG | BF, DF, HAADF | EFTEM EELS | EDS | 2k x 2k CCD | Gatan 863 Tridiem | BiPrism | Lorentz lens | Tecnai free lens control | Single tilt, high visibility double tilt, and holography holders.
  • FEI: Tecnai G2 20

    Details
    ID#:
    9030551
    Category:
    Scanning Electron M...
    TEM | 200 kV LaB6 | BF, DF modes | FEI TIA UI | Compustage | Single tilt holder | | Optional: Camera and EDS.
  • FEI: 800

    Details
    ID#:
    9046863
    Category:
    Ion Milling
    Focused ion beam system | 8" XY Stage travel | Prelens | (2) GIS | 1999 vintage.
  • FEI: SNP XT Rapid CD

    Details
    ID#:
    9058073
    Category:
    Wafer Testing And M...
    Photomask metrology system | P/N: SNP100 | Delivers 3-D critical dimension capability for the 65nm node | Next Generation Precision Scanning System | Upgraded high magnification microscope | SNP XT field upgradable with Rapid CD capability | | ScanHead | Z stage Gear box | Cognex board | XT Z stage linear encoder | Laser head, 5517C | Monitor, 5,6“ | Motion controller | Robot System | | CD repeatability: 3.4nm | CD reproducibility: 4.5nm | Calibration CD standards: no | Sidewall angle precision: <3° | Automated defect review: no | Depth repeatability: 0.6nm | Depth reproducibility: 0.2nm | Calibrated depth standards: yes | Tip size: 120nm x 240nm | | Operating hours: ~18,000.
  • FEI: Nova 200

    Details
    ID#:
    9046379
    Category:
    Scanning Electron M...
    Dual beam system, parts machine.
  • FEI: 200 XP

    Details
    ID#:
    168986
    Category:
    Ion Milling
    FIB system | Prelens ion column | Can be customized to your needs.
  • FEI: 825i

    Details
    ID#:
    194572
    Category:
    Ion Milling
    Ion beam inspection tool, 8" | EDX is not working | Currently de-installed | Cables intact | 1998 vintage.
  • FEI: HELIOS 52

    Details
    ID#:
    9059159
    Category:
    Facilities Equipment
    DI water heater.
  • FEI: 23229

    Details
    ID#:
    9024592
    Category:
    Spare Parts
    Aperture strip, prelens.
  • FEI: 835

    Details
    ID#:
    9058950
    Category:
    Ion Milling
    Ion beam FIB / SEM.
  • FEI: 4022-268-00561

    Details
    ID#:
    9024615
    Category:
    Spare Parts
    Micro-element measuring system.
  • PHILIPS / FEI: FIB-610

    Details
    ID#:
    9021863
    Category:
    Scanning Electron M...
    Focused ion beam imaging workstation | | Includes: | FEI LBO-51MA display | FEI PCSP system power controller | FEI ID2 deflection controller | FEI SCI stage controller | FEI 1IPS ion pump power supply | FEI 1GI gas injection controller | FEI CPS video controller | FEI MVD deposition control unit | TurboTronik NT-340-M turbo pump controller | | SCI stage control module is misaligned with the fastening holes | PCSP system power controller has missing joystick.
  • FEI: DualBeam 835

    Details
    ID#:
    9047178
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam SEM / FIB, 8" | Magnum ion | 2 GIS | Wafer loading robot | 2000 vintage.
  • FEI: DualBeam Expida 1285

    Details
    ID#:
    9047183
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" - 12" | 2000 vintage.
  • FEI: DualBeam 830

    Details
    ID#:
    9047184
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    1999 
    Dual ion beam FIB / SEM, 8" | Pre lens ion | 2 GIS | Turbo vacuum | 1999 vintage.
  • PHILIPS / FEI: XL 40

    Details
    ID#:
    9049866
    Category:
    Scanning Electron M...
    SEM | LaB6 emitter, 6-position bias control | OS: Windows 3.11 | Fully integrated image storage | ET type Secondary Electron Detector | FEI (Philips) Solid State BSE detector | CCD Chamberscope | Resolution: 3nm at 30kV; 15nm at 1kV | Magnification range: 10x – 400,000x | Accelerating Voltage: 0.2 to 30kV | Drawer type door | 5 axis stage (XYZRT) – XYR motorized with 150mm travel in X and Y | Manual Tilt and Z adjustment | External Z adjustment of 37mm | Interior chamber size 379mm x 325mm x 315mm | (8) accessory ports, including BNC electrical feedthrough | Currently installed.
  • FEI: DualBeam 835

    Details
    ID#:
    9047185
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2000 
    Dual ion beam FIB / SEM, 8" | Magnum ion | 2 GIS | 8" Load lock | 2000 vintage.
  • FEI: DA300

    Details
    ID#:
    9052303
    Category:
    Wafer Testing And M...
    Wafer Size:
    12" 
    Defect analyzer, 12" | | Includes: | Dual beam system | Electron imaging | Focused ion beam milling | FOUP wafer handling | Omniprobe nanomanipulator | Scanning transmission electron microscopy (STEM) | Energy dispersive x-ray spectroscopy (EDX) | Gas injection systems (GIS) with tool automation: | Deposition: Platinum, Tungsten | Reactive: Insulator enhanced etching (XEF2) | TEM Sample preparation | Cross section and plan view lamellae | Low kV cleaning capability | SEM Imaging | Electron or ion beam milling/deposition | | Sample stage: 12" | Stage motion: 305 x 305 mm travel | Stage motion: 1.5 μm accuracy | Schottyky electron gun: 200 V - 30 kV | Image resolution: 7 nm FIB, 2 nm SEM | Liquid metal gallium ion source: 5 - 30 kV | Milling current range: pA - nA | STEM imaging: DF, BF, HAADF 1.1 nm at 30 kV.
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