FEI MICRION 875 AUTOFIB Products

  • FEI: Expida 1285

    Details
    ID#:
    9095881
    Category:
    Ion Milling
    Wafer Size:
    8"-12" 
    Scanning Microscope System, 8"-12" | Integrated electron and ion columns for semi-automated process control | Defect review, characterization, and failure analysis | | (1) Notched wafer holder | In-lens detection system for secondary and backscattered electrons | FEI xP software: wafer alignment, repetitive FIB operations, and critical dimension | (6) axial accessory ports for gas chemistry (4 maximum) | EDS detectors | Optical microscopes | Automatic vacuum system with integrated wafer loadlock | Oil-free turbomolecular pumping system for specimen chamber | (3) Ion pumps for differential pumping of ion and electron columns | Rough pump foreline | Robotic 8"/12" autoloader with non-contact prealigner | | High resolution Sirion FE-SEM column: 0.2 to 30 KeV | Schottky thermal field emitter | 60° Dual-objective lens: field free and immersion modes | Motorized heated objective apertures | | High intensity FEI Sidewinder ion column | Beam current range from 1 pA to 20 nA. | | (5) Axis motorized 305 mm stage | High accuracy optical encoders | Closed loop computer control | Multi-axis joystick | | Distributed control | Pentium-based host computer | Controls multiple single-board satellite processors | MS Windows operating system | Integrated 19" LCD color monitor | Video printer | | Manual user interface (MUIF) console | Stigmation | Magnification | XY fine position | Standard mouse control | | Integral vibration and stray field cancellation system | SEMI S2-0703 and CE compliant. | | Options available: | Roughing pump | FOUP, SMIF, or open cassette load.
  • FEI: DualBeam 865

    Details
    ID#:
    9076200
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    2002 
    Dual ion beam FIB / SEM | Schottky FEG SEM | Magnum ion column | Low KV capable for Hi-Res TEM sample preparation | SE and BSE imaging | Secondary ion imaging | Resolution of SEM: 3 nm at 5 KV and 30 KV | Software: Window XP, FEI XP UI | Stage: 200 mm full travel, -5° to 60° tilt | (3) GISes | Wafer robot | | De-installed in Q4 2012 | 2002 vintage.
  • FEI: Strata 400

    Details
    ID#:
    9107025
    Category:
    Ion Milling
    Vintage:
    2006 
    Focused ion beam system | Software: xT version 2.0.5 FEI desk PCs | Main use: TEM lamellae preparation | Dual beam, STEM capable FIB SEMl | 76x76 stage 5 axis motor with flip-stage | Ga LMIS source | Omniprobe Autoprobe 200.1 | Gaseous sources ePt, | Ion Pt | Separate card interface and mains power supply cabinet | Documentation | User Manual 10/12/2004 2nd edition, installation disks (CD) | User Log books 2006 - 2015 | PM reports: yes: under Maintenance contract with FEI | 6 channel detector card | Autoprobe z-sensor and actuator | Stage TMCB card | FEI desk PC and harddisk | Missing chiller | 2006 vintage.
  • FEI: Vectra 986 FC

    Details
    ID#:
    9072298
    Category:
    Ion Milling
    Vintage:
    2002 
    IET / WDR System | Upgraded to IET/WDR (Q3 2012) | Configuration: standard | Ion Mill Column / 5nm next gen Column | IR camera: no | Navigation software: no | | Gases Used: | Chlorine or Bromine | Xenon Diflouride | Siloxane (TMCTS) or (Tetramethylcyclotetrasiloxane) | Oxygen | Tungsten | | Optional: | Navigation software license | IR camera | | Currently installed | 2002 vintage.
  • FEI: Nova NanoLab 600

    Details
    ID#:
    9081351
    Category:
    Scanning Electron M...
    SEM | Ion gun: non-operational.
  • FEI: Tecnai 12

    Details
    ID#:
    9096275
    Category:
    Scanning Electron M...
    Transmission Electron Microscope (TEM).
  • PHILIPS / FEI: XL 40

    Details
    ID#:
    9065023
    Category:
    Scanning Electron M...
    FEG SystemWindows NT | EDAX (DX-4) system | Magnification range: 10x to 400,000x | ET type Secondary Electron Detector | FEI (Philips) Solid State BSD detector | MCtrl version 6.0 | Fully integrated image storage | CCD Chamber scope | 35 degree X-Ray takeoff angle | 3nm at 30kV; 15nm at 1kV | Accelerating Voltage: 0.2 to 30kV | | Stage & Specimen Handling: | Drawer type door | 5 axis stage (XYZRT) ­ XYR motorized | 150mm motorized travel in X and Y | Manual Tilt and Z | External Z adjust of 37mm | Maximum free space of 55mm for thick specimens | Interior chamber size 379mm x 325mmx 315mm | | Neslab chiller and pump included | 1996 vintage.
  • FEI: Vectra 986+

    Details
    ID#:
    9062560
    Category:
    Ion Milling
    Wafer Size:
    6" 
    Physical analysis tool, 6" | OBIC | Flood Gun | Tilt and Rotate Cassette | FIB Assist | Laser stage: interferometry | 50kV column | IET: no | Gases: XeF2, Cl2, TMCTS, H2O, WF6 | Currently crated and warehoused.
  • FEI: Tecnai F30 S-Twin

    Details
    ID#:
    9062878
    Category:
    Scanning Electron M...
    FE-TEM | 300KV | | Operational system: | Electron microscope TECNAI F30 S-TWIN, FP 5035/20 | NEC 20" Monitor, 9432-909-93371 | Extended Work Station, 5352/02 | Imaging and analysis software, 5400/00 | CompuStage Low Background Dbl-tilt holder, 6595/15 | Low dose exposure technique, 5407/00 | 28 sheet film holder, 6209/20 | Magazine for 56 unexposed sheet film holders, 6222/00 | Magazine for 56 exposed sheet film holders, 6223/00 | Desiccator for 2 magazines, 92021 | Replacement FEG assembly, 6180/00 | Mains matching Transformer, 6345/51 | Cooling water unit 60hz, 9432 909 96311 | Spare Objective Aperture, 6149/50 | FEG Diagnostics, 5265/00 | TEM General Diagnostics, 5266/00 | STEM General Diagnostics, 5267/00 | HT Diagnostics, 5269/20 | Air compressor, 9432-909-96271 | Electron optics: | Tecnai Scripting, 5451/00 | Tecnai Photo montage, 5456/00 | Gatan 894.P27FAP | | STEM and HAADF: | EDX Spectroscopy Technique, 5402/00 | Digital Pulse Processor, 9432-909-95322 | Detector Unit , PV 9761/08 | Beam Control and Mapping software Pkg, 9432-909-95391 | EDAX Mat.Sc. TEM SW, 95371 | External Analog Interface XAIB, 6778/00 | | GATAN Cameras: | Gatan Ultrascan 1000 2kx2k / Grade 2(B) | Gatan retractable TV rate CCD Camera type 692, 9432-909-22434 | Digital Micrograph for Tecnai, 5406/40 | Slow Scan CCD imaging technique, 5406/00 | TV rate imaging Technique, 5405/00 | | Holography Option 2D Dopant Profiling: | Lorenz Lens, 9432-900-22431 | Biprism Holder, 9432-900-22432 | Holoworks SW (Gatan), 9432-900-22433.
  • FEI: SDP-100 SIMS III

    Details
    ID#:
    9062899
    Category:
    Spare Parts
    SIMS detector | For FIB-200 dual beam FIB/SEM.
  • FEI: Morgagni

    Details
    ID#:
    9047343
    Category:
    Scanning Electron M...
    Vintage:
    2008 
    Scanning electron microscope (SEM) | Tungsten filament | 1 K x 1 K side mount camera | Single tilt holder | 100 kV | 2008 vintage.
  • FEI: 820

    Details
    ID#:
    9082626
    Category:
    Spare Parts
    FIB Mainframe only.
  • FEI: 820

    Details
    ID#:
    9093329
    Category:
    Ion Milling
    Vintage:
    1998 
    Focused Ion Beam (FIB) system | E-gun: SFEG column | I-gun: Prelens column | GIS: EE/IEE/Pt | OS: Windows NT4.0 | System: Ionmill system | Loadlock: Yes | Chiller: Themor Flex 900 | Pump system: TMP system | EDX: Thermo 804A-1SES | Currently deinstalled | 1998 vintage.
  • FEI: Expida 1265

    Details
    ID#:
    9095613
    Category:
    Ion Milling
    Ion Etching System | Includes spare parts.
  • FEI: Altura 855

    Details
    ID#:
    9095896
    Category:
    Scanning Electron M...
    Wafer Size:
    8" 
    Dual Beam Field Emission Scanning Electron Microscope (FE-SEM), 8" | Focused Ion Beam (FIB) | | Sirion FE-SEM column: 0.2 to 30 keV | Schottky thermal field emitter | 60° Dual-objective lens: field free and immersion modes | Motorized heated objective apertures | | FEI Sidewinder™ ion column: Beam current range from 2 pA to 20 nA | In-lens detection system for secondary and backscattered electrons | FEI xP software : routine FIB operations and TEM sample preparation | (6) Axial accessory ports for gas chemistries: (4) maximum | EDX detectors | Optical microscopes | Automatic vacuum system with integrated wafer loadlock | Oil-free turbomolecular pumping system for specimen chamber | (3) Ion pumps for differential pumping of ion and electron columns | Rough pump foreline | Single wafer loadlock with sample holders | (5) Axis motorized 8" stage with optical encoders and closed loop computer control | Multi-axis joystick | (1) Notched 8" wafer holder | - | Pentium-based host computer | Controlling multiple single-board satellite processors | MS-Windows operating system | Integrated 21" color monitor | Video printer | | Manual user interface (MUIF) | Stigmation | Magnification | XY fine position | Standard mouse control | Real time monitor | Integral vibration and stray field cancellation system | Designed for SEMI S2-0703 | CE compliance | | Options available: | Roughing pump | Different sized wafer holders.
  • FEI: Tecnai 10

    Details
    ID#:
    151424
    Category:
    Scanning Electron M...
    TEM, 100kV | Biological Set up | Optional AMT Sidemount CCD.
  • FEI: 820

    Details
    ID#:
    9084978
    Category:
    Ion Milling
    Wafer Size:
    8" 
    Vintage:
    1998 
    Focused Ion system, 8" | Dual beam | Model: XCDA-Z | ION source: needs to be refilled | Currently installed.
  • FEI: DB235

    Details
    ID#:
    9085333
    Category:
    Ion Milling
    DualBeam FIB System.
  • FEI: Tecnai G2 F20

    Details
    ID#:
    141774
    Category:
    Scanning Electron M...
    TEM | S-Twin lens | EDAX EDS included | 2004 vintage.
  • FEI: SNP XT Rapid CD

    Details
    ID#:
    9058073
    Category:
    Wafer Testing And M...
    Photomask metrology system | P/N: SNP100 | Delivers 3-D critical dimension capability for the 65nm node | Next Generation Precision Scanning System | Upgraded high magnification microscope | SNP XT field upgradable with Rapid CD capability | | ScanHead | Z stage Gear box | Cognex board | XT Z stage linear encoder | Laser head, 5517C | Monitor, 5,6“ | Motion controller | Robot System | | CD repeatability: 3.4nm | CD reproducibility: 4.5nm | Calibration CD standards: no | Sidewall angle precision: <3° | Automated defect review: no | Depth repeatability: 0.6nm | Depth reproducibility: 0.2nm | Calibrated depth standards: yes | Tip size: 120nm x 240nm | | Operating hours: ~18,000.
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