SEMITOOL 480 D Products

  • SEMITOOL: 480 S

    Details
    ID#:
    135528
    Category:
    Photoresist
    Spin Rinse Dryer with PSC101 and options.
  • SEMITOOL: 480

    Details
    ID#:
    84362
    Category:
    Photoresist
    Spin Rinse Dryer.
  • SEMITOOL: 480

    Details
    ID#:
    78271
    Category:
    Photoresist
    F-Style Spin rinser dryer, single stack with rotor | Accommodates up to 8” low profile | 101 Controllers, Digital | Ferrofluidic Rear Bowl Shaft Seal | Electropolished bowl | Polypropylene Cabinet Aero Style | Electropolished Bowl | 1/2 HP Direct Drive Motor | Rotor to accommodate low profile 8” A192-81M | Static Eliminator | Resistivity | Complete Documentation Package | Guaranteed Particle counts < 25 at .5 micron | 17 meg Ohm DI water and class 1 N2.
  • SEMITOOL: 480

    Details
    ID#:
    78272
    Category:
    Photoresist
    F-Style Spin rinser dryer, bench top with rotor | Accommodates up to 8” low profile | 101 Controllers, Digital | Ferrofluidic Rear Bowl Shaft Seal | Electropolished bowl | Polypropylene Cabinet Aero Style | Electropolished Bowl | 1/2 HP Direct Drive Motor | Rotor to accommodate low profile 8” A192-81M | Static Eliminator | Resistivity | Complete Documentation Package | Guaranteed Particle counts < 25 at .5 micron | 17 meg Ohm DI water and class 1 N2.
  • SEMITOOL: 480

    Details
    ID#:
    9074408
    Category:
    Photoresist
    Spin Rinse Dryers | Mainframe: 880.
  • SEMITOOL: 480 D

    Details
    ID#:
    24500
    Category:
    Photoresist
    rinser/dryers.
  • SEMITOOL: 480

    Details
    ID#:
    78270
    Category:
    Photoresist
    S-Style Spin rinser dryer bench top (1 bowl system), remanufactured | Accommodates up to 8” low profile | 102 Controllers, Digital | Brushless motor | Non-contact labyrinth seal upgrade for motor drive and bowl assembly | Rotor Quick Disconnect, for a low profile cassette A192-81M | Resistivity Monitor | Static Eliminator Assembly | Complete Documentation Package | Guaranteed Particle counts <50 at .3 micron | Polypropylene Cabinet “Aero Style” | Electro-polished Bowl | 17 meg Ohm DI water and class 1 N2.
  • SEMITOOL: WST-406MG

    Details
    ID#:
    35587
    Category:
    Photoresist
    Wafer Size:
    Vintage:
    2000 
    Wet Solvent Stripper, 4", Semitool graphic controller display screens, chemical cabinet (2 tanks, 1 for redian PRS1000, 1 for fresh PRS1000), (Automatic drain system), Front loading with On-Axis Spin, 4"-6" wafer configurable (current : 4"), 2000 vintage.
  • SEMITOOL: 880S

    Details
    ID#:
    9038591
    Category:
    Photoresist
    Stand alone spin rinse dryer, 8" | | Includes: | DI Water: 30-40 PSI | N2: 30-40 PSI | Single axis | Rotor | Resistivity prove and cell | Teflon and PVDF fluid path | Fully automated door, slides up and down | Spare door | Heat options | Rinse to resistivity | Other Semitool OEM upgrades | Does not include PCS 101 or 102 controller.
  • SEMITOOL: 4300S

    Details
    ID#:
    77166
    Category:
    Photoresist
    Wafer Size:
    6" 
    Vintage:
    2002 
    spin rinse dryer, 6" | Capable of 25 wafer batch processing | Bowl Diameter: 15-inches (380mm) | Maximum Round Substrate Size: 9-inches (230mm) | Maximum Square Substrate Size: 8.75-inches (220mm) | Rotor Type: Requires 4-bolt rotors | Controller: Semitool PSC-101 controller | Resistivity Meter | 2002 vintage.
  • SEMITOOL: Raider ECD 310

    Details
    ID#:
    9087510
    Category:
    Etchers / Ashers
    Wafer Size:
    6" 
    Vintage:
    2011 
    Etcher, 6" | (2) Raptor Process Chambers for Ni ECD | (4) Raptor Process Chambers for Au ECD | (1) Spray Acid Process Chamber for dilute premix | (1) SRD Process Chambers for Intermediate/Final Rinse | (1) USPA Mini Environment | (1) CO2 Fire Suppression System | (1) Windows Based Control System | (1) Semitool Robot with Edgegrip End Effector | (1) 2 Position Open Cassette WIP for 6" Cassettes | (1) Process Tank for Ni Plating | (2) Process Tank for Au Plating | (1) Process Tank for Dilute Acid Pre-Wet Chemistry | (3) ARU Interface | (4) Manual Fill Ports with removable funnel to allow manual filling | (1) External Heater/Chiller Unit for Ni Tank | (1) External Heater/Chiller Unit for Au Tank | 2011 vintage.
  • SEMITOOL: PSC-101

    Details
    ID#:
    201046
    Category:
    Photoresist
    Spin Rinse Dryer (SRD) system.
  • SEMITOOL: EO212PM

    Details
    ID#:
    9052926
    Category:
    Wet Stations
    Vintage:
    1998 
    Wet station | Cu plating | 1998 vintage.
  • SEMITOOL: 270

    Details
    ID#:
    200803
    Category:
    Photoresist
    Wafer Size:
    4" Or 6" 
    Spin Rinse Dryer (SRD), 4" or 6".
  • SEMITOOL: SST-264

    Details
    ID#:
    9033429
    Category:
    Photoresist
    Spray solvent tool, 4".
  • SEMITOOL: WST-308M

    Details
    ID#:
    9077797
    Category:
    Photoresist
    Wet Solvent Stripper.
  • SEMITOOL: 860

    Details
    ID#:
    193490
    Category:
    Photoresist
    Spin Rinse Dryer (SRD) | System includes Resistivity probe and cell for lower dryer | Dual Axes -- Designed to accommodate two rotors | Accommodates two each 125mm or 100mm wafer cassettes per run | Includes controllers: C225/P225 | Light Switches: | Heater | Holding | System Power | Door Sealed | Start Switch | Stop Switch | Lower opening front access panels for controls | Rear access for plumbing panels | Rolling casters.
  • SEMITOOL: ST 260

    Details
    ID#:
    9077839
    Category:
    Photoresist
    Spin Rinse Dryer (SRD), 5".
  • SEMITOOL: ST 260

    Details
    ID#:
    9077838
    Category:
    Photoresist
    Spin Rinse Dryer (SRD), 5".
  • SEMITOOL: ECP LT210 CU

    Details
    ID#:
    9038305
    Category:
    Photoresist
    Wafer Size:
    8" 
    Vintage:
    1999 
    CMP - Cu plating system, 8" | (10) Chambers | Module: CMP/CU | SMIF interface: (2) Asyst indexers | | Process application: copper plating | Copper process: yes | Batch/single wafer: single wafer | Electrochemical copper deposition in diluted CuSO4/H2SO4 solution with organic additives | Backside cleaning and bevel etching with diluted PIR-Solution | (6) Plating chambers | (4) Bevel etch capsules | | External chemical Conc. Control by support tool | Capable of Pulse-Reverse-Plating and DC-Plating and Hot-Entry | ECD Chamber Retrofit: Wet contact rings and finger clean for ext. ring lifetime | Photometric insitu analysis: Cu and H2SO4 | Robot Beam | Capsule Retrofit: fingerless rotors | Capsule Retrofit: one piece delivery manifold | Modified bowl return-flow for bubble suppression | M&W Systems chiller | Dynatronix Power Supply Upgrade | Capsules: adjustable flowmeters for chemical supply | UPS-Retrofit: Data Saving in case of power loss) | Plating rotors with extended wafer supporting posts | | Currently crated | CE marked | 1999 vintage.
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